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111. 发明授权

US09045587B2 Naphthalene derivative, resist bottom layer material, and patterning process 有权
标题翻译：萘衍生物，抗蚀底层材料和图案化工艺
公开(公告)号：US09045587B2
公开(公告)日：2015-06-02
申请号：US14466228
申请日：2014-08-22
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Takeshi Kinsho , Daisuke Kori , Katsuya Takemura , Takeru Watanabe , Tsutomu Ogihara
IPC分类号： C08G61/10 , G03F7/09 , B05D1/40 , B05D3/00 , G03F7/00 , G03F7/20
CPC分类号： C08G61/10 , B05D1/40 , B05D3/007 , G03F7/00 , G03F7/091 , G03F7/20
摘要： A naphthalene derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of up to 100,000. A material comprising the naphthalene derivative or a polymer comprising the naphthalene derivative is spin coated to form a resist bottom layer having improved properties. A pattern forming process in which a resist bottom layer formed by spin coating is combined with an inorganic hard mask formed by CVD is available.
摘要翻译：提供具有式（1）的萘衍生物，其中Ar1和Ar2表示苯或萘环，n是这样的自然数，以提供高达100,000的重均分子量。包含萘衍生物或包含萘衍生物的聚合物的材料被旋涂以形成具有改进性能的抗蚀剂底层。通过旋涂形成的抗蚀剂底层与通过CVD形成的无机硬掩模组合的图案形成方法是可用的。

112. 发明授权

US08999625B2 Silicon-containing antireflective coatings including non-polymeric silsesquioxanes 有权
标题翻译：含硅的抗反射涂层，包括非聚合倍半硅氧烷
公开(公告)号：US08999625B2
公开(公告)日：2015-04-07
申请号：US13767114
申请日：2013-02-14
申请人： International Business Machines Corporation , Shin-Etsu Chemical Co., Ltd.
发明人： Martin Glodde , Wu-Song Huang , Javier Perez , Ratnam Sooriyakumaran , Takeshi Kinsho , Tsutomu Ogihara , Seiichiro Tachibana , Takafumi Ueda
IPC分类号： G03F7/075 , G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0751 , G03F7/0755 , G03F7/091 , G03F7/325
摘要： Embodiments include a silicon-containing antireflective material including a silicon-containing base polymer, a non-polymeric silsesquioxane material, and a photoacid generator. The silicon-containing base polymer may contain chromophore moieties, transparent moieties, and reactive sites on an SiOx background, where x ranges from approximately 1 to approximately 2. Exemplary non-polymeric silsesquioxane materials include polyhedral oligomeric silsesquioxanes having acid labile side groups linked to hydrophilic groups Exemplary acid labile side groups may include tertiary alkyl carbonates, tertiary alkyl esters, tertiary alkyl ethers, acetals and ketals, Exemplary hydrophilic groups may include phenols, alcohols, carboxylic acids, amides, and sulfonamides. Embodiments further include lithographic structures including an organic anti-reflective layer, the above-described silicon-containing anti-reflective layer above the organic anti-reflective layer, and a photoresist layer above the above-described silicon-containing anti-reflective layer. Embodiments further include a method of forming a lithographic structure utilizing the above-described silicon-containing anti-reflective layer.
摘要翻译：实施方案包括含硅的抗反射材料，其包含含硅基聚合物，非聚合倍半硅氧烷材料和光酸产生剂。含硅基聚合物可以在SiOx背景上含有发色团部分，透明部分和反应性位点，其中x为约1至约2.示例性非聚合倍半硅氧烷材料包括具有与亲水性连接的酸不稳定侧基的多面体低聚倍半硅氧烷示例性的酸不稳定侧基可以包括碳酸叔烷基酯，叔烷基酯，叔烷基醚，缩醛和缩酮。示例性亲水基团可以包括酚，醇，羧酸，酰胺和磺酰胺。实施例还包括包括有机抗反射层，上述有机抗反射层上的含硅抗反射层和在上述含硅抗反射层上方的光致抗蚀剂层的光刻结构。实施例还包括利用上述含硅抗反射层形成光刻结构的方法。

113. 发明申请

US20140309452A1 OMEGA-HALO-2-ALKYNAL, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING CONJUGATED Z-ALKEN-YN-YL ACETATE USING SAME 有权
标题翻译：欧米茄 - 哈尔-2-碱金属及其制备方法，以及使用该方法生产结合的Z-阿EN N酸乙酯的方法
公开(公告)号：US20140309452A1
公开(公告)日：2014-10-16
申请号：US14248525
申请日：2014-04-09
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Miyoshi Yamashita , Takehiko Fukumoto , Takeshi Kinsho
IPC分类号： C07C47/24 , C07C67/10 , C07C45/42
CPC分类号： C07C67/10 , C07C17/2635 , C07C45/42 , C07C45/43 , C07C47/24 , C07C67/11 , C07C69/145 , C07C21/22
摘要： Provided is a method for industrially producing a conjugated Z-alken-yn-yl acetate such as Z-13-hexadecen-11-yn-yl acetate which is a sex pheromone component of a pine processionary moth, and an intermediate for the conjugated Z-alken-yn-yl acetate under mild conditions at a high yield. More specifically, provided is a method for producing a conjugated Z-alken-yn-yl acetate (5) comprising the steps of: reacting an ω-halo-2-alkynal (1) with an alkylidene triphenylphosphorane (3) through a Wittig reaction to obtain a conjugated Z-alken-yn-yl halide (4), and acetoxylating the conjugated Z-alken-yn-yl halide (4) into a conjugated Z-alken-yn-yl acetate (5).
摘要翻译：本发明提供了工业上制造Z-联烯基乙酸酯的共轭Z-烯酸乙酯的方法，例如作为松木酰蛾的性信息素成分的Z-13-十六碳烯-11-炔酸乙酯，和共轭Z - 烯酸乙酯在温和条件下以高产率。更具体地说，提供了一种制备共轭Z-烯酸乙酯（5）的方法，包括以下步骤：使ω-卤代-2-炔烃（1）与亚烷基三苯基正膦（3）通过维蒂希反应得到共轭的Z-烯烃基卤化物（4），并将共轭的Z-烯烃基卤化物（4）乙酰氧化成共轭的Z-烯酸乙酯（5）。

114. 发明申请

US20140275657A1 METHOD FOR PRODUCING CHLOROHYDROCARBON HAVING CONJUGATED DOUBLE BONDS 有权
标题翻译：用于生产具有结合双重骨架的氯硅橡胶的方法
公开(公告)号：US20140275657A1
公开(公告)日：2014-09-18
申请号：US14189373
申请日：2014-02-25
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Yuki Miyake , Takeshi Kinsho , Miyoshi Yamashita , Naoki Ishibashi , Takehiko Fukumoto
IPC分类号： C07C17/07
CPC分类号： C07C17/07 , C07C17/16 , C07C21/04
摘要： Provided is a method for producing a chlorohydrocarbon having conjugated double bonds by stereoselectively chlorinating an alcohol having conjugated double bonds. More specifically, provided is a method for producing a chlorohydrocarbon having conjugated double bonds, the method including a step of chlorinating an alcohol having conjugated double bonds with a chlorinating agent in a solvent in the presence of a base and in the absence of metal salt for chlorination of the alcohol, and the alcohol being represented by the formula (1): RCH═CHCH═CH—Z—OH (1) wherein R represents a hydrogen atom or a linear, branched or cyclic C1-17 monovalent hydrocarbon group which may have at least one double bond or at least one triple bond; and Z represents a linear, branched or cyclic C1-17 divalent hydrocarbon group which may have at least one double bond or at least one triple bond.
摘要翻译：提供通过立体选择性氯化具有共轭双键的醇来制备具有共轭双键的氯代烃的方法。更具体地说，提供了具有共轭双键的氯代烃的制造方法，其特征在于，在碱的存在下，在不存在金属盐的情况下，在溶剂中，用氯化剂将具有共轭双键的醇氯化，醇的卤化，由式（1）表示的醇：RCH = CHCH = CH-Z-OH（1）其中R表示氢原子或直链，支链或环状的C 1-17单价烃基，其可以具有至少一个双键或至少一个三键; Z表示可以具有至少一个双键或至少一个三键的直链，支链或环状的C1-17二价烃基。

115. 发明申请

US20130157194A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND 有权
标题翻译：花纹法，抗菌组合物，聚合物和聚合酯化合物
公开(公告)号：US20130157194A1
公开(公告)日：2013-06-20
申请号：US13707075
申请日：2012-12-06
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Takeru Watanabe , Tomohiro Kobayashi , Jun Hatakeyama , Kazuhiro Katayama , Takeshi Kinsho
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , C08F20/10 , C08F220/28 , C08F232/08 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , G03F7/325 , C08F2220/283 , C08F220/20 , C08F222/06
摘要： A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring under the action of an acid so that the polymer may reduce its solubility in an organic solvent developer, an acid generator, and an organic solvent displays a high dissolution contrast between the unexposed region of promoted dissolution and the exposed region of inhibited dissolution.
摘要翻译：通过将抗蚀剂组合物施加到基材上，预烘烤，暴露于高能辐射，烘烤（PEB）和在有机溶剂显影剂中显影曝光的抗蚀剂膜以溶解抗蚀剂膜的未曝光区域来形成负图案。抗蚀剂组合物包含适于在酸的作用下形成内酯环的聚合物，使得聚合物可降低其在有机溶剂显影剂，酸产生剂和有机溶剂中的溶解度，显示在促进溶解和暴露区域的抑制溶解。

116. 发明公开

US20240368056A1 PROCESS FOR PREPARING 17-METHYLALKANE COMPOUND 审中-公开
公开(公告)号：US20240368056A1
公开(公告)日：2024-11-07
申请号：US18648588
申请日：2024-04-29
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Yuki Miyake , Takeru Watanabe , Takeshi Kinsho
IPC分类号： C07C1/32 , C07C17/263 , C07C19/01 , C07C19/075
CPC分类号： C07C1/326 , C07C17/2632 , C07C19/01 , C07C19/075
摘要： The present invention relates to a 1-halo-7-methyltricosane compound of the following general formula (1), wherein X1 represents a halogen atom. The present invention relates also to a process for preparing a 17-methylalkane compound of the following general formula (4), wherein n represents an integer of 11 to 13, the process comprising the steps of converting the aforesaid 1-halo-7-methyltricosane compound (1) into a nucleophilic reagent, 7-methyltricosyl compound, of the following general formula (2), wherein M1 represents Li, MgZ1, CuZ1, or CuLiZ1, and Z1 represents a halogen atom or a 7-methyltricosyl group, subsequently subjecting the aforesaid nucleophilic reagent, 7-methyltricosyl compound (2), to a coupling reaction with an electrophilic alkyl reagent of the following general formula (3), wherein X2 represents a halogen atom or a p-toluenesulfonyloxy group, and n is as defined above, to form the aforesaid 17-methylalkane compound (4).

117. 发明授权

US11897842B2 Method for producing 7-methyl-3-methylene-7-octenal acetal compound 有权
公开(公告)号：US11897842B2
公开(公告)日：2024-02-13
申请号：US17833170
申请日：2022-06-06
申请人： SHIN-ETSU CHEMICAL CO, LTD.
发明人： Takeshi Kinsho , Akihiro Baba , Yusuke Nagae , Tomohiro Watanabe
IPC分类号： C07C45/45 , C07C67/40 , C07C45/42 , C07C29/10 , C07C41/30 , C07C41/14 , C07C67/14 , C07C29/14 , C07C67/03 , C07C67/08 , C07C45/51
CPC分类号： C07C67/40 , C07C29/10 , C07C29/14 , C07C41/14 , C07C41/30 , C07C45/42 , C07C45/45 , C07C45/515 , C07C67/03 , C07C67/08 , C07C67/14 , C07C45/67 , C07C47/21 , C07C29/14 , C07C33/02 , C07C67/08 , C07C69/24 , C07C67/03 , C07C69/533 , C07C67/14 , C07C69/24 , C07C45/515 , C07C47/21
摘要： A method for producing a 7-methyl-3-methylene-7-octenyl carboxylate compound (1), the method including the step of coupling a nucleophilic reagent of General Formula (8):

wherein M is a cationic moiety, with an acetal compound of General Formula (9):

wherein R1 and R2, which may be the same or different, are each an alkyl group having 1 to 6 carbon atoms, or are bonded to each other to form a divalent alkylene group having 2 to 12 carbon atoms, and X is a leaving group, to obtain the 7-methyl-3-methylene-7-octenal acetal compound.

118. 发明授权

US11807602B2 Processes for preparing a 3-isopropenyl-6-heptenal compound and a 6- isopropenyl-3-methyl-3,9-decadienyl carboxylate compound, and an intermediate therefor 有权
公开(公告)号：US11807602B2
公开(公告)日：2023-11-07
申请号：US17543877
申请日：2021-12-07
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Akihiro Baba , Takeshi Kinsho , Naoki Ishibashi , Yusuke Nagae
IPC分类号： C07C45/41 , C07C67/27 , C07C69/587 , C07C67/08 , C07C67/475
CPC分类号： C07C69/587 , C07C45/41 , C07C67/08 , C07C67/27 , C07C67/475
摘要： The present invention relates to a process for preparing a 3-isopropenyl-6-heptenal compound of the following formula (2): wherein R1 represents a hydrogen atom or a methyl group, the process comprising: subjecting a 3-isopropenyl-6-heptenoate ester compound of the following formula (1): wherein R1 is as defined above, and R2 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms, to a reduction reaction with a reducing agent to form the 3-isopropenyl-6-heptenal compound (2).

119. 发明授权

US11795133B2 Process for preparing 6-isopropenyl-3-methyl-9-decenyl acetate, and intermediates therefor 有权
公开(公告)号：US11795133B2
公开(公告)日：2023-10-24
申请号：US17368996
申请日：2021-07-07
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Akihiro Baba , Takeshi Kinsho
IPC分类号： C07C67/08
CPC分类号： C07C67/08
摘要： The present invention provides a process for preparing 6-isopropenyl-3-methyl-9-decenyl acetate (5): wherein Ac represents an acetyl group, the process comprising steps of: subjecting a 2-methyl-2,6-heptadiene compound (1) having a leaving group X at position 1: wherein X represents an acyloxy group having 1 to 10 carbon atoms including the carbon atom of the carbonyl group, an alkanesulfonyloxy group having 1 to 10 carbon atoms, an arenesulfonyloxy group having 6 to 20 carbon atoms, or a halogen atom, to a nucleophilic substitution reaction with a 3-methylpentyl nucleophilic reagent (2) having a protected hydroxyl group at position 5: wherein M represents Li, MgZ1, ZnZ1, Cu, CuZ1, or CuLiZ1, wherein Z1 represents a halogen atom or a CH2CH2CH(CH3)CH2CH2OR group, and R represents a protecting group for a hydroxyl group, to form a 6-isopropenyl-3-methyl-9-decene compound (3) having a protected hydroxyl group at position 1: wherein R is as defined above; subjecting the 6-isopropenyl-3-methyl-9-decene compound (3) having the protected hydroxyl group at position 1 to a deprotection reaction to form 6-isopropenyl-3-methyl-9-decenol (4); and acetylating 6-isopropenyl-3-methyl-9-decenol (4) to form 6-isopropenyl-3-methyl-9-decenyl acetate (5).

120. 发明授权

US11661390B2 Acetal compounds and processes for preparing thereof, and processes for preparing aldehyde compounds from the acetal compounds 有权
公开(公告)号：US11661390B2
公开(公告)日：2023-05-30
申请号：US17861629
申请日：2022-07-11
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Takeru Watanabe , Takeshi Kinsho
IPC分类号： C07C45/51 , C07C41/48 , C07C43/305
CPC分类号： C07C45/513 , C07C41/48 , C07C43/305
摘要： The present invention relates to an acetal compound of the following general formula (1) and an acetal compound of the following general formula (2). The present invention relates to processes for preparing the acetal compound (2), comprising subjecting the acetal compound (1) to a hydrogenation reaction to form the acetal compound (2). The present invention provides a process for preparing 2,3,4,4-tetramethylcyclopentanecarbaldehyde of the following formula (3), comprising subjecting the acetal compound (2) to a hydrolysis reaction to form 2,3,4,4-tetramethylcyclopentanecarbaldehyde (3).

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