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    • 129. 发明授权
    • Isolated metal plug process for use in fabricating carbon nanotube memory cells
    • 用于制造碳纳米管记忆单元的隔离金属塞工艺
    • US07884430B2
    • 2011-02-08
    • US12710477
    • 2010-02-23
    • Richard J. CarterPeter A. BurkeVerne C. HornbackThomas RueckesClaude L. Bertin
    • Richard J. CarterPeter A. BurkeVerne C. HornbackThomas RueckesClaude L. Bertin
    • H01L29/84
    • H01H1/0094Y10S977/724Y10S977/732Y10S977/943
    • The present invention is directed to structures and methods of fabricating electromechanical memory cells having nanotube crossbar elements. Such memory cells include a substrate having transistor with a contact that electrically contacts with the transistor. A first support layer is formed over the substrate with an opening that defines a lower chamber above the electrical contact. A nanotube crossbar element is arranged to span the lower chamber. A second support layer is formed with an opening that defines a top chamber above the lower chamber, the top chamber including an extension region that extends beyond an edge of the lower chamber to expose a portion of the top surface of the first support layer. A roof layer covers the top of the top chamber and includes an aperture that exposes a portion of the extension region of the top chamber and includes a plug that extends into the aperture in the roof layer to seal the top and bottom chambers. The memory cell further includes an electrode that overlies the crossbar element such that electrical signals can activate the electrode to attract or repel the crossbar element to set a memory state for the transistor.
    • 本发明涉及制造具有纳米管横杆元件的机电存储器单元的结构和方法。 这种存储单元包括具有与晶体管电接触的接触的晶体管的衬底。 第一支撑层形成在衬底上,其开口限定了电触点上方的下腔室。 纳米管横杆元件布置成跨越下室。 第二支撑层形成有开口,所述开口限定在所述下腔室上方的顶部腔室,所述顶部腔室包括延伸超出所述下部腔室的边缘以暴露所述第一支撑层的顶部表面的一部分的延伸区域。 屋顶层覆盖顶部室的顶部,并且包括露出顶部室的延伸区域的一部分并且包括延伸到顶部层中的孔中以密封顶部和底部室的插塞的孔。 存储单元还包括覆盖在横杆元件上的电极,使得电信号可以激活电极以吸引或排斥交叉开关元件以设置晶体管的存储状态。