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    • 11. 发明授权
    • Susceptor designs for silicon carbide thin films
    • Susceptor设计了碳化硅薄膜
    • US06217662B1
    • 2001-04-17
    • US08823365
    • 1997-03-24
    • Hua-Shuang KongCalvin Carter, Jr.Joseph Sumakeris
    • Hua-Shuang KongCalvin Carter, Jr.Joseph Sumakeris
    • C23C1600
    • C23C16/4582C30B25/12
    • A susceptor is disclosed for minimizing or eliminating thermal gradients that affect a substrate wafer during epitaxial growth. The susceptor comprises a first susceptor portion including a surface for receiving a semiconductor substrate wafer thereon, and a second susceptor portion facing the substrate-receiving surface and spaced from the substrate-receiving surface. The spacing is sufficiently large to permit the flow of gases therebetween for epitaxial growth on a substrate on the surface, while small enough for the second susceptor portion to heat the exposed face of a substrate to substantially the same temperature as the first susceptor portion heats the face of a substrate that is in direct contact with the substrate-receiving surface.
    • 公开了用于在外延生长期间最小化或消除影响衬底晶片的热梯度的感受器。 基座包括第一基座部分,其包括用于在其上接收半导体衬底晶片的表面,以及面对基板接收表面并与基板接收表面间隔开的第二基座部分。 间隔足够大以允许它们之间的气体流动在表面上的衬底上进行外延生长,同时足够小以使第二基座部分将衬底的暴露面加热到与第一基座部分加热的基本相同的温度 与基板接收表面直接接触的基板的表面。