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    • 115. 发明授权
    • Nitride-based semiconductor element and method of forming nitride-based semiconductor
    • 基于氮化物的半导体元件和形成氮化物基半导体的方法
    • US07829900B2
    • 2010-11-09
    • US12071978
    • 2008-02-28
    • Masayuki HataTatsuya KunisatoNobuhiko Hayashi
    • Masayuki HataTatsuya KunisatoNobuhiko Hayashi
    • H01L27/15
    • B82Y20/00H01L21/0237H01L21/02378H01L21/02381H01L21/0242H01L21/02433H01L21/0254H01L21/02576H01L21/02639H01L21/02647H01L33/007H01S5/0207H01S5/22H01S5/2214H01S5/227H01S5/34333H01S2304/12
    • A nitride-based semiconductor element having superior mass productivity and excellent element characteristics is obtained. This nitride-based semiconductor element comprises a substrate comprising a surface having projection portions, a mask layer formed to be in contact with only the projection portions of the surface of the substrate, a first nitride-based semiconductor layer formed on recess portions of the substrate and the mask layer and a nitride-based semiconductor element layer, formed on the first nitride-based semiconductor layer, having an element region. Thus, the first nitride-based semiconductor layer having low dislocation density is readily formed on the projection portions of the substrate and the mask layer through the mask layer serving for selective growth. When the nitride-based semiconductor element layer having the element region is grown on the first nitride-based semiconductor layer having low dislocation density, a nitride-based semiconductor element having excellent element characteristics can be readily obtained. The first nitride-based semiconductor layer is formed through only single growth on the substrate, whereby a nitride-based semiconductor element having excellent mass productivity is obtained.
    • 获得具有优异的质量生产率和优异的元件特性的氮化物基半导体元件。 该氮化物系半导体元件包括基板,该基板包括具有突出部的表面,形成为仅与基板的表面的突出部接触的掩模层,形成在基板的凹部的第一氮化物系半导体层 以及形成在具有元件区域的第一氮化物系半导体层上的掩模层和氮化物系半导体元件层。 因此,具有低位错密度的第一氮化物基半导体层通过用于选择生长的掩模层容易地形成在衬底和掩模层的突出部分上。 当在具有低位错密度的第一氮化物基半导体层上生长具有元素区域的氮化物基半导体元件层时,可以容易地获得具有优异元素特性的氮化物基半导体元件。 第一氮化物基半导体层仅通过基板上的单一生长形成,从而获得具有优异的批量生产率的氮化物基半导体元件。
    • 116. 发明授权
    • Semiconductor laser apparatus and fabrication method thereof
    • 半导体激光装置及其制造方法
    • US07773654B2
    • 2010-08-10
    • US11092947
    • 2005-03-30
    • Yasuyuki BesshoMasayuki HataDaijiro InoueTsutomu Yamaguchi
    • Yasuyuki BesshoMasayuki HataDaijiro InoueTsutomu Yamaguchi
    • H01S5/00
    • H01S5/4025H01L2224/32245H01L2224/48463H01L2224/73265H01S5/4087
    • A blue-violet semiconductor laser device has a first p-electrode formed on its upper surface and a first n-electrode formed on its lower surface. A red semiconductor laser device has a second n-electrode formed on its upper surface and a second p-electrode formed on its lower surface. An infrared semiconductor laser device has a third n-electrode formed on its upper surface and a third p-electrode formed on its lower surface. Solder films are partially formed on the upper surface of the first p-electrode in the blue-violet semiconductor laser device. Two of the solder films are formed with a predetermined distance between them on the upper surface of the first p-electrode. This results in a portion of the first p-electrode being exposed. The first, second and third p-electrodes of the blue-violet semiconductor laser device, red semiconductor laser device, and infrared semiconductor laser device are common electrodes.
    • 蓝紫色半导体激光器件具有在其上表面上形成的第一p电极和形成在其下表面上的第一n电极。 红色半导体激光器件具有在其上表面上形成的第二n电极和形成在其下表面上的第二p电极。 红外半导体激光器件具有在其上表面上形成的第三n电极和形成在其下表面上的第三p电极。 在蓝紫色半导体激光器件中的第一p电极的上表面部分地形成焊料膜。 两个焊料膜在第一p电极的上表面之间以它们之间的预定距离形成。 这导致第一p电极的一部分被暴露。 蓝紫色半导体激光器件的第一,第二和第三p电极,红色半导体激光器件和红外半导体激光器件是公共电极。
    • 117. 发明申请
    • SEMICONDUCTOR LASER APPARATUS AND METHOD OF MANUFACTURING THE SAME
    • 半导体激光装置及其制造方法
    • US20090097523A1
    • 2009-04-16
    • US12333764
    • 2008-12-12
    • Yasuyuki BesshoMasayuki HataDaijiro Inoue
    • Yasuyuki BesshoMasayuki HataDaijiro Inoue
    • H01S5/00
    • H01S5/4025H01S5/4087
    • Second and third p-side pad electrodes are formed on an insulating film of a blue-violet semiconductor laser device on both sides of a first p-side pad electrode. The second p-side pad electrode and the third p-side pad electrode are formed separately from each other. Solder films are formed on the upper surfaces of the second and third p-side pad electrodes respectively. A fourth p-side pad electrode of a red semiconductor laser device is bonded onto the second p-side pad electrode with the corresponding solder film sandwiched therebetween. A fifth p-side pad electrode of an infrared semiconductor laser device is bonded onto the third p-side pad electrode with the corresponding solder film sandwiched therebetween. The second and third p-side pad electrodes are formed separately from each other, so that the fourth and fifth p-side pad electrodes are electrically isolated from each other.
    • 第二和第三p侧焊盘电极形成在第一p侧焊盘电极两侧的蓝紫色半导体激光器件的绝缘膜上。 第二p侧焊盘电极和第三p侧焊盘电极彼此分开地形成。 焊接膜分别形成在第二和第三p侧焊盘电极的上表面上。 红色半导体激光器件的第四p侧焊盘电极被粘合到第二p侧焊盘电极上,其中夹有相应的焊料膜。 红外半导体激光器件的第五p侧焊盘电极被粘合到第三p侧焊盘电极上,其中夹有相应的焊料膜。 第二和第三p侧焊盘电极彼此分开地形成,使得第四和第五p侧焊盘电极彼此电隔离。
    • 120. 发明申请
    • Semiconductor laser element and semiconductor laser device
    • 半导体激光元件和半导体激光器件
    • US20070274360A1
    • 2007-11-29
    • US11710922
    • 2007-02-27
    • Daijiro InoueYasuyuki BesshoMasayuki Hata
    • Daijiro InoueYasuyuki BesshoMasayuki Hata
    • H01S5/00
    • H01S5/2231H01S5/2223
    • A semiconductor laser element includes a semiconductor layer, an insulating layer and an electrode. The semiconductor layer is formed on a substrate, and includes a raised portion extending along a predetermined direction and flat portions provided on outer sides in a width direction of the raised portion. The insulating layer is formed on upper surfaces of the flat portions and side surfaces of the raised portion. The electrode includes a first portion provided along the predetermined direction on the raised portion and a second portion including a plurality of protruding portions protruding outward from the first portion in the width direction of the raised portion. A gap through which the insulating layer is exposed is provided between each adjacent two of the plurality of protruding portions.
    • 半导体激光元件包括半导体层,绝缘层和电极。 半导体层形成在基板上,并且包括沿着预定方向延伸的凸起部分和设置在凸起部分的宽度方向上的外侧的平坦部分。 绝缘层形成在凸起部分的平坦部分和侧表面的上表面上。 电极包括沿着预定方向设置在凸起部分上的第一部分和第二部分,其包括从凸起部分的宽度方向上的第一部分向外突出的多个突出部分。 在相邻的两个突出部分之间设置有绝缘层暴露的间隙。