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11. 发明授权

US06270390B1 Method for making electron gun 失效
标题翻译：电子枪制作方法
公开(公告)号：US06270390B1
公开(公告)日：2001-08-07
申请号：US09593137
申请日：2000-06-14
申请人： Masatoshi Kudoh , Ryuichi Murai , Mitsuhiro Ohtani , Katuyoshi Yamashita , Hideharu Ohmae , Masahiko Konda
发明人： Masatoshi Kudoh , Ryuichi Murai , Mitsuhiro Ohtani , Katuyoshi Yamashita , Hideharu Ohmae , Masahiko Konda
IPC分类号： H01J902
CPC分类号： H01J9/02 , H01J9/42 , H01J2229/48
摘要： Method and apparatus for manufacturing an electron gun. A beam spot coefficient is obtained from an electrostatic lens magnification and a spherical aberration coefficient of a set resistance distribution. Then, a first process loop is executed to select another resistance distribution that provides an approximate minimum value of the beam spot coefficient. It is then determined whether the beam spot coefficient is an approximate minimum value. The first process loop is repeatedly executed until the beam spot coefficient is determined to be equal to the approximate minimum value. At this point, a second process loop is executed to confirm the minimum value of the beam spot coefficient using an aberration-independent function that is dependent upon the electrostatic lens magnification and is not dependent upon the spherical aberration coefficient. Processing returns to the first process loop using still another resistance distribution as a selected resistance distribution when the beam spot coefficient is not the approximate minimum value.
摘要翻译：电子枪制造方法及装置。从静电透镜放大率和设定的电阻分布的球面像差系数获得束斑系数。然后，执行第一处理循环以选择提供束斑系数的近似最小值的另一电阻分布。然后确定束斑系数是否是近似最小值。重复执行第一处理循环，直到确定束斑系数等于近似最小值。此时，执行第二处理循环，以使用取决于静电透镜倍率的像差独立函数来确认束斑系数的最小值，并且不依赖于球面像差系数。当光斑系数不是近似最小值时，处理返回到第一处理循环，使用另一个电阻分布作为选择的电阻分布。

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