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    • 14. 发明授权
    • Superluminescent diode and method for manufacturing the same
    • 超发光二极管及其制造方法
    • US5981978A
    • 1999-11-09
    • US671366
    • 1996-06-27
    • Masato MushiageTatsuo YamauchiYukio Shakuda
    • Masato MushiageTatsuo YamauchiYukio Shakuda
    • H01L33/00H01L33/14H01L33/44H01S3/19
    • H01L33/0045H01L33/145H01L33/44
    • A superluminiscent diode includes: a semiconductor substrate of a first conductivity type lower cladding layer of the first conductivity type is provided on the semiconductor substrate. An active layer is provided on the lower cladding layer. An upper cladding layer of a second conductivity type opposite to the first conductivity type bis provided on the active layer. A current blocking layer of the first conductivity type, buried in the upper cladding layer. The current blocking layer has a stripe-shaped groove serving as a current-injection region. The current-injection region is formed in a manner that is extends from an end face of a chip to the inside of the chip, and has a length shorter than that of the chip. The current blocking layer is made of a material having a band gap energy not greater than that of the active layer and a refractive index not smaller than that of the active layer so that light advancing in the active layer is absorbable.
    • 超发光二极管包括:第一导电类型的第一导电型下包层的半导体衬底设置在半导体衬底上。 在下包层上设置有源层。 在有源层上设置与第一导电类型相反的第二导电类型的上包层。 第一导电类型的电流阻挡层,埋在上覆层中。 电流阻挡层具有用作电流注入区域的条形槽。 电流注入区域以从芯片的端面延伸到芯片的内部的方式形成,并且其长度短于芯片的长度。 电流阻挡层由具有不大于有源层的带隙能量且不小于有源层的折射率的材料制成,使得在有源层中前进的光是可吸收的。
    • 17. 发明授权
    • Nitride semiconductor device having a zinc-based substrate
    • 具有锌基衬底的氮化物半导体器件
    • US07977703B2
    • 2011-07-12
    • US12085327
    • 2006-11-21
    • Yukio Shakuda
    • Yukio Shakuda
    • H01L29/24H01L33/00H01L29/06H01L31/0328H01L31/0336H01L31/072H01L31/109H01L29/205H01L29/22
    • H01L33/007H01L21/02403H01L21/02414H01L21/02433H01L21/02458H01L21/0254H01L21/02636H01S5/0218H01S5/32341H01S2304/04H01S2304/12
    • A nitride semiconductor device includes a semiconductor substrate; a first nitride semiconductor layer provided on the semiconductor substrate; a mask layer having opening portions, provided on the first nitride semiconductor layer; a second nitride semiconductor layer selectively grown on the mask layer laterally from the opening portions; and a semiconductor lamination portion formed by laminating nitride semiconductor layers so as to form a semiconductor element on the second nitride semiconductor layer. The substrate may be made of a zinc-based compound, the first nitride semiconductor layer may be provided on, and in contact with, the substrate, and at least a substrate side of the first nitride semiconductor layer may be made of AlyGa1-yN (0.05≦y≦0.2). Additionally, the semiconductor element may be a light emitting layer in which case the mask layer may include a metal film provided on the first nitride semiconductor layer and an insulating film provided on the metal film.
    • 氮化物半导体器件包括半导体衬底; 设置在所述半导体基板上的第一氮化物半导体层; 具有开口部的掩模层,设置在所述第一氮化物半导体层上; 从所述开口部侧向选择性地在所述掩模层上生长的第二氮化物半导体层; 以及通过层叠氮化物半导体层以在第二氮化物半导体层上形成半导体元件而形成的半导体层叠部。 衬底可以由锌基化合物制成,第一氮化物半导体层可以设置在衬底上并与衬底接触,并且第一氮化物半导体层的至少衬底侧可以由Al y Ga 1-y N( 0.05≦̸ y≦̸ 0.2)。 此外,半导体元件可以是发光层,在这种情况下,掩模层可以包括设置在第一氮化物半导体层上的金属膜和设置在金属膜上的绝缘膜。
    • 18. 发明授权
    • Nitride semiconductor light emitting device having ridge parts
    • 具有脊部的氮化物半导体发光元件
    • US07973321B2
    • 2011-07-05
    • US12289848
    • 2008-11-05
    • Yukio Shakuda
    • Yukio Shakuda
    • H01L27/15
    • H01L33/20H01L33/32
    • As an example of a nitride semiconductor light emitting device, on a sapphire substrate, a GaN buffer layer, an n-type GaN contact layer, an MQW active layer, and a p-type GaN contact layer are sequentially stacked, and a partial region from the p-type GaN contact layer to the middle of the n-type GaN contact layer is mesa-etched so as to form an n electrode. Meanwhile, a p electrode is provided on the p-type GaN contact layer, and, in addition to the p electrode, multiple ridge parts are formed by crystal growth so as to be scattered. By providing the multiple ridge parts, device characteristics can be improved without causing damage on the GaN-based semiconductor layer.
    • 作为氮化物半导体发光器件的例子,在蓝宝石衬底上依次层叠有GaN缓冲层,n型GaN接触层,MQW有源层和p型GaN接触层,部分区域 从p型GaN接触层到n型GaN接触层的中间进行台面蚀刻,以形成n电极。 同时,在p型GaN接触层上设置p电极,并且除了p电极之外,通过晶体生长形成多个脊部以便散射。 通过提供多个脊部,可以改善器件特性,而不会对GaN基半导体层造成损害。
    • 19. 发明授权
    • Light emitting device
    • 发光装置
    • US07902770B2
    • 2011-03-08
    • US12094091
    • 2006-11-15
    • Yukio Shakuda
    • Yukio Shakuda
    • H05B37/02
    • H05B33/089H05B33/0812H05B33/0827Y02B20/341
    • A light emitting element group includes a plurality of light emitting element units connected in series. A first current limiting circuit is arranged in series with the light emitting element group, and limits a first drive current flowing from one end to the other end of the light emitting element group. A second current limiting circuit is arranged in parallel to the first current limiting circuit, and limits a second drive current flowing in an opposite direction to the first drive current in the light emitting element group. The light emitting element units are configured to include a first light emitting element and a second light emitting element; an anode of the first light emitting element and a cathode of the second light emitting element are connected, and an anode of the second light emitting element and a cathode of the first light emitting element are connected.
    • 发光元件组包括串联连接的多个发光元件单元。 第一限流电路与发光元件组串联布置,并且限制从发光元件组的一端流到另一端的第一驱动电流。 第二限流电路与第一限流电路并联设置,并限制在与发光元件组中的第一驱动电流相反的方向上流动的第二驱动电流。 发光元件单元被配置为包括第一发光元件和第二发光元件; 连接第一发光元件的阳极和第二发光元件的阴极,并且连接第二发光元件的阳极和第一发光元件的阴极。
    • 20. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US07847305B2
    • 2010-12-07
    • US12226007
    • 2007-04-03
    • Yukio Shakuda
    • Yukio Shakuda
    • H01L33/00
    • H01L33/0004H01L25/0753H01L2924/0002H01L2924/00
    • A plurality of transistors are formed on a substrate in a plurality of columns. Each transistor has a first conductivity type region and second conductivity type regions provided on both sides thereof in a column direction, and has an active layer on the side of each second conductivity type region closer to the substrate. Between two columns adjacent to each other, the second conductivity type region on a first side in the column direction of each transistor arranged on a first column, the second conductivity type region on a second side in the column direction of the transistor adjacent to this transistor on the first side in the column direction and the first conductivity type region of each transistor arranged on a second column are electrically connected by a first wire. Between these two columns, the second conductivity type region on the first side in the column direction of each transistor arranged on the second column, the second conductivity type region on the second side in the column direction of the transistor adjacent to this transistor on the first side in the column direction and the first conductivity type region of each transistor arranged on the first column are electrically connected by a second wire.
    • 在多个列中的基板上形成多个晶体管。 每个晶体管具有沿列方向设置在其两侧的第一导电类型区域和第二导电类型区域,并且在靠近基板的每个第二导电类型区域的侧面上具有有源层。 在彼此相邻的两列之间,布置在第一列上的每个晶体管的列方向上的第一侧上的第二导电类型区域,与该晶体管相邻的晶体管的列方向上的第二侧上的第二导电类型区域 在列方向的第一侧和布置在第二列上的每个晶体管的第一导电类型区域通过第一布线电连接。 在这两列之间,布置在第二列上的每个晶体管的列方向上的第一侧的第二导电类型区域与第一列上与该晶体管相邻的晶体管的列方向上的第二侧上的第二导电类型区域 配置在第一列的每个晶体管的第一导电类型区域通过第二导线电连接。