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11. 发明授权

US6031238A Projection aligner for integrated circuit fabrication 失效
标题翻译：用于集成电路制造的投影对准器
公开(公告)号：US6031238A
公开(公告)日：2000-02-29
申请号：US29451
申请日：1998-02-26
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toshiki Mori
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toshiki Mori
IPC分类号： G02B13/14 , G03F7/20
CPC分类号： G03F7/701 , G02B13/14 , G03F7/70225 , G03F7/70241 , G03F7/70958
摘要： A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.
摘要翻译： PCT No.PCT / EP97 / 03406 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月30日PCT公布。出版物WO98 / 00761 日本1998年1月8日在集成电路制造中，集成电路图案投影在晶片上的已知投影对准器包括ArF准分子激光器和由合成石英玻璃制成的石英玻璃光学部件组成的光学系统。为了提供一种投影对准器，其具有在长时间不劣化的光学性能，例如耐久性，光透射率等，并且光学系统可以以低成本整体构造，因此建议光学系统包括其氢分子浓度在1×10 17和5×10 18分子/ cm 3之间的第一石英玻璃光学构件组和氢分子浓度在5×1018至5×1019分/ cm 3之间的第三石英玻璃光学构件组。

12. 发明申请

US20120291488A1 COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 有权
标题翻译：二氧化硅铜玻璃及其制造方法及使用其的氙气灯
公开(公告)号：US20120291488A1
公开(公告)日：2012-11-22
申请号：US13558698
申请日：2012-07-26
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
IPC分类号： C03C4/12 , C03C21/00 , C03B20/00
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译：本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为即使在高产量使用方面，长期稳定性也优异。含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

13. 发明申请

US20100109509A1 COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 审中-公开
标题翻译：二氧化硅铜玻璃及其制造方法及使用其的氙气灯
公开(公告)号：US20100109509A1
公开(公告)日：2010-05-06
申请号：US12595605
申请日：2008-04-28
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
IPC分类号： H01J17/16 , B05D3/02 , C03C3/04
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use.The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译：本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为即使在高产量使用方面，长期稳定性也优异。含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

14. 发明申请

US20050239626A1 Synthetic quartz glass optical material for yag laser with higher harmonic 有权
标题翻译：合成石英玻璃光学材料用于具有较高谐波的yag激光
公开(公告)号：US20050239626A1
公开(公告)日：2005-10-27
申请号：US10523323
申请日：2003-07-19
申请人： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
发明人： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
IPC分类号： G02B1/00 , C03B20/00 , C03C3/06 , C03C4/00
CPC分类号： C03C4/0085 , C03C3/06 , C03C2201/21 , C03C2201/23
摘要： It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm2 (energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated with YAG laser of third or higher order harmonics with single pulses or continuously. Regarding a synthetic quartz glass optical material in use for the optical parts constituting the prism and lens used in a laser beam machine, this invention provides a synthetic quartz glass material suitably used for the YAG laser with the third or higher order of harmonic, choosing the following conditions: OH group concentration is in the range of ≧1 to ≦300 ppm; contained hydrogen molecule concentration is in the range of ≧2×1018 to ≧2×1019 molecules/cm3; transmittance of ultraviolet rays at 245 nm of wavelength is 99.9% or more; and the fictive temperature is in the range of ≧880 to ≦990° C.
摘要翻译：本发明的目的是提供适用于较高次谐波的YAG的合成石英玻璃光学材料。当合成石英玻璃材料用单个脉冲的三次或更高次谐波的YAG激光照射时，考虑J / cm 2的损伤阈值（通过照射产生裂纹的能量密度）或连续。关于构成用于激光束机的棱镜和透镜的光学部件的合成石英玻璃光学材料，本发明提供了适用于具有第三或更高次谐波的YAG激光器的合成石英玻璃材料，选择以下条件：OH基浓度在> = 1〜<= 300ppm的范围内; 含有氢分子浓度在> = 2×10 18 /分钟/分钟/分钟的范围内; 波长245nm处紫外线的透过率为99.9％以上; 并且假想温度在> = 880至<= 990℃的范围内。

15. 发明授权

US06578382B2 Synthetic quartz glass for optical use, heat treatment method and heat treatment apparatus for the same 失效
标题翻译：用于光学用途的合成石英玻璃，热处理方法和热处理装置
公开(公告)号：US06578382B2
公开(公告)日：2003-06-17
申请号：US09821352
申请日：2001-03-28
申请人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura
发明人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura
IPC分类号： C03C1500
CPC分类号： C03B19/1453 , C03B32/00 , C03B2201/21 , C03C23/007 , Y10S65/08 , Y10S65/90
摘要： A method for heat treating a synthetic quartz glass for optical use in a heating furnace, that comprises covering the surroundings of a synthetic quartz glass body with a SiO2 powder having a mean dissolved hydrogen molecule concentration of 1×1019 molecules/cm3 or higher, and then heat treating the body.
摘要翻译：一种用于热处理在加热炉中用于光学的合成石英玻璃的方法，其包括用平均溶解氢分子浓度为1×1019分/ cm 3或更高的SiO 2粉末覆盖合成石英玻璃体的周围，然后加热治疗身体。

16. 发明授权

US06483639B2 Optical system for integrated circuit fabrication 失效
标题翻译：用于集成电路制造的光学系统
公开(公告)号：US06483639B2
公开(公告)日：2002-11-19
申请号：US09194536
申请日：1998-11-25
申请人： Akira Fujinoki , Hiroyuki Nishimura
发明人： Akira Fujinoki , Hiroyuki Nishimura
IPC分类号： G02B600
CPC分类号： G03F7/70575 , G03F7/701 , G03F7/70225 , G03F7/70241
摘要： An optical system for integrated circuit fabrication comprises optical members made of synthetic quartz glass and fluorite, wherein: an optical member disposed in a position through which laser light is transmitted at a high light energy density, is made of single crystal fluorite; and an optical member in a position through which laser light is transmitted at a low light energy density, is made of synthetic quartz glass containing approximately such a hydrogen molecule concentration as can be doped under atmospheric pressure.
摘要翻译：用于集成电路制造的光学系统包括由合成石英玻璃和萤石制成的光学构件，其中：设置在激光以高光能密度透射的位置的光学构件由单晶萤石制成; 并且在低光能密度下透射激光的位置的光学构件由包含大气压下可掺杂的氢分子浓度的合成石英玻璃制成。

17. 发明授权

US08394731B2 Composite woven fabric and printed wiring board 有权
标题翻译：复合机织布和印刷线路板
公开(公告)号：US08394731B2
公开(公告)日：2013-03-12
申请号：US12447653
申请日：2007-11-07
申请人： Akira Sato , Akira Fujinoki , Hiroyuki Nishimura , Tsukasa Sakaguchi
发明人： Akira Sato , Akira Fujinoki , Hiroyuki Nishimura , Tsukasa Sakaguchi
IPC分类号： D03D15/00
CPC分类号： H05K1/0366 , D02G3/04 , D02G3/18 , D03D1/0082 , D03D1/0088 , D03D15/00 , D03D15/0011 , D03D15/0016 , D03D15/0027 , D10B2101/06 , D10B2201/00 , D10B2321/02 , D10B2321/021 , D10B2321/022 , D10B2321/121 , H05K1/024 , H05K2201/0158 , H05K2201/0278 , H05K2201/029 , Y10T442/30 , Y10T442/313 , Y10T442/3138 , Y10T442/3976
摘要： Disclosed is a printed wiring board which attains aims of printed wiring boards required for realizing high-speed, high-frequency semiconductor devices, namely a printed wiring board having low dielectric constant, low dielectric loss tangent and low linear expansion coefficient. Also disclosed is a composite woven fabric suitably used as a base material for such a printed wiring board. Specifically disclosed is a composite woven fabric containing quartz glass fibers and polyolefin fibers, in which the ratio of the quartz glass fibers to the composite woven fabric is set at 10 vol % or more and 90 vol % or less. It is preferred that the quartz glass fibers each have a filament diameter of 3 μm or more and 16 μm or less, and the composite woven fabric has a thickness of 200 μm or less.
摘要翻译：公开了实现高速，高频半导体器件所需的印刷线路板的目的的印刷线路板，即具有低介电常数，低介电损耗角正切和低线膨胀系数的印刷线路板。还公开了适合用作这种印刷线路板的基材的复合机织织物。具体公开了含有石英玻璃纤维和聚烯烃纤维的复合机织织物，其中石英玻璃纤维与复合机织织物的比率设定在10体积％以上且90体积％以下。优选石英玻璃纤维的长丝直径为3μm以上且16μm以下，复合织物的厚度为200μm以下。

18. 发明授权

US07288775B2 Synthetic quartz glass optical material for YAG laser with higher harmonic 有权
标题翻译：用于具有较高谐波的YAG激光器的合成石英玻璃光学材料
公开(公告)号：US07288775B2
公开(公告)日：2007-10-30
申请号：US10523323
申请日：2003-07-19
申请人： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
发明人： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
IPC分类号： C03C3/06 , H01S3/17
CPC分类号： C03C4/0085 , C03C3/06 , C03C2201/21 , C03C2201/23
摘要： It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm2 (energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated with YAG laser of third or higher order harmonics with single pulses or continuously. Regarding a synthetic quartz glass optical material in use for the optical parts constituting the prism and lens used in a laser beam machine, this invention provides a synthetic quartz glass material suitably used for the YAG laser with the third or higher order of harmonic, choosing the following conditions: OH group concentration is in the range of ≧1 to ≦300 ppm; contained hydrogen molecule concentration is in the range of ≧2×1018 to ≦2×1019 molecules/cm3; transmittance of ultraviolet rays at 245 nm of wavelength is 99.9% or more; and the fictive temperature is in the range of ≧880 to ≦990° C.
摘要翻译：本发明的目的是提供适用于较高次谐波的YAG的合成石英玻璃光学材料。当合成石英玻璃材料用单个脉冲的三次或更高次谐波的YAG激光照射时，考虑J / cm 2的损伤阈值（通过照射产生裂纹的能量密度）或连续。关于构成用于激光束机的棱镜和透镜的光学部件的合成石英玻璃光学材料，本发明提供了适用于具有第三或更高次谐波的YAG激光器的合成石英玻璃材料，选择以下条件：OH基浓度在> = 1〜<= 300ppm的范围内; 含有氢分子浓度在> = 2×10 18〜2×10 9分子/ cm 3的范围内。波长245nm处紫外线的透过率为99.9％以上; 并且假想温度在> = 880至<= 990℃的范围内。

19. 发明授权

US06689705B2 Synthetic quartz glass optical material and optical member 有权
标题翻译：合成石英玻璃光学材料和光学元件
公开(公告)号：US06689705B2
公开(公告)日：2004-02-10
申请号：US10048309
申请日：2002-01-29
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
IPC分类号： C03C306
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/21 , C03C2203/54 , Y02P40/57
摘要： An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5×1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2×10−5 or lower.
摘要翻译：本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。上述问题由OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 16分子/ cm 2的F2准分子激光的合成石英玻璃光学材料解决， 3>以下，最大和最小氟浓度在20mol ppm内的差异，以及最大和最小折射率之间的差异为2×10 -5或更低。

20. 发明授权

US06266978B1 Method for producing synthetic quartz glass for use in ArF excimer laser lithography 失效
标题翻译：用于ArF准分子激光光刻的合成石英玻璃的制造方法
公开(公告)号：US06266978B1
公开(公告)日：2001-07-31
申请号：US09392427
申请日：1999-09-09
申请人： Takayuki Oshima , Akira Fujinoki , Hiroyuki Nishimura , Yasuyuki Yaginuma
发明人： Takayuki Oshima , Akira Fujinoki , Hiroyuki Nishimura , Yasuyuki Yaginuma
IPC分类号： C03B3200
CPC分类号： C03C23/0025 , C03C3/06 , C03C23/002 , C03C2201/50
摘要： A simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the equation: Y=(80X−1880)/Z wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm2).
摘要翻译：用于制造具有优异的均匀性和高透射率的合成石英玻璃的简单方法，其可用作制备装备有ArF准分子激光器作为辐射源的步进机中的光学材料。一种用于制造用于ArF准分子激光光刻的合成石英玻璃的方法，其包括：将含有小于60ppb的Na的高度均匀的合成石英玻璃与最大波长为260nm的紫外线辐射照射不少于由方程式：其中X表示Na浓度（ppb），Y表示照射持续时间（小时），Z表示照射表面上的紫外线照射的照度（mW / cm 2）。

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