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    • 105. 发明授权
    • Probe structure
    • 探头结构
    • US06614246B1
    • 2003-09-02
    • US09648452
    • 2000-08-28
    • Ryuji KohnoTatsuya NagataHiroya ShimizuToshio MiyatakeHideo Miura
    • Ryuji KohnoTatsuya NagataHiroya ShimizuToshio MiyatakeHideo Miura
    • G01R1073
    • G01R1/07378
    • The invention provides a probe structure in which secondary electrodes of a main base material in which probes are formed can be electrically connected to electrodes in a substrate side even when a lot of probes are formed in a large area, so that a lot of LSIs within a wafer can be tested in one lot in a wafer test process, whereby an efficiency of the test process can be improved. In the probe structure, an interposer constituted by a high rigid material is arranged between the main base material having the probes formed therein and the substrate side, and the secondary electrodes of the main base material having the probes formed therein are electrically connected to the electrodes in the substrate side via the interposer.
    • 本发明提供了一种探针结构,其中形成探针的主要基底材料的二次电极即使在大面积形成大量探针的情况下也可以与衬底侧的电极电连接,从而使大量的LSIs 可以在晶片测试过程中一次性地测试晶片,从而可以提高测试过程的效率。 在探针结构中,由具有高刚性材料的插入体配置在其中形成有探针的主基材和基板侧之间,并且其中形成有探针的主基材的二次电极电连接到电极 在基板侧经由插入件。