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    • 113. 发明授权
    • Photoresist, compounds for composing the photoresist, and method of
forming pattern by using the photoresist
    • 光致抗蚀剂,用于构成光致抗蚀剂的化合物,以及通过使用光致抗蚀剂形成图案的方法
    • US5994025A
    • 1999-11-30
    • US763054
    • 1996-12-10
    • Shigeyuki IwasaKaichiro NakanoKatsumi MaedaTakeshi OhfujiEtsuo Hasegawa
    • Shigeyuki IwasaKaichiro NakanoKatsumi MaedaTakeshi OhfujiEtsuo Hasegawa
    • C08F220/04C08F220/06C08F220/10C08F220/18C08F220/26C08F220/28C09D133/04C09D133/14G03F7/004G03F7/039H01L21/027
    • G03F7/039G03F7/0045Y10S430/11Y10S430/111
    • There is provided a photoresist including (a) a resin composed of a polymer represented with the following general formula [1], and (b) a photo acid generator which produces acid when exposed to a light: ##STR1## wherein each of R.sup.1, R.sup.3 and R.sup.7 represents one of a hydrogen atom and a methyl group, R.sup.2 represents a hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.4 represents one of a hydrogen atom and a hydrocarbon group having a carbon number of 1 or 2, R.sup.5 represents a hydrocarbon group having a carbon number of 1 or 2, R.sup.6 represents one of (a) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive, (b) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an alkoxy group having a carbon number in the range of 1 to 12 both inclusive, and (c) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an acyl group having a carbon number in the range of 1 to 13 both inclusive, x+y+z=1, x is in the range of 0.1 to 0.9, y is in the range of 0.1 to 0.7, and z is in the range of 0 to 0.7. The resin has a weight percent in the range of 75 to 99.8 both inclusive, and the photo acid generator has a weight percent in the range of 0.2 to 25 both inclusive. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist has high resolution to thereby make it possible to form a fine pattern without resist residue.
    • 提供了包含(a)由以下通式[1]表示的聚合物构成的树脂的光致抗蚀剂,(b)暴露于光时产生酸的光酸产生剂:其中R1,R3和R7 表示氢原子和甲基中的一个,R 2表示包含桥连环烃基并且碳数为7〜13的碳原子的烃基,R4表示氢原子和具有 碳原子数1或2,R 5表示碳数为1或2的烃基,R 6表示(a)碳原子数为1〜12的烃基,(b)烃 碳数为1〜12的碳原子数为2〜12的碳原子数为2〜12的烷氧基,(c)碳数为1以上的烃基 到12,并用a替代 碳原子数为1〜13的碳原子,x + y + z = 1,x在0.1〜0.9的范围内,y在0.1〜0.7的范围内,z在范围 为0〜0.7。 树脂的重量百分比在75〜99.8之间,光酸产生剂的重量百分比在0.2〜25的范围内。 上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此,光致抗蚀剂具有高分辨率,从而可以形成没有抗蚀剂残留物的精细图案。