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101. 发明授权

US09070532B2 Charged particle beam apparatus sample holder with magnetic field generating element and sample holding element 有权
标题翻译：带有磁场产生元件和样品保持元件的带电粒子束装置样品架
公开(公告)号：US09070532B2
公开(公告)日：2015-06-30
申请号：US14260452
申请日：2014-04-24
申请人： Hitachi, Ltd.
发明人： Akira Sugawara , Tomokazu Shimakura , Yoshio Takahashi
IPC分类号： G21K5/10 , H01J37/20 , H01J37/26 , H01J37/09
CPC分类号： H01J37/20 , H01J37/09 , H01J37/266 , H01J2237/0264 , H01J2237/2008
摘要： The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.
摘要翻译：所公开的发明提供一种样品保持器，其能够减少或防止通过对样品施加磁场而偏转的带电粒子束的影响，并且提供用于简单地在观察样品的模式之间切换的装置，同时向样品施加磁场，以及没有完全磁场变为零的磁场的模式。样品架包括：磁场产生元件，包括用于向样品施加磁场的三个或更多个磁隙;在其一端保持样品的悬臂梁形样品保持元件;以及调节相对样品与磁隙之间的位置。磁隙可以沿带电粒子束的光轴放置。

102. 发明申请

US20150179397A1 MICROSCOPY SUPPORT STRUCTURES 有权
标题翻译：显微镜支持结构
公开(公告)号：US20150179397A1
公开(公告)日：2015-06-25
申请号：US14525894
申请日：2014-10-28
申请人： PROTOCHIPS, INC.
发明人： John DAMIANO, JR. , Stephen E. MICK , David P. NACKASHI
IPC分类号： H01J37/20 , H01J37/26
CPC分类号： H01J37/20 , H01J37/26 , H01J37/261 , H01J2237/188 , H01J2237/2001 , H01J2237/2002 , H01J2237/2003 , H01J2237/2007 , H01J2237/2008 , H01J2237/2602 , H01J2237/28 , H01J2237/2802
摘要： Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.
摘要翻译：电子显微镜支撑结构及其制作和使用方法。支撑结构通常使用半导体材料和半导体制造工艺构造。可以控制支撑结构的温度和/或气体或液体被限制在观察区域中用于反应和/或成像。

103. 发明授权

US09064672B2 Specimen mount for microscopy 有权
标题翻译：用于显微镜的样品座
公开(公告)号：US09064672B2
公开(公告)日：2015-06-23
申请号：US12809717
申请日：2008-12-22
申请人： Stephen E. Mick , John Damiano , David P. Nackashi
发明人： Stephen E. Mick , John Damiano , David P. Nackashi
IPC分类号： G02B21/00 , H01J37/20 , G02B21/30 , H01J37/28
CPC分类号： H01J37/20 , G02B21/30 , H01J37/28 , H01J2237/2007 , H01J2237/2008
摘要： Mounts, stages, and systems that allow for in situ manipulation, experimentation and analysis of specimens directly within an electron microscope. The mounts fixture and interface with a device, wherein the device corresponds to a structure that holds a specimen for microscopic imaging. The mounts are mateably and/or electrically compatible with a stage. Systems using the devices, mounts, and stages that can be used directly within the electron microscope are disclosed.
摘要翻译：允许在电子显微镜内直接进行原位操作，实验和分析样品的装置，分段和系统。安装夹具和与装置的接口，其中该装置对应于保持用于显微镜成像的样本的结构。安装座可与舞台配合和/或电气兼容。公开了使用可以在电子显微镜内直接使用的装置，安装件和级的系统。

104. 发明申请

US20150137002A1 Holder and Method for Fixing Observation Sample 有权
标题翻译：固定观察样本的持有者和方法
公开(公告)号：US20150137002A1
公开(公告)日：2015-05-21
申请号：US14405485
申请日：2013-05-30
申请人： Hitachi High-Technologies Corporation
发明人： Kazuhiro Koyama , Masahiro Akatsu
IPC分类号： H01J37/20 , H01J37/28
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/2007 , H01J2237/2008 , H01J2237/202 , H01J2237/28 , H01J2237/2801
摘要： A sample holder is provided allowing for favorable observation of a cross-sectional sample using a retarding method. The sample holder includes: a sample placement member on which a first fixing member, a cross-sectional sample as an observation sample, and a second fixing member are placed in contact with each other, and inserted inside the electronic optical lens barrel of an electron microscope; and a voltage introduction means for introducing a voltage to the sample placement member. The sample placement member has a positioning section for positioning the first fixing member, the cross-sectional sample, and the second fixing member onto a placement position. A positioning section positions the first planar surface of the first fixing member and the second planar surface of the second fixing member which are disposed respectively adjacent to the observation surface of the cross-sectional sample, parallel to the observation surface at locations equidistant from the observation surface.
摘要翻译：提供了一种样品保持器，允许使用延迟方法有利地观察截面样品。样品架包括：样品放置构件，第一固定构件，作为观察样品的横截面样品和第二固定构件彼此接触并插入电子的电子光学镜筒内部显微镜; 以及用于将电压引入样品放置构件的电压引入装置。样品放置构件具有用于将第一固定构件，横截面样本和第二固定构件定位在放置位置上的定位部。定位部将位于横截面样本的观察面附近分别配置的第一固定部件的第一平面和第二固定部件的第二平面配置成与观察面平行的观察面表面。

105. 发明申请

US20150102220A1 METHOD AND SYSTEM FOR INSPECTING AN EUV MASK 有权
标题翻译：检查防毒面具的方法和系统
公开(公告)号：US20150102220A1
公开(公告)日：2015-04-16
申请号：US14575102
申请日：2014-12-18
申请人： Hermes Microvision Inc.
发明人： Guoching Weng , Youjin Wang , Chiyan Kuan , Chung-Shih Pan
IPC分类号： H05F3/02 , H01J37/20 , H01J37/26
CPC分类号： G01N23/2251 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/004 , H01J2237/0041 , H01J2237/0044 , H01J2237/2007 , H01J2237/2008 , H01J2237/202 , H01J2237/2448 , H01J2237/2602 , H01J2237/2811 , H01J2237/2813 , H05F3/02
摘要： A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.
摘要翻译：提供一种用于接地极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。用于将EUV掩模接地的结构包括至少一个接地引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或背侧上具有另外的导电层。通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUV掩模上的累积充电是接地的。通过同时使用电子束扫描连续移动台上的EUV掩模的反射表面。舞台的移动方向垂直于电子束的扫描方向。

106. 发明申请

US20150049411A1 WAFER GROUNDING AND BIASING METHOD, APPARATUS, AND APPLICATION 有权
标题翻译： WAFER接地和偏移方法，装置和应用
公开(公告)号：US20150049411A1
公开(公告)日：2015-02-19
申请号：US14531263
申请日：2014-11-03
申请人： Hermes Microvision Inc.
发明人： YI-XIANG WANG , JUYING DOU , KENICHI KANAI
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/28 , H01J37/3174 , H01J2237/0044 , H01J2237/2008
摘要： A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A pulse current pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the pulse current pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.
摘要翻译：公开了适用于带电粒子束装置的晶片接地装置和方法。晶片基板由晶片支架支撑。脉冲电流引脚布置成与形成在晶片衬底的背面上的背面膜接触。接地脉冲发生器提供至少一个脉冲以驱动脉冲电流引脚，使得在背面薄膜处发生的电介质击穿导致建立通过背面薄膜的电流路径。因此，电流通过该电流路径流过晶片衬底，然后通过由晶片衬底和晶片座之间的电容耦合形成的至少一个电流返回路径流出晶片衬底。

107. 发明申请

US20140319371A1 SAMPLE HOLDER AND CHARGED PARTICLE BEAM APPARATUS USING SAME 有权
标题翻译：使用相同的样品夹和充电颗粒光束装置
公开(公告)号：US20140319371A1
公开(公告)日：2014-10-30
申请号：US14260452
申请日：2014-04-24
申请人： Hitachi, Ltd.
发明人： Akira Sugawara , Tomokazu Shimakura , Yoshio Takahashi
IPC分类号： H01J37/20 , H01J37/26
CPC分类号： H01J37/20 , H01J37/09 , H01J37/266 , H01J2237/0264 , H01J2237/2008
摘要： The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.
摘要翻译：所公开的发明提供一种样品保持器，其能够减少或防止通过对样品施加磁场而偏转的带电粒子束的影响，并且提供用于简单地在观察样品的模式之间切换的装置，同时向样品施加磁场，以及没有完全磁场变为零的磁场的模式。样品架包括：磁场产生元件，包括用于向样品施加磁场的三个或更多个磁隙;在其一端保持样品的悬臂梁形样品保持元件;以及调节相对样品与磁隙之间的位置。磁隙可以沿带电粒子束的光轴放置。

108. 发明授权

US08859991B2 Specimen holder used for mounting samples in electron microscopes 有权
标题翻译：用于将样品安装在电子显微镜中的样品架
公开(公告)号：US08859991B2
公开(公告)日：2014-10-14
申请号：US13799871
申请日：2013-03-13
申请人： Protochips, Inc.
发明人： David P. Nackashi , John Damiano, Jr. , Stephen E. Mick , Thomas G. Schmelzer , Michael Zapata, III
IPC分类号： H01J37/20 , G01N1/28
CPC分类号： H01J37/20 , G01N1/28 , H01J2237/2007 , H01J2237/2008
摘要： A novel specimen holder for specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.
摘要翻译：用于插入电子显微镜的样品支撑装置的新型样品架。本发明的新型样品保持器为样品支撑装置提供机械支撑，以及对试样或样品支撑装置的电接触。

109. 发明授权

US08853646B2 Specimen holder used for mounting samples in electron microscopes 有权
公开(公告)号：US08853646B2
公开(公告)日：2014-10-07
申请号：US13758839
申请日：2013-02-04
申请人： Protochips, Inc.
发明人： David P. Nackashi , John Damiano, Jr. , Stephen E. Mick , Thomas G. Schmelzer , Michael Zapata, III
IPC分类号： H01J37/20 , G01N1/28
CPC分类号： H01J37/20 , G01N1/28 , H01J2237/2007 , H01J2237/2008
摘要： A novel specimen holder for specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.

110. 发明申请

US20140138558A1 METHOD FOR FORMING AN ELECTRICAL CONNECTION TO AN SAMPLE SUPPORT IN AN ELECTRON MICROSCOPE HOLDER 有权
标题翻译：在电子显微镜支架中形成与样品支持电气连接的方法
公开(公告)号：US20140138558A1
公开(公告)日：2014-05-22
申请号：US14079223
申请日：2013-11-13
申请人： PROTOCHIPS, INC.
发明人： John DAMIANO, JR. , David P. NACKASHI , Daniel Stephen GARDINER , Franklin Stampley WALDEN, II , William Bradford CARPENTER
IPC分类号： H01R33/945 , H01J37/20
CPC分类号： H01R13/24 , H01J37/20 , H01J37/26 , H01J2237/2003 , H01J2237/2007 , H01J2237/2008 , H01J2237/206 , H01R12/721 , H01R12/79
摘要： An electrical connector for use in electron microscopy sample holders. The electrical connector provides electrical contacts to the sample support devices which are positioned in the sample holders for electrical, temperature and/or electrochemical control.
摘要翻译：用于电子显微镜样品架的电连接器。电连接器为位于样品保持器中的样品支撑装置提供电接触，用于电气，温度和/或电化学控制。

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