专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US4530703A Cross-linked polyarylene oxide membranes 失效
标题翻译：交联聚亚芳基氧化物膜
公开(公告)号：US4530703A
公开(公告)日：1985-07-23
申请号：US509636
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
IPC分类号： C08K3/28 , B01D53/22 , B01D69/08 , B01D71/52 , B01D71/66 , B01D71/68 , C08G65/48 , C08K5/16 , C08L71/12
CPC分类号： C08G65/485 , B01D69/08 , B01D71/52 , B01D71/68 , C08L71/126
摘要： Covalently-bonded, cross-linked polymeric gas separation membranes of a polyarylene oxide precursor and a chemical cross-linking agent. Apparatus and processes utilizing such membranes for selectively separating at least one gas from a gaseous mixture by permeation.Membranes include substituted phenylene oxide polymers cross-linked with ammonia.
摘要翻译：聚环氧丙烷前体和化学交联剂的共价键合的交联聚合物气体分离膜。使用这种膜的装置和方法用于通过渗透从气态混合物中选择性分离至少一种气体。膜包括与氨交联的取代的苯醚聚合物。

12. 发明授权

US4468500A Amino ketone cross-linked polyphenylene oxide 失效
标题翻译：氨基酮交联聚苯醚
公开(公告)号：US4468500A
公开(公告)日：1984-08-28
申请号：US509611
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
IPC分类号： B01D71/52 , C08G65/48
CPC分类号： B01D71/52 , C08G65/485
摘要： Cross-linked polyphenylene oxide compositions comprise the reaction product of haloacylated polyphenylene oxide and a primary monoamine. The polyphenylene oxide chains are cross-linked by amino ketone bonding. Such cross-linked polymers are useful as membranes, for instance gas separation membranes.
摘要翻译：交联聚苯醚组合物包含卤代酰化聚苯醚与伯胺的反应产物。聚苯醚链通过氨基酮键交联。这种交联聚合物可用作膜，例如气体分离膜。

13. 发明授权

US08968981B2 Coating compositions for use with an overcoated photoresist 有权
标题翻译：用于外涂光致抗蚀剂的涂料组合物
公开(公告)号：US08968981B2
公开(公告)日：2015-03-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
IPC分类号： G03F7/004 , G03F7/11 , G03F7/09
CPC分类号： G03F7/09 , G03F7/091 , G03F7/092 , G03F7/094 , G03F7/11 , Y10T428/31786
摘要： Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.
摘要翻译：有机涂料组合物，特别是抗反射组合物，其包含包含一个或多个对苯甲酸部分的组分。本发明的优选组合物可以减少来自衬底的辐射辐射反射回外涂光致抗蚀剂层的反射，并且可以用作平坦化，保形或通孔填充层。

14. 发明授权

US08142988B2 Coating compositions for use with an overcoated photoresist 有权
标题翻译：用于外涂光致抗蚀剂的涂料组合物
公开(公告)号：US08142988B2
公开(公告)日：2012-03-27
申请号：US11385012
申请日：2006-03-20
申请人： Anthony Zampini , Edward K. Pavelchek
发明人： Anthony Zampini , Edward K. Pavelchek
IPC分类号： G03F7/30
CPC分类号： G03F7/091 , Y10T428/31786
摘要： Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.
摘要翻译：提供了有机涂料组合物，包括抗反射涂料组合物，其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。本发明的优选组合物包括在光刻加工期间从组合物涂层中含有对升华或其它迁移交联剂具有抗性的交联剂组分。

15. 发明授权

US08026037B2 Si-polymers and photoresists comprising same 有权
标题翻译： Si聚合物和含有它们的光致抗蚀剂
公开(公告)号：US08026037B2
公开(公告)日：2011-09-27
申请号：US12214807
申请日：2008-06-20
申请人： Anthony Zampini , Tao Zhang , Jaihyoung Lee
发明人： Anthony Zampini , Tao Zhang , Jaihyoung Lee
IPC分类号： G03F7/039 , G03F7/075
CPC分类号： G03F7/0757 , C08G77/24 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
摘要翻译：提供具有含有这种聚合物的非碳四价物质（Si，Ti，Ge，Zr，Sn）和可光成像的组合物的新型聚合物。优选的聚合物是有机的。一个或多个聚合物重复单元包含碳原子。特别优选的是包含SiO 2或TiO 2重复单元的聚合物，并且其可以作为在短波长如亚300nm和亚-200nm下成像的抗蚀剂的树脂组分非常有用。

16. 发明授权

US06787286B2 Solvents and photoresist compositions for short wavelength imaging 失效
标题翻译：用于短波长成像的溶剂和光致抗蚀剂组合物
公开(公告)号：US06787286B2
公开(公告)日：2004-09-07
申请号：US10101202
申请日：2002-03-19
申请人： Charles R. Szmanda , Anthony Zampini
发明人： Charles R. Szmanda , Anthony Zampini
IPC分类号： G03F7039
CPC分类号： H05K3/381 , C08J7/02 , C23C18/2006 , C23C18/24 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/0395 , G03F7/0397 , H05K3/0055 , Y10S430/113
摘要： New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.
摘要翻译：提供适用于短波长成像的新型光致抗蚀剂，特别是亚170nm，例如157nm。本发明的抗菌剂包括含氟聚合物，光敏组分和溶剂组分。用于本发明抗蚀剂的优选溶剂可以将抗蚀剂组分保持在溶液中，并且包括溶剂的一种或多种（即共混物）。在本发明的特别优选的溶剂共混物中，每个共混构件以基本上相等的速率蒸发，由此抗蚀剂组合物保持每个共混构件的基本恒定的浓度。

17. 发明授权

US06599951B2 Antireflective porogens 有权
公开(公告)号：US06599951B2
公开(公告)日：2003-07-29
申请号：US10154504
申请日：2002-05-24
申请人： Anthony Zampini , Michael K. Gallagher
发明人： Anthony Zampini , Michael K. Gallagher
IPC分类号： C08F12010
CPC分类号： H01L21/31695 , C08G77/16 , C08G77/18 , C08G77/20 , C08G77/70 , C08L83/04 , C09D183/04 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H05K1/0313 , H05K3/0011 , Y10T428/249958 , Y10T428/31663 , C08L2666/04 , C08L2666/28
摘要： Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices containing such porous organo polysilica dielectric materials without the use of antireflective coatings.

18. 发明授权

US5945516A Thermodynamically stable photoactive compound 失效
标题翻译：热力学稳定的光敏化合物
公开(公告)号：US5945516A
公开(公告)日：1999-08-31
申请号：US82435
申请日：1998-05-20
申请人： Harold F. Sandford , Anthony Zampini
发明人： Harold F. Sandford , Anthony Zampini
IPC分类号： G03F7/022 , G03F7/023 , C07C245/12
CPC分类号： G03F7/022 , G03F7/023
摘要： A method for converting a kinetically stable multiester of a naphthoquinone and an o-quinone diazide sulfonyl halide to a thermodynamically stable compound. The method comprises the steps of dissolving a phenol having at least two free phenolic hydroxyl groups and an o-naphthoquinone diazide sulfonyl halide in an aprotic solvent in the presence of a strong base, there being at least one mole of said naphthoquinone diazide sulfonyl halide per mole of phenol, reacting said phenol with said o-napthoquinone diazide sulfonyl halide until essentially of said o-naphthoquinone diazide sulfonyl halide is reacted with said polyhydroxy phenol, and following completion of said reaction, permitting the reaction product to remain in said solvent for a period of time of at least 15 minutes before recovering said photoactive compound The photoactive compound formed by the process is suitable for the formation of photoresists and is less apt to precipitate from solution during storage.
摘要翻译：一种将动力学稳定的萘醌和邻醌二叠氮磺酰卤的多酯转化为热力学稳定的化合物的方法。该方法包括在强碱存在下将具有至少两个游离酚羟基的苯酚和邻萘醌二叠氮磺酰卤溶解在非质子传递溶剂中的步骤，至少有1摩尔所述萘醌二叠氮磺酰卤摩尔的苯酚，使所述酚与所述邻萘醌二叠氮磺酰卤反应，直到基本上所述邻萘醌二叠氮磺酰卤与所述多羟基苯酚反应，并且在所述反应完成后，使反应产物保留在所述溶剂中在回收所述光敏化合物之前的至少15分钟的时间段。通过该方法形成的光活性化合物适合于形成光致抗蚀剂，并且在储存期间较不易于从溶液中沉淀。

19. 发明授权

US5618932A Photoactive compounds and compositions 失效
标题翻译：光活性化合物和组合物
公开(公告)号：US5618932A
公开(公告)日：1997-04-08
申请号：US449334
申请日：1995-05-24
申请人： Anthony Zampini , Ashish Pandya
发明人： Anthony Zampini , Ashish Pandya
IPC分类号： C07D307/42 , C07D333/16 , G03F7/022 , C07C245/12 , C07D307/36 , C07D333/10 , C07D333/28
CPC分类号： C07D307/42 , C07D333/16 , G03F7/022
摘要： A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new photoactive compounds exhibit enhanced long term solubility in conventional photoresist solvents.
摘要翻译：用于制备光致抗蚀剂的新型光敏化合物包括具有被杂环基取代的烷基链的双酚化合物。新的光敏化合物可以与碱溶性树脂混合以配制光致抗蚀剂组合物。新的光活性化合物在常规光致抗蚀剂溶剂中表现出增强的长期溶解性。

20. 发明授权

US5514515A Photoactive compounds having a heterocyclic group used in photoresist compositions 失效
标题翻译：光致抗蚀剂组合物中使用具有杂环基的光活性化合物
公开(公告)号：US5514515A
公开(公告)日：1996-05-07
申请号：US449305
申请日：1995-05-24
申请人： Anthony Zampini , Ashish Pandya
发明人： Anthony Zampini , Ashish Pandya
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new photoactive compounds exhibit enhanced long term solubility in conventional photoresist solvents.
摘要翻译：用于制备光致抗蚀剂的新型光敏化合物包括具有被杂环基取代的烷基链的双酚化合物。新的光敏化合物可以与碱溶性树脂混合以配制光致抗蚀剂组合物。新的光活性化合物在常规光致抗蚀剂溶剂中表现出增强的长期溶解性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式