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    • 103. 发明申请
    • METHOD FOR ACQUIRING SPECTRUM SHAPE OF A GAIN FLATTENING FILTER IN AN OPTICAL AMPLIFIER
    • 在光放大器中获取增益滤光片的光谱形状的方法
    • US20090052015A1
    • 2009-02-26
    • US12195864
    • 2008-08-21
    • Zhigang WangAihua Yu
    • Zhigang WangAihua Yu
    • H01S3/00
    • H01S3/06754H01S3/0014H01S3/1616H01S2301/04
    • A method for acquiring spectrum shape of a gain flattening filter of a doped optical fiber amplifier comprises the steps of: measuring spectrum shapes at two gain point (H, L) of the doped optical fiber with invariable fiber length respectively; and acquiring various gain spectrums of the doped optical fiber with various fiber length and various population inversion level according to an expression: ErGain(λ,x,L′)=[ErLGain(λ)+[ErHGain(λ)−ErLGain(λ)]*x]*L′, Wherein Gain(λ) refers to the spectral function of gain, x is Δ′inv/Δinv which refers to change of population inversion level, and L′ is set as proportion of doped fiber length. Gain spectrums of the doped optical fiber with various fiber length can be acquired by measuring spectrum shapes at two gain point (H, L) of the doped optical fiber in invariable fiber length and applying change rule of gain spectrum of the doped optical fiber in different population inversion level, which improves the flexibility for design of amplifier.
    • 一种用于获取掺杂光纤放大器的增益平坦滤波器的光谱形状的方法,包括以下步骤:分别测量具有不变光纤长度的掺杂光纤的两个增益点(H,L)处的光谱形状; 并且根据以下表达式获取具有各种光纤长度和各种总体反转电平的掺杂光纤的各种增益光谱:<?in-line-formula description =“In-line Formulas”end =“lead”?> ErGain(λ, x,L')= [ErLGain(lambda)+ [ErHGain(lambda)-ErLGain(lambda)] * x] * L',<?in-line-formula description =“In-line Formulas”end =“tail” ?>其中增益(lambda)是指增益的光谱函数,x是Delta'inv / Deltainv,其指的是群体反转级别的变化,L'被设置为掺杂光纤长度的比例。 通过以不变的光纤长度测量掺杂光纤的两个增益点(H,L)处的光谱形状,并将掺杂光纤的增益光谱的变化规则应用于不同的光纤中,可以获得具有各种光纤长度的掺杂光纤的增益谱 人口反演水平提高了放大器设计的灵活性。
    • 107. 发明授权
    • Flash memory cell programming method and system
    • 闪存单元编程方法和系统
    • US06894925B1
    • 2005-05-17
    • US10342585
    • 2003-01-14
    • Sheunghee ParkSameer S. HaddadChi ChangRichard M. FastowMing Sang KwanZhigang Wang
    • Sheunghee ParkSameer S. HaddadChi ChangRichard M. FastowMing Sang KwanZhigang Wang
    • G11C11/56G11C16/04H01L29/423H01L29/788
    • G11C11/5621G11C16/0416H01L29/42324H01L29/7883
    • A flash memory cell programming system and method that facilitate efficient and quick operation of a flash memory cell by providing a biasable well (e.g., substrate) is presented. The biasable well flash memory cell enables increases in electrical field strengths in a manner that eases resistance to charge penetration of a dielectric barrier (e.g., oxide) around a charge trapping region (e.g., a floating gate). The present biasable well system and method also create a self convergence point that increase control during programming operations and reduces the chances of excessive correction for over erased memory cells. The biasing can assist hard programming to store information and/or soft programming to correct the effects of over-erasing. The biasing can also reduce stress on a drain voltage pump, reduce leakage current and reduce programming durations. Some implementations also include a biasable control gate component, biasable source component and biasable drain component.
    • 提出了一种闪存单元编程系统和方法,其通过提供可偏置的阱(例如,衬底)来促进闪存单元的有效和快速的操作。 可偏置阱快闪存储器单元能够以减轻电荷俘获区域(例如浮栅)周围的电介质势垒(例如氧化物)的电荷穿透的方式增加电场强度。 本发明的偏压井系统和方法还创建了一个自会聚点,从而在编程操作期间增加了控制,并降低了对擦除过的存储器单元过度校正的可能性。 偏置可以帮助硬编程来存储信息和/或软编程以校正过度擦除的影响。 偏置还可以减少漏极电压泵上的应力,减少泄漏电流并减少编程持续时间。 一些实施方案还包括可偏置控制栅极分量,可偏置源分量和可偏置漏极分量。
    • 108. 发明授权
    • Use of high-K dielectric material for ONO and tunnel oxide to improve floating gate flash memory coupling
    • 对于ONO和隧道氧化物使用高K介电材料来改善浮栅闪存耦合
    • US06617639B1
    • 2003-09-09
    • US10176594
    • 2002-06-21
    • Zhigang WangXin GuoYue-Song He
    • Zhigang WangXin GuoYue-Song He
    • H01L29788
    • H01L21/28194H01L21/28273H01L29/513H01L29/517H01L29/518H01L29/66825H01L29/7883
    • A floating gate flash memory device including a substrate comprising a source region, a drain region, and a channel region positioned therebetween; a floating gate electrode positioned above the channel region and separated from the channel region by a tunnel dielectric material layer; and a control gate electrode positioned above the floating gate electrode and separated from the floating gate electrode by an interpoly dielectric layer, the interpoly dielectric layer comprising a modified ONO structure having a bottom dielectric material layer adjacent to the floating gate electrode, a top dielectric material layer adjacent to the control gate electrode, and a center layer comprising a nitride and positioned between the bottom dielectric material layer and the top dielectric material layer, in which the tunnel dielectric material layer, and at least one of the bottom dielectric material layer and the top dielectric material layer, comprise a high-K dielectric material.
    • 一种浮栅闪存器件,包括:衬底,包括源极区,漏极区和位于其间的沟道区; 位于通道区域上方并通过隧道介电材料层与沟道区分离的浮栅电极; 以及控制栅电极,其位于所述浮置栅电极的上方,并且通过间隔电介质层与所述浮栅电极分离,所述互聚电介质层包括具有与所述浮栅电极相邻的底电介质材料层的修饰的ONO结构,顶介电材料 层,以及包括氮化物并位于底部电介质材料层和顶部电介质材料层之间的中心层,其中隧道电介质材料层和底部电介质材料层和底部电介质材料层中的至少一个 顶部介电材料层,包括高K电介质材料。
    • 109. 发明授权
    • Method of channel hot electron programming for short channel NOR flash arrays
    • 用于短通道NOR闪存阵列的通道热电子编程方法
    • US06510085B1
    • 2003-01-21
    • US09861031
    • 2001-05-18
    • Richard FastowSheunghee ParkZhigang WangSameer HaddadChi Chang
    • Richard FastowSheunghee ParkZhigang WangSameer HaddadChi Chang
    • G11C1604
    • G11C16/3409G11C16/10G11C16/12G11C16/3404
    • Methods of programming and soft programming short channel NOR flash memory cells that reduce the programming currents and column leakages during both programming and soft programming while maintaining fast programming speeds. During programming, a voltage of between 7 and 10 volts is applied to the control gate, a voltage of between 4 and 6 volts; is applied to the drain, a voltage of between 0.5 and 2.0 volts is applied to the source and a voltage of between minus 2 and minus 0.5 volts is applied to the substrate of the selected cell to be programmed. During soft programming, a voltage of between 0.5 and 4.5 volts is applied to the control gates, between 4 and 5.5 volts is applied to the drains, between 0.5 and 2 volts is applied to the sources and between minus 2.0 and minus 0.5 volts is applied to the substrates of the memory cells.
    • 编程和软编程短节目NOR闪存单元的方法,可在编程和软编程期间减少编程电流和列泄漏,同时保持快速的编程速度。 在编程期间,7至10伏之间的电压施加到控制栅极,电压在4和6伏之间; 施加到漏极,将0.5至2.0伏之间的电压施加到源极,并且在所述要编程的所选择的单元的衬底之间施加负2和负0.5伏之间的电压。 在软编程期间,向控制栅极施加0.5至4.5伏之间的电压,在漏极之间施加4至5.5伏之间的电压,施加0.5至2伏之间的电压,并施加负2.0至负0.5伏之间 到存储单元的基板。