会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 104. 发明申请
    • Anti-Capture Method and Apparatus for Micromachined Devices
    • 用于微加工设备的防捕获方法和装置
    • US20110221454A1
    • 2011-09-15
    • US13113548
    • 2011-05-23
    • David C. HollocherHoward R. Samuels
    • David C. HollocherHoward R. Samuels
    • G01R27/26
    • G01P15/125B81B3/0008B81B2201/0235G01C19/56G01P15/131G01P2015/0814
    • A MEMS device has a movable beam, a differential capacitor with a movable electrode that moves in response to the displacement of the movable beam and that is disposed between two stationary electrodes, and a voltage circuit for applying a first voltage to the first stationary electrode, second voltage to the second stationary electrode, and a third voltage to the moveable electrode. The MEMS device also has a monitor operably coupled with the movable beam to monitor the displacement of the movable beam. In some embodiments, the monitor may monitor the distance between the movable electrode and at least one of the stationary electrodes. The MEMS device further has a voltage reducing circuit operatively coupled with the monitor, the movable electrode, and the stationary electrodes. The voltage reducing circuit reduces the differential between the third voltage and the voltages on the stationary electrodes when the monitor detects that the displacement of the movable beam is greater than or equal to a threshold value.
    • MEMS器件具有可移动光束,具有可移动电极的差分电容器,其响应于可移动光束的位移而移动并且设置在两个固定电极之间;以及电压电路,用于向第一固定电极施加第一电压, 到第二固定电极的第二电压,以及到可动电极的第三电压。 MEMS器件还具有可操作地与可移动光束耦合的监视器,以监测可移动光束的位移。 在一些实施例中,监视器可以监视可移动电极与至少一个固定电极之间的距离。 MEMS器件还具有与监视器,可移动电极和固定电极可操作地耦合的电压降低电路。 当监视器检测到可移动光束的位移大于或等于阈值时,电压降低电路减小了第三电压和固定电极上的电压之间的差。
    • 109. 发明授权
    • Non-planar surface structures and process for microelectromechanical systems
    • 微机电系统的非平面表面结构和工艺
    • US07527996B2
    • 2009-05-05
    • US11406981
    • 2006-04-19
    • Qi LuoSriram AkellaLior Kogut
    • Qi LuoSriram AkellaLior Kogut
    • H01L21/00
    • B81B3/0008G02B26/001
    • Methods of making MEMS devices including interferometric modulators involve depositing various layers, including stationary layers, movable layers and sacrificial layers, on a substrate. Voids are formed in one or more of the various layers so as to form a non-planar surface on the movable and/or the stationary layers. The voids are formed to extend through less than the entire thickness of the layer where they are being formed. Other layers may be formed over the formed voids. Removal of the sacrificial layer from between the resulting non-planar movable and/or stationary layers results in a released MEMS device having reduced contact area between the movable and stationary layers when the MEMS device is actuated. The reduced contact area results in lower adhesion forces and reduced stiction during actuation of the MEMS device. These methods may be used to manufacture released and unreleased interferometric modulators.
    • 制造包括干涉式调制器的MEMS器件的方法包括在衬底上沉积包括固定层,可移动层和牺牲层的各种层。 在各层中的一个或多个中形成空隙,以在可移动和/或固定层上形成非平面表面。 空隙形成为延伸穿过小于形成它们的层的整个厚度。 可以在所形成的空隙上形成其它层。 从所得到的非平面可移动和/或固定层之间去除牺牲层导致当MEMS器件致动时,可释放的MEMS器件具有减小的可移动层和固定层之间的接触面积。 减小的接触面积导致MEMS器件的致动期间较低的粘附力和降低的静摩擦力。 这些方法可用于制造释放和未释放的干涉式调制器。