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11. 发明申请

US20090249198A1 TECHNIQUES FOR INPUT RECOGNITON AND COMPLETION 审中-公开
标题翻译：输入识别技术和完成
公开(公告)号：US20090249198A1
公开(公告)日：2009-10-01
申请号：US12183918
申请日：2008-07-31
申请人： Marc Eliot Davis , Joseph O'Sullivan , Christopher Todd Paretti , Ronald Martinez , Chris W. Higgins , Athellina Athsani , Marco Boerries , Edward Stanley Ott, IV , Keith David Saft , George Grinsted , Lee John Parry , Ben Kim , Steven Antonio Jackson, II
发明人： Marc Eliot Davis , Joseph O'Sullivan , Christopher Todd Paretti , Ronald Martinez , Chris W. Higgins , Athellina Athsani , Marco Boerries , Edward Stanley Ott, IV , Keith David Saft , George Grinsted , Lee John Parry , Ben Kim , Steven Antonio Jackson, II
IPC分类号： G06F3/048
CPC分类号： G06F17/276 , G06F17/277 , G06F17/2785
摘要： Methods and apparatus are described by which one or more input words may be predicted based on partial input from a user using a predictive model that employs contextual metadata which characterizes the user in a multi-dimensional space in which the dimensions are defined by one or more of a spatial aspect, a temporal aspect, a social aspect, or a topical aspect.
摘要翻译：描述方法和装置，其中可以基于来自用户的使用预测模型的部分输入来预测一个或多个输入字，所述预测模型采用在多维空间中表征用户的上下文元数据，所述多维空间中的维度由一个或多个空间方面，时间方面，社会方面或主题方面。

12. 发明授权

US07556972B2 Detection and characterization of SiCOH-based dielectric materials during device fabrication 失效
标题翻译：在器件制造过程中SiCOH基介电材料的检测和表征
公开(公告)号：US07556972B2
公开(公告)日：2009-07-07
申请号：US11626975
申请日：2007-01-25
申请人： Manoj Balachandran , James A. Hagan , Ben Kim , Deoram Persaud , Adam D. Ticknor , Wei-tsu Tseng
发明人： Manoj Balachandran , James A. Hagan , Ben Kim , Deoram Persaud , Adam D. Ticknor , Wei-tsu Tseng
IPC分类号： G01R31/26 , H01L21/00 , H01L21/302
CPC分类号： B24B57/02 , B24B37/04
摘要： Processes and apparatuses are disclosed for detecting and characterizing SiCOH-based dielectric materials during integrated circuit fabrication. The processes generally include chromatographically analyzing a fluid stream generated during a process employed for device fabrication, e.g., during a wet strip, a chemical mechanical planarization process and the like.
摘要翻译：公开了用于在集成电路制造期间检测和表征SiCOH基介电材料的方法和装置。这些方法通常包括色谱分析在用于器件制造的工艺中产生的流体流，例如在湿条，化学机械平面化工艺等期间。

13. 发明申请

US20080182335A1 DETECTION AND CHARACTERIZATION OF SiCOH-BASED DIELECTRIC MATERIALS DURING DEVICE FABRICATION 失效
标题翻译：器件制造过程中SiCOH基介电材料的检测与表征
公开(公告)号：US20080182335A1
公开(公告)日：2008-07-31
申请号：US11626975
申请日：2007-01-25
申请人： Manoj Balachandran , James A. Hagan , Ben Kim , Deoram Persaud , Adam D. Ticknor , Wei-Tsu Tseng
发明人： Manoj Balachandran , James A. Hagan , Ben Kim , Deoram Persaud , Adam D. Ticknor , Wei-Tsu Tseng
IPC分类号： H01L21/66 , B24B3/00
CPC分类号： B24B57/02 , B24B37/04
摘要： Processes and apparatuses are disclosed for detecting and characterizing SiCOH-based dielectric materials during integrated circuit fabrication. The processes generally include chromatographically analyzing a fluid stream generated during a process employed for device fabrication, e.g., during a wet strip, a chemical mechanical planarization process and the like.
摘要翻译：公开了用于在集成电路制造期间检测和表征SiCOH基介电材料的方法和装置。这些方法通常包括色谱分析在用于器件制造的工艺中产生的流体流，例如在湿条，化学机械平面化工艺等期间。

14. 发明授权

US06356653B2 Method and apparatus for combined particle location and removal 失效
标题翻译：用于组合颗粒定位和去除的方法和装置
公开(公告)号：US06356653B2
公开(公告)日：2002-03-12
申请号：US09116680
申请日：1998-07-16
申请人： Jeffrey A. Brigante , Glenn W. Gale , Maurice R. Hevey , Frederick W. Kern, Jr. , Ben Kim , Joel M. Sharrow , William A. Syverson
发明人： Jeffrey A. Brigante , Glenn W. Gale , Maurice R. Hevey , Frederick W. Kern, Jr. , Ben Kim , Joel M. Sharrow , William A. Syverson
IPC分类号： G06K900
CPC分类号： H01L22/20 , H01L21/268
摘要： A method for removing one or more particles from a surface of an object is provided. The method has first and second steps of detecting and locating the one or more particles on the surface of the object. In a third step, focused energy is directed onto one or more of the detected particles to break a bond energy between the one or more particles and the surface thereby removing the one or more particles from the surface. In preferred variations of the method of the present invention, the object is a semiconductor wafer and the directed focused energy is in the form of a laser. Also provided is an apparatus for removing the plurality of particles from the surface of the object. The apparatus includes a detector for detecting and locating the plurality of particles on the surface of the object, and a laser for directing focused energy on one or more of the detected particles to break a bond energy between the one or more particles and the surface thereby removing the one or more particles from the surface.
摘要翻译：提供了从物体表面去除一个或多个颗粒的方法。该方法具有检测和定位物体表面上的一个或多个颗粒的第一和第二步骤。在第三步骤中，将聚焦的能量引导到一个或多个检测到的颗粒上以破坏一个或多个颗粒与表面之间的键能，从而从表面除去一个或多个颗粒。在本发明方法的优选变型中，目的是半导体晶片，并且定向的聚焦能是激光的形式。还提供了用于从物体的表面去除多个颗粒的装置。该装置包括用于检测和定位物体表面上的多个颗粒的检测器和用于将聚焦能量引导到一个或多个检测到的颗粒上的激光器，以破坏一个或多个颗粒与表面之间的结合能，由此从表面去除一个或多个颗粒。

15. 发明授权

US08170584B2 Providing an actionable event in an intercepted text message for a mobile device based on customized user information 有权
标题翻译：基于定制的用户信息，在移动设备的拦截文本消息中提供可操作的事件
公开(公告)号：US08170584B2
公开(公告)日：2012-05-01
申请号：US11422534
申请日：2006-06-06
申请人： Ben Kim , Irvin Henderson , Tong Zhu
发明人： Ben Kim , Irvin Henderson , Tong Zhu
IPC分类号： H04W24/00
CPC分类号： H04L67/306 , G06Q30/02 , H04L51/063 , H04L51/38 , H04L63/166 , H04W4/00 , H04W4/14 , H04W4/18 , H04W8/18
摘要： A network device, method, and apparatus are directed towards intercepting a message, such as an SMS, EMS, MMS message, email message, or the like, from a source device directed towards a mobile device. The intercepted message's contents are analyzed. In addition, a mobile user profile is determined from characteristics of the mobile device and tracked usage of a mobile user of the mobile device. An actionable event may then be inserted into the intercepted message based, in part, on the analysis and the mobile user profile. The modified message is then provided to the mobile device, where the mobile user may select the actionable event to receive non-requested content.
摘要翻译：网络设备，方法和设备被指向从指向移动设备的源设备拦截诸如SMS，EMS，MMS消息，电子邮件消息等的消息。对截取的消息内容进行分析。此外，移动用户简档由移动设备的特征和移动设备的移动用户的跟踪使用来确定。然后可以部分地基于分析和移动用户简档将可操作的事件插入被拦截的消息中。然后将修改的消息提供给移动设备，其中移动用户可以选择可操作事件来接收未请求的内容。

16. 发明申请

US20090109978A1 Application interface for global mobile message delivery 有权
标题翻译：用于全球移动邮件传送的应用程序界面
公开(公告)号：US20090109978A1
公开(公告)日：2009-04-30
申请号：US11981980
申请日：2007-10-31
申请人： Tong Zhu , Zhaowei Charlie Jiang , Ben Kim , Kenneth Tsz Ho , Jiuhe Gan , Venkata Narasimha Rao Yerubandi , Daniel John Woods
发明人： Tong Zhu , Zhaowei Charlie Jiang , Ben Kim , Kenneth Tsz Ho , Jiuhe Gan , Venkata Narasimha Rao Yerubandi , Daniel John Woods
IPC分类号： H04L12/28 , H04L12/56 , H04L12/66 , H04M1/00
CPC分类号： H04W4/12 , H04L51/38
摘要： A device, system, and method are directed towards communicating mobile information over a network. A mobile message (MM) is generated by an Internet Protocol (IP) enabled application interface. The MM may include advertising information. The MM is received at a routing server and comprises a destination phone number and/or advertising information. If the MM is determined to be locally processed, the routing server selectively routes the MM to a destination carrier associated with the destination phone number. If the MM is determined to be remotely processed, the MM is recursively forwarded until the MM reaches another routing server associated with the destination phone number. The other routing server is configured to selectively route the MM to the destination carrier. A response MM may be received at a boundary routing server. The response MM may be sent to the API if at least a portion of the response MM matches information associated with the MM.
摘要翻译：设备，系统和方法旨在通过网络传送移动信息。移动消息（MM）由启用因特网协议（IP）的应用接口生成。 MM可以包括广告信息。 MM在路由服务器处被接收并且包括目的地电话号码和/或广告信息。如果确定MM被本地处理，则路由选择服务器选择性地将MM路由到与目的地电话号码相关联的目的地载波。如果确定MM被远程处理，则MM被递归转发，直到MM到达与目的地电话号码相关联的另一个路由服务器。另一路由服务器被配置为选择性地将MM路由到目的地载波。可以在边界路由服务器处接收响应MM。如果响应MM的至少一部分匹配与MM相关联的信息，则可以将响应MM发送到API。

17. 发明授权

US07510463B2 Extended life conditioning disk 失效
标题翻译：延长寿命调节盘
公开(公告)号：US07510463B2
公开(公告)日：2009-03-31
申请号：US11422753
申请日：2006-06-07
申请人： Ben Kim , Manoj Balachandran , James Aloysius Hagan , Deoram Persaud , Adam Daniel Ticknor , Wei-tsu Tseng
发明人： Ben Kim , Manoj Balachandran , James Aloysius Hagan , Deoram Persaud , Adam Daniel Ticknor , Wei-tsu Tseng
IPC分类号： B24B1/00 , B24B21/18
CPC分类号： B24B53/017 , B24B53/12
摘要： The present invention is an apparatus and method for extending the life of abrasive disks used in the conditioning of polishing pads used in chemical mechanical planarization (CMP) of polishing pads used to polish and/or planarize the surfaces of semiconductor wafers during the production of integrated circuits. The invention consists of the a disk comprising a plurality of abrasive segments, each of which is fixed in tangential and radial relationship to one another about the common axis of rotation of the conditioning disk. Means are provided for movement of the abrasive segments, individually or in sets, into or out of the plane of the active abrasive surface of the conditioning disk according to the present invention.
摘要翻译：本发明是一种用于延长研磨盘的寿命的装置和方法，用于在用于在生产集成的半导体晶片的表面中抛光和/或平面化半导体晶片的表面的抛光垫的化学机械平面化（CMP）中使用的抛光垫电路。本发明由包括多个磨料段的盘组成，每个研磨段围绕调节盘的公共旋转轴线彼此以切向和径向关系固定。根据本发明，提供了用于将研磨段单独地或组合地移动到调节盘的活性研磨表面的平面内或外的装置。

18. 发明申请

US20070190788A1 WAFER REMOVING FORCE REDUCTION ON CMP TOOL 审中-公开
标题翻译：在CMP工具上减少减少的浪费
公开(公告)号：US20070190788A1
公开(公告)日：2007-08-16
申请号：US11276137
申请日：2006-02-15
申请人： Manoj Balachandran , James Hagan , Ben Kim , Deoram Persaud , Adam Ticknor , Wei-Tsu Tseng
发明人： Manoj Balachandran , James Hagan , Ben Kim , Deoram Persaud , Adam Ticknor , Wei-Tsu Tseng
IPC分类号： H01L21/302 , H01L21/461 , H01L21/311
CPC分类号： H01L21/02024 , B24B37/345
摘要： Reduction of a wafer removing force on a chemical mechanical planarization (CMP) tool that includes planarizing a wafer on a platen at a wafer/platen interface; applying carbonated water to the wafer/platen interface so as to reduce the removing force; and removing the wafer from the platen.
摘要翻译：在化学机械平面化（CMP）工具上减少晶片去除力，其包括在晶片/压板界面处平台化压板上的晶片; 将碳酸水施加到晶片/压板界面，以减少去除力; 并从压板上移除晶片。

19. 发明授权

US06343609B1 Cleaning with liquified gas and megasonics 失效
标题翻译：用液化天然气和超声波清洗
公开(公告)号：US06343609B1
公开(公告)日：2002-02-05
申请号：US09133889
申请日：1998-08-13
申请人： Ben Kim
发明人： Ben Kim
IPC分类号： B08B310
CPC分类号： H01L21/67051 , B08B3/02 , B08B7/0021 , B08B2203/0288 , Y10S134/902
摘要： An apparatus and method are provided for cleaning (removing) contaminating particles and/or films from substrate surfaces such as semiconductor wafers during the fabrication process for making electronic components. The method and apparatus use a liquified gas contained in a distributor which has been energized with megasonic energy in the distributor and the energized liquefied gas directed as a stream against the surface to be cleaned from an outlet distribution nozzle of the distributor. The stream is preferably impinged on the substrate surface at an acute angle. The preferred liquified gas is carbon dioxide.
摘要翻译：提供了一种装置和方法，用于在用于制造电子部件的制造过程中，从诸如半导体晶片的衬底表面清洁（去除）污染颗粒和/或膜。该方法和装置使用包含在分配器中的液化气体，该分配器已经在分配器中以兆声波能量通电，并且通电的液化气体以与分配器的出口分配喷嘴相对的待清洁表面相反的方式指向。流优选以锐角撞击在基板表面上。优选的液化气体是二氧化碳。

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