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    • 125. 发明申请
    • SINGLE POLY CMOS IMAGER
    • 单色CMOS图像
    • US20090298272A1
    • 2009-12-03
    • US12492765
    • 2009-06-26
    • Howard E. Rhodes
    • Howard E. Rhodes
    • H01L21/3205
    • H01L27/14643H01L27/14689
    • More complete charge transfer is achieved in a CMOS or CCD imager by reducing the spacing in the gaps between gates in each pixel cell, and/or by providing a lightly doped region between adjacent gates in each pixel cell, and particularly at least between the charge collecting gate and the gate downstream to the charge collecting gate. To reduce the gaps between gates, an insulator cap with spacers on its sidewalls is formed for each gate over a conductive layer. The gates are then etched from the conductive layer using the insulator caps and spacers as hard masks, enabling the gates to be formed significantly closer together than previously possible, which, in turn increases charge transfer efficiency. By providing a lightly doped region on between adjacent gates, a more complete charge transfer is effected from the charge collecting gate.
    • 通过减小每个像素单元中的栅极之间的间隙和/或通过在每个像素单元中的相邻栅极之间提供轻掺杂区域,特别是至少在电荷之间,在CMOS或CCD成像器中实现更完整的电荷转移 收集门和下游的门到电荷收集门。 为了减小栅极之间的间隙,在导电层上为每个栅极形成在其侧壁上具有间隔物的绝缘体盖。 然后使用绝缘体盖和间隔物作为硬掩模,从导电层蚀刻栅极,使得栅极能够形成得比先前可能的显着更靠近在一起,这又增加了电荷转移效率。 通过在相邻栅极之间提供轻掺杂区域,从电荷收集栅极实现更完整的电荷转移。
    • 126. 发明申请
    • IMAGE SENSOR WITH BACKSIDE PASSIVATION AND METAL LAYER
    • 具有背面钝化和金属层的图像传感器
    • US20090294811A1
    • 2009-12-03
    • US12129599
    • 2008-05-29
    • Howard E. RhodesHidetoshi Nozaki
    • Howard E. RhodesHidetoshi Nozaki
    • H01L31/112
    • H01L27/14629H01L27/14609H01L27/14621H01L31/02327
    • An image sensor includes a semiconductor layer that low-pass filters light of different wavelengths. For example, the semiconductor layer proportionately absorbs photons of shorter wavelengths and proportionately passes more photons of longer wavelengths such that the longer wavelength photons often pass through without being absorbed. An imaging pixel having a photodiode is formed on a front surface of the semiconductor layer, where the photodiode is an N− region formed within the P-type region of the semiconductor layer. A P+ layer is formed between the N− region of the photodiode and a back surface of the semiconductor layer. A mirror that primarily reflects photons of red and/or infra-red wavelengths is formed on the back surface of the semiconductor layer.
    • 图像传感器包括低通滤波不同波长的光的半导体层。 例如,半导体层成比例地吸收较短波长的光子并且成比例地传递较长波长的更多光子,使得较长波长的光子经常通过而不被吸收。 具有光电二极管的成像像素形成在半导体层的前表面上,其中光电二极管是形成在半导体层的P型区域内的N-区域。 在光电二极管的N区和半导体层的背面之间形成P +层。 在半导体层的后表面上形成主要反射红色和/或红外波长的光子的反射镜。
    • 129. 发明授权
    • Pixel cell with a controlled output signal knee characteristic response
    • 具有受控输出信号的像素单元膝盖特征响应
    • US07535042B2
    • 2009-05-19
    • US10881525
    • 2004-07-01
    • Howard E. Rhodes
    • Howard E. Rhodes
    • H01L31/113
    • H01L27/14609H01L27/14603H01L27/14689H01L31/035272
    • A pixel cell with controlled leakage is formed by modifying the location and gate profile of a high dynamic range (HDR) transistor. The HDR transistor may have the gate profile of a transfer gate or a reset gate. The HDR transistor may be located on a side of the photodiode that is the same, opposite to, or perpendicular to the transfer gate. The leakage through the HDR transistor may be controlled by modifying the photodiode implants around the transistor. The photodiode implants at the HDR transistor may be placed similarly to the implants at the transfer gate. However, when the photodiode implants are moved away from the HDR transistor, leakage is reduced. When the photodiode implants are moved farther under the HDR transistor, leakage is increased to the extent desirable. The leakage through the HDR transistor may also be controlled by applying a voltage across the transistor.
    • 具有受控泄漏的像素单元通过修改高动态范围(HDR)晶体管的位置和栅极分布来形成。 HDR晶体管可以具有传输门或复位栅的栅极分布。 HDR晶体管可以位于与传输门相同或垂直的光电二极管的一侧。 可以通过修改晶体管周围的光电二极管植入来控制通过HDR晶体管的泄漏。 在HDR晶体管处的光电二极管植入物可以类似于在传输门处的植入物放置。 然而,当光电二极管植入物远离HDR晶体管时,漏电减少。 当光电二极管植入物在HDR晶体管下移动得更远时,泄漏增加到期望的程度。 也可以通过在晶体管两端施加电压来控制通过HDR晶体管的泄漏。