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    • 128. 发明授权
    • Processes for finishing glass surfaces
    • 玻璃表面处理工艺
    • US4343116A
    • 1982-08-10
    • US169217
    • 1980-07-15
    • Norman A. MurphyJohn G. BannerEdwin FletcherArthur Brown
    • Norman A. MurphyJohn G. BannerEdwin FletcherArthur Brown
    • G02B1/10C03C15/02B24B1/00B24B13/00
    • C03C15/02
    • A method of finishing a glass surface to a close tolerance and a substantially blemish-free state using a moving polishing lap and an aqueous treatment liquid containing inert abrasive particles, in which the treatment liquid also contains a bifluoride which reacts with the glass to form an insoluble silicofluoride or fluoride, an acid supplying hydrogen ions and a solubility suppressant which ensures that the silicofluoride or fluoride separates out on the glass surface, whereby the lap and inert particles remove the silicofluoride or fluoride from high portions of the glass surface and thereby allow further reaction and glass removal in those areas until the desired finished form of the glass surface has been achieved, whereupon the supply of treatment liquid is stopped and immediately replaced by a supply of an alkaline neutralizing solution, e.g., of sodium carbonate, containing inert particles and the surface is finally washed to remove the alkaline solution and any remaining neutralized treatment liquid.
    • 一种使用移动的抛光搭边和含有惰性磨料颗粒的水性处理液将玻璃表面精加工成紧密度和基本无污染的状态的方法,其中处理液体还含有与玻璃反应形成 不溶性氟化硅或氟化物,提供氢离子的酸和溶解抑制剂,其确保氟化硅或氟化物在玻璃表面上分离出来,由此搭搭和惰性颗粒从玻璃表面的高部分除去氟化硅或氟化物,从而进一步 在这些区域中的反应和玻璃去除,直到达到所需的玻璃表面形状,然后停止供应处理液体,并立即由含有惰性颗粒的碱性中和溶液(例如碳酸钠)代替, 最后洗涤表面以除去碱性溶液和任何残留的中性粒子 升级处理液。
    • 130. 发明授权
    • Method of chemically polishing a doubly rotated quartz plate
    • 化学抛光双重旋转的石英板的方法
    • US4274907A
    • 1981-06-23
    • US147778
    • 1980-05-08
    • John R. VigRonald J. Brandmayr
    • John R. VigRonald J. Brandmayr
    • C03C15/02C03C19/00C03C15/00
    • C03C15/02C03C19/00
    • At least one side of a doubly rotated quartz plate whose theta (.theta.) angle is between about 33.degree. and 36.degree. and whose phi (.phi.) angle is between about 10.degree. and 26.degree. is chemically polished by lapping the quartz plate with an abrasive and etching the lapped quartz plate in a fluoride type etchant selected from the group consisting of a 5 percent to 25 percent solution of hydrofluoric acid, a 5 percent to 50 percent solution of ammonium bifluoride, and a mixture of 40 percent ammonium fluoride with 49 percent hydrofluoric acid in the ratio ranging from about 1:3 to 10:1, the etching being carried out until a thickness is removed from the plate that is at least twice the average abrasive particle diameter in the final lapping abrasive.
    • 其θ(θ)角在33度和36度之间并且其phi(phi)角在大约10度和26度之间的双重旋转的石英板的至少一侧是通过研磨石英板与磨料 并且在氟化物型腐蚀剂中蚀刻所研磨的石英板,所述氟化物腐蚀剂选自5%至25%的氢氟酸溶液,5%至50%的氟化铵溶液,以及40%的氟化铵与49%的氟化铵的混合物 氢氟酸的比例范围为约1:3至10:1,进行蚀刻,直到从平板除去厚度至少为最终研磨磨料中平均磨粒直径的两倍。