会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 131. 发明授权
    • Exposure method for color filter substrate
    • 滤色片基材的曝光方法
    • US08830610B2
    • 2014-09-09
    • US13522626
    • 2011-01-11
    • Kohei MatsuiRyosuke YasuiKeiichi TanakaTakenori Yoshizawa
    • Kohei MatsuiRyosuke YasuiKeiichi TanakaTakenori Yoshizawa
    • G02B5/22G02B5/20G02F1/1339G02F1/1335
    • G02B5/201G02F1/133516G02F1/13394
    • An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.
    • 提供曝光方法。 在图1(a)中, 如图8所示,在基板20沿Y方向传送的同时进行曝光,同时在基板20上分别在第一非显示区域51和显示区域形成第一层81和第91层。接着,在(b )。 如图8所示,基板20旋转90度,并且在基板20沿X方向传送的同时进行曝光,以在第二非显示区域52中形成第二层82。 如图8所示,在基板20上进行一次接近曝光,同时在第一非显示区域51中的第一层81上形成第三层83,在第二非显示区域52中形成第二层82上的第四层84, 92。
    • 140. 发明授权
    • Rinse treatment method and development process method
    • 冲洗处理方法和开发工艺方法
    • US07968278B2
    • 2011-06-28
    • US11578055
    • 2005-03-02
    • Yasuhiro TakakiOsamu MiyaharaKeiichi TanakaShinya WakamizuTakashi Terada
    • Yasuhiro TakakiOsamu MiyaharaKeiichi TanakaShinya WakamizuTakashi Terada
    • G03F7/26G03F7/30
    • H01L21/67051G03F7/3021
    • A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.
    • 在对其上设置的曝光图案进行显影处理之后,在基板上进行漂洗处理的漂洗方法包括在显影后从显影基板抛出显影液的工序(步骤5) 向基板供给水性清洗液的工序(工序6) 将含表面活性剂的冲洗液供给到基板上以用含表面活性剂的冲洗液取代残留在基板上的液体的步骤(STEP7) 以及使基板旋转以使基板上含表面活性剂的冲洗液体膨胀和脱落的工序(步骤8)。 步骤8被布置成供给含有表面活性剂的冲洗液,供给时间为5秒以下。 步骤9被布置成包括具有较低转数的第一周期和具有较高转数的第二周期,并且将第一周期中的基板的转数设定为大于300rpm且小于1,000rpm。