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111. 发明申请

US20080096131A1 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US20080096131A1
公开(公告)日：2008-04-24
申请号：US11976279
申请日：2007-10-23
申请人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
发明人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
IPC分类号： G03C1/00 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译：抗蚀剂组合物包含在酸作为基础树脂的作用下增加其碱溶解性的聚合物，以及包含含有磺酸胺盐的重复单元和含有至少一个氟原子作为添加剂的重复单元的共聚物。该组合物适用于浸没光刻。

112. 发明申请

US20070275326A1 Resist protective film composition and patterning process 有权
标题翻译：抗保护膜组成和图案化工艺
公开(公告)号：US20070275326A1
公开(公告)日：2007-11-29
申请号：US11798471
申请日：2007-05-14
申请人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
发明人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups selected from a carboxyl group and α-trifluoromethyl alcohol groups; and an amine compound. There can be provided a resist protective film composition that makes it possible to provide more certainly rectangular and excellent patterns when a protective film is formed on a photoresist film.
摘要翻译：公开了一种用于在光致抗蚀剂膜上形成保护膜的抗蚀保护膜组合物，其包括：至少包含具有一个或多个选自羧基和α-三氟甲醇基团的基团的重复单元的聚合物; 和胺化合物。可以提供一种抗蚀剂保护膜组合物，当在光致抗蚀剂膜上形成保护膜时，可以提供更确定的矩形和优异的图案。

113. 发明授权

US06835524B2 Polymers, chemical amplification resist compositions and patterning process 有权
标题翻译：聚合物，化学放大抗蚀剂组合物和图案化工艺
公开(公告)号：US06835524B2
公开(公告)日：2004-12-28
申请号：US09783321
申请日：2001-02-15
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： G03C173
CPC分类号： C08F20/22 , C08F220/22 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/143
摘要： Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is a hydrophilic group. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.
摘要翻译：包含由式（1）表示的氟化主链的丙烯酸衍生物的重复单元的聚合物是新颖的.R 1，R 2和R 3独立地是H，F，C 1-20烷基或氟化C 1-20烷基，R 1，R 2和R 3中的至少一个含有氟，R 4是亲水基团。使用聚合物，得到具有F2准分子激光的低吸收性的化学放大阳性抗蚀剂组合物。

114. 发明授权

US06436606B1 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06436606B1
公开(公告)日：2002-08-20
申请号：US09650408
申请日：2000-08-29
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： C08F22202
CPC分类号： G03F7/0392 , C08F234/02 , G03F7/0045 , G03F7/0397
摘要： Polymers comprising recurring units of formula (1) and recurring units having acid labile groups are novel. At least one of R1 and R2 is fluorine or a trifluoromethyl group, and the remainder is hydrogen or a C1-20 alkyl, R3 and R4 each are hydrogen or an unsubstituted or fluorine-substituted C1-20 alkyl, or R3 and R4 may form a ring. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.
摘要翻译：包含式（1）的重复单元的聚合物和具有酸不稳定基团的重复单元是新的.R 1和R 2中的至少一个是氟或三氟甲基，其余是氢或C 1-20烷基，R 3和R 4各自是氢或未取代或氟取代的C 1-20烷基，或者R 3和R 4可以形成环。使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。

115. 发明授权

US08999630B2 Patterning process and resist composition 有权
标题翻译：图案化过程和抗蚀剂组成
公开(公告)号：US08999630B2
公开(公告)日：2015-04-07
申请号：US13546489
申请日：2012-07-11
申请人： Jun Hatakeyama , Koji Hasegawa , Kazuhiro Katayama
发明人： Jun Hatakeyama , Koji Hasegawa , Kazuhiro Katayama
IPC分类号： G03F7/32 , G03F7/004 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： An image is formed via positive/negative reversal on organic solvent development using a photoresist film comprising a polymer comprising recurring units of isosorbide (meth)acrylate in which one hydroxyl group of isosorbide is bonded to form (meth)acrylate and the other hydroxyl group is substituted with an acid labile group and an acid generator. The resist film is characterized by a high dissolution contrast between the unexposed and exposed regions. The photoresist film is exposed to radiation and developed in an organic solvent to form a fine hole pattern with good size control and high sensitivity.
摘要翻译：通过使用含有包含异山梨醇（甲基）丙烯酸酯的重复单元的聚合物的光致抗蚀剂膜，通过正/负反转在有机溶剂显影上形成图像，其中异山梨醇的一个羟基键合形成（甲基）丙烯酸酯，另一个羟基为被酸不稳定基团和酸发生剂取代。抗蚀剂膜的特征在于未曝光区域和曝光区域之间的高溶解度对比度。将光致抗蚀剂膜暴露于辐射并在有机溶剂中显影以形成具有良好尺寸控制和高灵敏度的细孔图案。

116. 发明授权

US08921026B2 Basic compound, chemically amplified resist composition, and patterning process 有权
标题翻译：碱性化合物，化学放大抗蚀剂组合物和图案化工艺
公开(公告)号：US08921026B2
公开(公告)日：2014-12-30
申请号：US13311192
申请日：2011-12-05
申请人： Jun Hatakeyama , Masayoshi Sagehashi , Takeru Watanabe
发明人： Jun Hatakeyama , Masayoshi Sagehashi , Takeru Watanabe
IPC分类号： G03F7/00 , C07D239/28 , G03F7/004
CPC分类号： C07D239/28 , G03F7/0045
摘要： A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.
摘要翻译：包含基础聚合物，酸产生剂和具有酸不稳定基团取代的羧基的β-丙氨酸，γ-氨基丁酸或5-氨基戊酸衍生物形式的胺猝灭剂的化学放大抗蚀剂组合物具有高暴露前后的碱溶解速度对比度，形成高分辨率，最小粗糙度和宽焦距的良好轮廓图案。

117. 发明授权

US08865390B2 Patterning process and resist composition 有权
标题翻译：图案化过程和抗蚀剂组成
公开(公告)号：US08865390B2
公开(公告)日：2014-10-21
申请号：US13614494
申请日：2012-09-13
申请人： Jun Hatakeyama , Kazuhiro Katayama , Koji Hasegawa
发明人： Jun Hatakeyama , Kazuhiro Katayama , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/30 , G03F7/039 , G03F7/20 , G03F1/00 , G03F7/32 , G03F7/11
CPC分类号： G03F7/325 , G03F1/00 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/203 , G03F7/2041 , G03F7/70466
摘要： A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units of acid labile group-substituted vinyl alcohol and maleic anhydride and/or maleimide, an acid generator, and an organic solvent onto a substrate, prebaking, exposing to high-energy radiation, and developing in an organic solvent developer such that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.
摘要翻译：通过将包含酸不稳定基取代的乙烯醇和马来酸酐和/或马来酰亚胺的重复单元和/或马来酰亚胺，酸产生剂和有机溶剂的聚合物的抗蚀剂组合物涂布在基材上，预烘烤，能量辐射，并在有机溶剂显影剂中显影，使得抗蚀剂膜的未曝光区域被溶解并且抗蚀剂膜的曝光区域不溶解。在通过有机溶剂显影的正/负反转的图像形成中，抗蚀剂膜的特征在于未曝光和曝光区域之间的高溶解度对比度。

118. 发明授权

US08841061B2 Positive resist composition and patterning process 有权
标题翻译：正抗蚀剂组成和图案化工艺
公开(公告)号：US08841061B2
公开(公告)日：2014-09-23
申请号：US13599398
申请日：2012-08-30
申请人： Jun Hatakeyama , Koji Hasegawa
发明人： Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/26 , C08F220/68 , C08F220/22 , C08F228/04 , C08F228/06 , C08F232/08 , C08F234/02
CPC分类号： C08F220/68 , C08F220/22 , C08F228/04 , C08F228/06 , C08F232/08 , C08F234/02 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/111
摘要： A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R1 is methylene or ethylene, R2 is alkyl, aryl, or alkenyl, which may contain oxygen or sulfur, R3 is fluorine or trifluoromethyl, and m is an integer of 1 to 4.
摘要翻译：包含具有由具有式（1）的酸不稳定基团取代的羧基的聚合物的正型抗蚀剂组合物在曝光前后显示出高的对比度的碱溶解速率，高分辨率，降低的酸扩散速率，并形成良好的图案轮廓，最小边缘粗糙度和耐蚀刻性。在式（1）中，R 1是亚甲基或亚乙基，R 2是可以含有氧或硫的烷基，芳基或烯基，R 3是氟或三氟甲基，m是1至4的整数。

119. 发明授权

US08790866B2 Patterning process and resist composition 有权
标题翻译：图案化过程和抗蚀剂组成
公开(公告)号：US08790866B2
公开(公告)日：2014-07-29
申请号：US13586186
申请日：2012-08-15
申请人： Jun Hatakeyama , Kazuhiro Katayama , Tomohiro Kobayashi
发明人： Jun Hatakeyama , Kazuhiro Katayama , Tomohiro Kobayashi
IPC分类号： G03F7/20
CPC分类号： G03F7/0045 , G03F7/004 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/325
摘要： A negative pattern is formed by coating a resist composition comprising a methylol-substituted urea, amide or urethane compound, a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, and developing in an organic solvent developer such that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.
摘要翻译：通过将包含羟甲基取代的脲，酰胺或氨基甲酸酯化合物的抗蚀剂组合物，包含酸不稳定基取代的羟基的重复单元的聚合物和酸产生剂涂覆在基材上，预烘烤，暴露于高能量辐射，并在有机溶剂显影剂中显影，使得抗蚀剂膜的未曝光区域被溶解并且抗蚀剂膜的曝光区域不溶解。在通过有机溶剂显影的正/负反转的图像形成中，抗蚀剂膜的特征在于未曝光和曝光区域之间的高溶解度对比度。

120. 发明授权

US08507175B2 Patterning process and resist composition 有权
标题翻译：图案化过程和抗蚀剂组成
公开(公告)号：US08507175B2
公开(公告)日：2013-08-13
申请号：US12905426
申请日：2010-10-15
申请人： Jun Hatakeyama , Masaki Ohashi , Youichi Ohsawa , Kazuhiro Katayama
发明人： Jun Hatakeyama , Masaki Ohashi , Youichi Ohsawa , Kazuhiro Katayama
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20 , G03F7/028
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/095
摘要： The process forms a pattern by applying a resist composition onto a substrate to form a resist film, baking, exposure, post-exposure baking, and development. The resist composition comprises a polymer comprising recurring units having an acid labile group and substantially insoluble in alkaline developer, a PAG, a PBG capable of generating an amino group, a quencher for neutralizing the acid from PAG for inactivation, and an organic solvent. A total amount of amino groups from the quencher and PBG is greater than an amount of acid from PAG. An unexposed region and an over-exposed region are not dissolved in developer whereas only an intermediate exposure dose region is dissolved in developer. Resolution is doubled by splitting a single line into two through single exposure and development.
摘要翻译：该方法通过将抗蚀剂组合物施加到基底上以形成抗蚀剂膜，烘烤，曝光，曝光后烘烤和显影来形成图案。抗蚀剂组合物包含聚合物，其包含具有酸不稳定基团并且基本上不溶于碱性显影剂的重复单元，PAG，能够产生氨基的PBG，用于中和PAG酸失活的猝灭剂和有机溶剂。来自猝灭剂和PBG的氨基的总量大于来自PAG的酸的量。未曝光区域和过度曝光区域不溶解在显影剂中，而只有中间曝光剂量区域溶解在显影剂中。通过单次曝光和开发将单线分成两组，分辨率翻了一番。

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