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11. 发明申请

US20130144419A1 INTEGRATED CIRCUIT MANUFACTURING TOOL CONDITION MONITORING SYSTEM AND METHOD 有权
标题翻译：集成电路制造工具条件监控系统及方法
公开(公告)号：US20130144419A1
公开(公告)日：2013-06-06
申请号：US13308644
申请日：2011-12-01
申请人： Po-Feng Tsai , Chia-Tong Ho , Sunny Wu , Jo Fei Wang , Jong-I Mou , Chin-Hsiang Lin
发明人： Po-Feng Tsai , Chia-Tong Ho , Sunny Wu , Jo Fei Wang , Jong-I Mou , Chin-Hsiang Lin
IPC分类号： G06F19/00
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A system and method for monitoring a process tool of an integrated circuit manufacturing system are disclosed. An exemplary method includes defining zones of an integrated circuit manufacturing process tool; grouping parameters of the integrated circuit manufacturing process tool based on the defined zones; and evaluating a condition of the integrated circuit manufacturing process tool based on the grouped parameters.
摘要翻译：公开了一种用于监控集成电路制造系统的处理工具的系统和方法。示例性方法包括限定集成电路制造工艺工具的区域; 基于定义的区域对集成电路制造工艺工具进行分组参数; 并基于分组的参数来评估集成电路制造处理工具的状况。

12. 发明授权

US08437870B2 System and method for implementing a virtual metrology advanced process control platform 有权
标题翻译：实现虚拟计量先进过程控制平台的系统和方法
公开(公告)号：US08437870B2
公开(公告)日：2013-05-07
申请号：US12478956
申请日：2009-06-05
申请人： Po-Feng Tsai , Andy Tsen , Jin-Ning Sung
发明人： Po-Feng Tsai , Andy Tsen , Jin-Ning Sung
IPC分类号： G06F17/50
CPC分类号： G01R31/2894 , H01L22/12 , H01L22/20
摘要： System and method for implementing a VM APC platform are described. In one embodiment, the VM APC system comprises a process tool for processing a plurality of wafers, a metrology tool for measuring a sample wafer of the plurality of wafers and generating actual metrology data therefor, and a VM model for predicting metrology data for each of the plurality of wafers. The actual metrology data is received from the metrology tool and used to update the VM model. Key variables of the virtual metrology model are updated only in response to a determination that the VM model is inaccurate and parameters of the VM model are updated responsive to receipt of the actual metrology data for the sample wafer of the plurality of wafers. The system also includes an APC controller for receiving the predicted metrology data and the actual metrology data and controlling an operation of the process tool based on the received data.
摘要翻译：描述了实现VM APC平台的系统和方法。在一个实施例中，VM APC系统包括用于处理多个晶片的处理工具，用于测量多个晶片中的样品晶片并产生其实际测量数据的计量工具，以及用于预测每个晶片的测量数据的VM模型多个晶片。实际计量数据从计量工具中接收并用于更新VM模型。虚拟测量模型的关键变量仅在响应于确定VM模型不准确并且响应于接收到多个晶片的样本晶片的实际测量数据来更新VM模型的参数而被更新。该系统还包括用于接收预测计量数据和实际计量数据的APC控制器，并且基于接收到的数据来控制处理工具的操作。

13. 发明授权

US08406912B2 System and method for data mining and feature tracking for fab-wide prediction and control 有权
标题翻译：用于晶圆厂预测和控制的数据挖掘和特征跟踪的系统和方法
公开(公告)号：US08406912B2
公开(公告)日：2013-03-26
申请号：US12823351
申请日：2010-06-25
申请人： Jui-Long Chen , Chia-Tong Ho , Po-Feng Tsai , Hui-Yun Chao , Jong-I Mou
发明人： Jui-Long Chen , Chia-Tong Ho , Po-Feng Tsai , Hui-Yun Chao , Jong-I Mou
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32191 , G05B2219/35082 , Y02P90/22 , Y02P90/265
摘要： System and method for data mining and feature tracking for fab-wide prediction and control are described. One embodiment is a system comprising a database for storing raw wafer manufacturing data; a data mining module for processing the raw wafer manufacturing data to select the best data therefrom in accordance with at least one of a plurality of knowledge-, statistic-, and effect-based processes; and a feature tracking module associated with the data mining module and comprising a self-learning model wherein a sensitivity of the self-learning model is dynamically tuned to meet real-time production circumstances, the feature tracking module receiving the selected data from the data mining module and generating prediction and control data therefrom; wherein the prediction and control data are used to control future processes in the wafer fabrication facility.
摘要翻译：描述了用于晶圆厂预测和控制的数据挖掘和特征跟踪的系统和方法。一个实施例是包括用于存储原始晶片制造数据的数据库的系统; 数据挖掘模块，用于根据多个基于知识，统计和效果的过程中的至少一个来处理原始晶片制造数据以从其中选择最佳数据; 以及与所述数据挖掘模块相关联并且包括自学习模型的特征跟踪模块，其中自学习模型的灵敏度被动态调整以满足实时生产环境，所述特征跟踪模块从所述数据挖掘接收所选择的数据模块并从其生成预测和控制数据; 其中预测和控制数据用于控制晶片制造设备中的未来工艺。

14. 发明申请

US20120130525A1 ADAPTIVE AND AUTOMATIC DETERMINATION OF SYSTEM PARAMETERS 有权
标题翻译：自适应和自动确定系统参数
公开(公告)号：US20120130525A1
公开(公告)日：2012-05-24
申请号：US13006571
申请日：2011-01-14
申请人： Po-Feng TSAI , Chia-Tong HO , Sunny WU , Jo Fei WANG , Jong-I MOU
发明人： Po-Feng TSAI , Chia-Tong HO , Sunny WU , Jo Fei WANG , Jong-I MOU
IPC分类号： G06F19/00
CPC分类号： G05B13/0265 , G05B19/41875 , G05B2219/32188 , G05B2219/32189 , G05B2219/45031 , Y02P90/22 , Y02P90/86
摘要： A MIMO optimizer is used to identify tunable process parameters for processing equipment.
摘要翻译： MIMO优化器用于识别处理设备的可调工艺参数。

15. 发明申请

US20050075993A1 Process controlling method with merged two-control loops 有权
标题翻译：具有合并双控制回路的过程控制方法
公开(公告)号：US20050075993A1
公开(公告)日：2005-04-07
申请号：US10862579
申请日：2004-06-08
申请人： Shi-Shang Jang , Po-Feng Tsai
发明人： Shi-Shang Jang , Po-Feng Tsai
IPC分类号： G05B13/02 , G06F17/00 , G06E1/00 , G06E3/00 , G06F15/00 , G06F15/18 , G06G7/00 , G06N3/06 , G06N3/063 , G06N3/067 , G06N3/10
CPC分类号： G05B13/027
摘要： The architecture of the controller of the present invention is mainly composed of three portions, which are a model predictive controller, a local controller (also called stably assistant controller), and a coordinator. This modified model predictive control structure merges two control loops by a coordinator. The control mode can be switched into either of them or provide a combined control action by adjustments of the coordinator. When the system moves out the range of the database, the coordinator will automatically detect the fault and switch to the stably assistant controller to provide the basic control quality to ensure the safety.
摘要翻译：本发明的控制器的架构主要由模型预测控制器，本地控制器（也称为稳定辅助控制器）和协调器三部分组成。该修改的模型预测控制结构由协调器合并两个控制回路。控制模式可以切换到其中之一，也可以通过调整协调器来提供组合的控制动作。当系统移出数据库的范围时，协调器将自动检测故障，切换到稳定的辅助控制器，提供基本的控制质量以确保安全。

16. 发明授权

US08549012B2 Processing exception handling 有权
标题翻译：处理异常处理
公开(公告)号：US08549012B2
公开(公告)日：2013-10-01
申请号：US12778855
申请日：2010-05-12
申请人： Po-Feng Tsai , Jin-Ning Sung , Yen-Di Tsen , Jo Fei Wang , Jong-I Mou
发明人： Po-Feng Tsai , Jin-Ning Sung , Yen-Di Tsen , Jo Fei Wang , Jong-I Mou
IPC分类号： G06F7/00 , G06F17/30
CPC分类号： G06F7/00 , G05B19/41865 , G05B2219/31352 , G05B2219/33303 , G06F17/30
摘要： In accordance with an embodiment, a method for exception handling comprises accessing an exception type for an exception, filtering historical data based on at least one defined criterion to provide a data train comprising data sets, assigning a weight to each data set, and providing a current control parameter. The data sets each comprise a historical condition and a historical control parameter, and the weight assigned to each data set is based on each historical condition. The current control parameter is provided using the weight and the historical control parameter for each data set.
摘要翻译：根据实施例，用于异常处理的方法包括访问异常的异常类型，基于至少一个定义的标准过滤历史数据，以提供包括数据集的数据队列，为每个数据集分配权重，以及提供电流控制参数。数据集各自包含历史条件和历史控制参数，并且分配给每个数据集的权重基于每个历史条件。使用每个数据集的权重和历史控制参数提供当前的控制参数。

17. 发明授权

US08394719B2 System and method for implementing multi-resolution advanced process control 有权
标题翻译：实现多分辨率高级过程控制的系统和方法
公开(公告)号：US08394719B2
公开(公告)日：2013-03-12
申请号：US13106711
申请日：2011-05-12
申请人： Andy Tsen , Jin-Ning Sung , Po-Feng Tsai , Jong-I Mou , Yen-Wei Cheng
发明人： Andy Tsen , Jin-Ning Sung , Po-Feng Tsai , Jong-I Mou , Yen-Wei Cheng
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L22/20 , G05B19/41875 , H01L22/12 , Y02P90/22 , Y02P90/26
摘要： System and method for implementing multi-resolution advanced process control (“APC”) are described. One embodiment is a method including obtaining low resolution metrology data and high resolution metrology data related to a process module for performing a process on the wafer. A process variable of the process is modeled as a function of the low resolution metrology data to generate a low-resolution process model and the process variable is modeled as a function of the high resolution metrology data to generate a high-resolution process model. The method further includes calibrating the low resolution process model; combining the calibrated low resolution process model with the high resolution process model to generate a multi-resolution process model that models the process variable as a function of both the low resolution metrology data and the high resolution metrology data; and analyzing a response of the multi-resolution process model and the low and high resolution metrology data to control performance of a process module.
摘要翻译：描述了实现多分辨率高级过程控制（APC）的系统和方法。一个实施例是一种方法，包括获得与用于在晶片上执行处理的处理模块相关的低分辨率度量数据和高分辨率度量数据。该过程的过程变量被模型化为低分辨率度量数据的函数，以生成低分辨率过程模型，并且将过程变量建模为高分辨率度量数据的函数以生成高分辨率过程模型。该方法还包括校准低分辨率过程模型; 将校准的低分辨率过程模型与高分辨率过程模型相结合，以生成多分辨率过程模型，其将过程变量建模为低分辨率度量数据和高分辨率度量数据的函数; 并分析多分辨率过程模型和低分辨率和高分辨率度量数据的响应，以控制过程模块的性能。

18. 发明申请

US20110301736A1 APC Model Extension Using Existing APC Models 有权
标题翻译： APC型号扩展使用现有的APC型号
公开(公告)号：US20110301736A1
公开(公告)日：2011-12-08
申请号：US12793307
申请日：2010-06-03
申请人： Po-Feng Tsai , Yen-Di Tsen , Jo Fei Wang , Jong-I Mou
发明人： Po-Feng Tsai , Yen-Di Tsen , Jo Fei Wang , Jong-I Mou
IPC分类号： G06F17/50
CPC分类号： G05B17/02 , H01L22/20
摘要： A method of extending advanced process control (APC) models includes constructing an APC model table including APC model parameters of a plurality of products and a plurality of work stations. The APC model table includes empty cells and cells filled with existing APC model parameters. Average APC model parameters of the existing APC model parameters are calculated, and filled into the empty cells as initial values. An iterative calculation is performed to update the empty cells with updated values.
摘要翻译：扩展先进过程控制（APC）模型的方法包括构建包括多个产品的APC模型参数和多个工作站的APC模型表。 APC模型表包括空单元格和填充有现有APC模型参数的单元格。计算现有APC模型参数的平均APC模型参数，并作为初始值填充到空单元格中。执行迭代计算以更新值更新空单元格。

19. 发明申请

US20100255613A1 SYSTEM AND METHOD FOR IMPLEMENTING MULTI-RESOLUTION ADVANCED PROCESS CONTROL 有权
标题翻译：用于实施多分辨率高级过程控制的系统和方法
公开(公告)号：US20100255613A1
公开(公告)日：2010-10-07
申请号：US12416595
申请日：2009-04-01
申请人： Andy Tsen , Jin-Ning Sung , Po-Feng Tsai , Jong-I Mou
发明人： Andy Tsen , Jin-Ning Sung , Po-Feng Tsai , Jong-I Mou
IPC分类号： H01L21/66 , H01L21/306
CPC分类号： G05B19/41875 , H01L22/12 , H01L22/20 , Y02P90/22 , Y02P90/26
摘要： System and method for implementing multi-resolution advanced process control (“APC”) are described. One embodiment is a method for fabricating ICs from a semiconductor wafer comprising performing a first process on the semiconductor wafer; taking a first measurement indicative of an accuracy with which the first process was performed; and using the first measurement to generate metrology calibration data, wherein the metrology calibration data includes an effective portion and a non-effective portion. The method further comprises removing the non-effective portion from the metrology calibration data and modeling the effective portion with a metrology calibration model; combining the metrology calibration model with a first process model to generate a multi-resolution model, wherein the first process model models an input-output relationship of the first process; and analyzing a response of the multi-resolution model and second measurement data to control performance a second process.
摘要翻译：描述了用于实现多分辨率高级过程控制（“APC”）的系统和方法。一个实施例是一种用于从半导体晶片制造IC的方法，包括在半导体晶片上执行第一工艺; 进行第一次测量，表明执行第一个处理的精度; 以及使用所述第一测量来产生计量学校准数据，其中所述计量学校准数据包括有效部分和非有效部分。该方法还包括从计量校准数据中去除非有效部分并用计量校准模型对有效部分进行建模; 将所述计量校准模型与第一过程模型结合以生成多分辨率模型，其中所述第一过程模型对所述第一过程的输入 - 输出关系建模; 以及分析所述多分辨率模型和第二测量数据的响应以控制第二过程的性能。

20. 发明申请

US20100234970A1 METHOD AND APPARATUS FOR ADVANCED PROCESS CONTROL 有权
标题翻译：高级过程控制的方法和装置
公开(公告)号：US20100234970A1
公开(公告)日：2010-09-16
申请号：US12404120
申请日：2009-03-13
申请人： Po-Feng Tsai , Andy Tsen
发明人： Po-Feng Tsai , Andy Tsen
IPC分类号： G05B19/04 , G05B13/02
CPC分类号： G05B13/024 , H01L22/12 , H01L22/20
摘要： A method includes: initializing first and second variables; operating equipment based on the variables; measuring first and second parameters; determining a new value for the first variable based on the first parameter, and calculating a new value for the second variable based on the second parameter and the current value of the second variable; and repeating the operating, measuring, determining and calculating. According to a different aspect, an apparatus includes a computer-readable medium storing a computer program. When executed, the program causes: initializing of first and second variables; operating equipment based on the variables; receiving measured first and second parameters; determining a new value for the first variable based on the first parameter, and calculating a new value for the second variable based on the second parameter and the current value of the second variable; and repeating the operating, measuring, determining and calculating.
摘要翻译：一种方法包括：初始化第一和第二变量; 基于变量的操作设备; 测量第一和第二参数; 基于第一参数确定第一变量的新值，并且基于第二参数和第二变量的当前值来计算第二变量的新值; 并重复操作，测量，确定和计算。根据不同方面，一种装置包括存储计算机程序的计算机可读介质。程序执行时，会导致：初始化第一个和第二个变量; 基于变量的操作设备; 接收测量的第一和第二参数; 基于第一参数确定第一变量的新值，并且基于第二参数和第二变量的当前值来计算第二变量的新值; 并重复操作，测量，确定和计算。

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