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101. 发明授权

US08586282B2 Resist composition and patterning process 有权
公开(公告)号：US08586282B2
公开(公告)日：2013-11-19
申请号：US13427653
申请日：2012-03-22
申请人： Satoshi Watanabe , Akinobu Tanaka , Takeru Watanabe , Takeshi Kinsho
发明人： Satoshi Watanabe , Akinobu Tanaka , Takeru Watanabe , Takeshi Kinsho
IPC分类号： G03F7/00 , G03F7/028 , G03F7/40
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/114 , Y10S430/128
摘要： The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

102. 发明授权

US08546060B2 Chemically amplified positive resist composition and pattern forming process 有权
标题翻译：化学扩增正光刻胶组成和图案形成过程
公开(公告)号：US08546060B2
公开(公告)日：2013-10-01
申请号：US13027362
申请日：2011-02-15
申请人： Keiichi Masunaga , Satoshi Watanabe , Akinobu Tanaka , Daisuke Domon
发明人： Keiichi Masunaga , Satoshi Watanabe , Akinobu Tanaka , Daisuke Domon
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： A chemically amplified positive resist composition is provided comprising a polymer PB having an amine structure bound thereto and a polymer PA comprising recurring units having an acidic side chain protected with an acid labile protective group and recurring units having an acid generating moiety on a side chain.
摘要翻译：提供化学放大的正性抗蚀剂组合物，其包含具有结合于其上的胺结构的聚合物PB和包含具有由酸不稳定保护基保护的酸性侧链的重复单元的聚合物PA和在侧链上具有产酸部分的重复单元。

103. 发明授权

US08470509B2 Negative resist composition and patterning process 有权
标题翻译：负阻抗组成和图案化工艺
公开(公告)号：US08470509B2
公开(公告)日：2013-06-25
申请号：US12902868
申请日：2010-10-12
申请人： Akinobu Tanaka , Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
发明人： Akinobu Tanaka , Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
IPC分类号： G03F7/004 , G03F7/028 , G03F7/038 , G03F7/26
CPC分类号： G03F7/0382 , G03F7/0045
摘要： There is disclosed a negative resist composition wherein a base resin contains at least repeating units represented by the following general formula (1) and general formula (2) and has a weight average molecular weight of 1,000 to 10,000, and the compound containing a nitrogen atom as a basic component contains one or more kinds of amine compounds having a carboxyl group and not having a hydrogen atom covalently bonded to a base-center nitrogen atom. There can be a negative resist composition in which a bridge hardly occurs, substrate dependence is low and a pattern with a high sensitivity and a high resolution can be formed, and a patterning process using the same.
摘要翻译：公开了一种负型抗蚀剂组合物，其中基础树脂至少含有由以下通式（1）和通式（2）表示的重复单元，其重均分子量为1,000至10,000，并且含有氮原子的化合物碱性组分含有一种或多种具有羧基并且不具有与碱中心氮原子共价键合的氢原子的胺化合物。可以存在几乎不发生桥的负的抗蚀剂组合物，衬底依赖性低，并且可以形成具有高灵敏度和高分辨率的图案，以及使用其的图案化处理。

104. 发明授权

US08456677B2 Image information transmission device, image information transmission method and computer readable medium 有权
标题翻译：图像信息发送装置，图像信息发送方法和计算机可读介质
公开(公告)号：US08456677B2
公开(公告)日：2013-06-04
申请号：US12787733
申请日：2010-05-26
申请人： Isao Tanaka , Minoru Yoshida , Toshitaka Nakagawa , Satoshi Watanabe , Nobuyuki Kudo , Hitoshi Tamura
发明人： Isao Tanaka , Minoru Yoshida , Toshitaka Nakagawa , Satoshi Watanabe , Nobuyuki Kudo , Hitoshi Tamura
IPC分类号： G06F3/12
CPC分类号： H04N1/32037 , H04N1/32058 , H04N1/3209 , H04N2201/0093 , H04N2201/0094
摘要： An image information transmission device includes a registration unit, a storage unit, a determination unit, and an image information transmission unit. The registration unit registers an image information transmission instruction describing a destination number specifying a destination of image information and an abbreviated number corresponding to the destination number. The storage unit stores the destination number and transmission setting information used for transmitting the image information to the destination specified by the destination number. The determination unit determines whether or not the destination number described in the image information transmission instruction is contained in the destination number. The image information transmission unit transmits the image information.
摘要翻译：图像信息传输装置包括注册单元，存储单元，确定单元和图像信息传输单元。注册单元注册描述指定图像信息的目的地的目的地号码和对应于目的地号码的缩写号码的图像信息传输指令。存储单元将用于将图像信息发送到由目的地号码指定的目的地的目的地号码和发送设置信息存储。确定单元确定图像信息发送指令中描述的目的地号码是否包含在目的地号码中。图像信息发送单元发送图像信息。

105. 发明授权

US08442036B2 Image communication apparatus 有权
标题翻译：图像通信装置
公开(公告)号：US08442036B2
公开(公告)日：2013-05-14
申请号：US12608471
申请日：2009-10-29
申请人： Satoshi Watanabe , Kazutaka Saitoh , Yuji Fujikawa , Isao Tanaka , Hirotaka Kawabata
发明人： Satoshi Watanabe , Kazutaka Saitoh , Yuji Fujikawa , Isao Tanaka , Hirotaka Kawabata
IPC分类号： H04L12/66
CPC分类号： H04L65/1053 , H04L65/1006
摘要： An image communication apparatus comprises: a call connection control unit that establishes a session with a communication partner using an SIP message; and an image communication control unit that controls an image communication, wherein (i) when the call connection control unit receives, as a calling party, from a called party, an INVITE SIP message in which a T.38 communication and a first priority transport are specified in a session description protocol, and when a second priority transport is set in the image communication apparatus of the calling party, the call connection control unit opens the second priority transport, and (ii) when no priority transport is set in the image communication apparatus of the calling party, the call connection control unit opens the first priority transport specified by the called party, and performs a T.38 communication using the opened transport.
摘要翻译：一种图像通信装置，包括：呼叫连接控制单元，其使用SIP消息建立与通信对方的会话; 以及图像通信控制单元，其控制图像通信，其中（i）当呼叫连接控制单元从被叫方接收作为主叫方的INVITE SIP消息时，其中T.38通信和第一优先传输在会话描述协议中指定，并且当在主叫方的图像通信设备中设置第二优先级传输时，呼叫连接控制单元打开第二优先级传输，并且（ii）当在图像中没有设置优先级传输时呼叫连接控制单元打开由被叫方指定的第一优先级传输，并使用打开的传输进行T.38通信。

106. 发明授权

US08394577B2 Patterning process 有权
标题翻译：图案化过程
公开(公告)号：US08394577B2
公开(公告)日：2013-03-12
申请号：US12756587
申请日：2010-04-08
申请人： Akinobu Tanaka , Tamotsu Watanabe , Satoshi Watanabe
发明人： Akinobu Tanaka , Tamotsu Watanabe , Satoshi Watanabe
IPC分类号： G03F7/26
CPC分类号： G03F7/0382 , G03F7/0048 , G03F7/0392 , G03F7/40
摘要： In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1,400-5,000 pbw of the solvent is present per 100 pbw of the base resin, and the solvent comprises at least 60 wt % of PGMEA and ethyl lactate, and 0.2-20 wt % of a high-boiling solvent. A resist pattern is formed by coating the resist composition on a substrate, prebaking, patternwise exposure, post-exposure baking, development, and heat treatment.
摘要翻译：在包含基础树脂，酸产生剂和溶剂的化学放大型抗蚀剂组合物中，每100pbw的基础树脂存在1,400-5,000pbw的溶剂，溶剂包含至少60wt％的PGMEA和乳酸乙酯，和0.2-20重量％的高沸点溶剂。通过将抗蚀剂组合物涂布在基材上，预烘烤，图案曝光，曝光后烘烤，显影和热处理来形成抗蚀剂图案。

107. 发明授权

US08361693B2 Chemically amplified positive photoresist composition and pattern forming process 有权
标题翻译：化学扩增正光致抗蚀剂组合物和图案形成工艺
公开(公告)号：US08361693B2
公开(公告)日：2013-01-29
申请号：US12815787
申请日：2010-06-15
申请人： Keiichi Masunaga , Akinobu Tanaka , Daisuke Domon , Satoshi Watanabe , Youichi Ohsawa , Masaki Ohashi
发明人： Keiichi Masunaga , Akinobu Tanaka , Daisuke Domon , Satoshi Watanabe , Youichi Ohsawa , Masaki Ohashi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0392 , G03F7/0045
摘要： A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents.
摘要翻译：使用包含高比例的含芳环结构的单元并在侧链上含有芳族磺酸锍盐的聚合物形成化学放大的正性光致抗蚀剂组合物，该组合物有效地形成具有高耐蚀刻性的抗蚀剂图案。该聚合物克服了用于聚合和纯化的溶剂溶解和抗蚀剂溶剂中的问题。

108. 发明授权

US08343694B2 Photomask blank, resist pattern forming process, and photomask preparation process 有权
标题翻译：光掩模坯料，抗蚀剂图案形成工艺和光掩模制备工艺
公开(公告)号：US08343694B2
公开(公告)日：2013-01-01
申请号：US13207764
申请日：2011-08-11
申请人： Ryuji Koitabashi , Satoshi Watanabe , Takanobu Takeda , Keiichi Masunaga , Tamotsu Watanabe
发明人： Ryuji Koitabashi , Satoshi Watanabe , Takanobu Takeda , Keiichi Masunaga , Tamotsu Watanabe
IPC分类号： G03F9/00
CPC分类号： G03F7/0046 , G03F7/0392
摘要： A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity.
摘要翻译：光掩模坯料具有抗蚀剂膜，其包含（A）基础树脂，（B）酸产生剂和（C）碱性化合物。抗蚀剂膜还包含（D）包含具有侧链的聚合物的聚合物，所述重链单元具有含有羟基键合的碳原子的氟化烃基和与其键合的连接碳原子的侧链，所述连续碳原子总共至少两个氟原子键合到其上。聚合物（D）的添加确保了整个抗蚀剂膜的均匀显影，能够形成具有高CD均匀性的抗蚀剂图案。

109. 发明授权

US08210941B2 Medium position detection device, display device, game device and token game device 有权
标题翻译：中等位置检测装置，显示装置，游戏装置和令牌游戏装置
公开(公告)号：US08210941B2
公开(公告)日：2012-07-03
申请号：US11632704
申请日：2005-07-22
申请人： Yasufumi Tanabe , Kenichi Takizawa , Toshio Matsumura , Satoshi Watanabe
发明人： Yasufumi Tanabe , Kenichi Takizawa , Toshio Matsumura , Satoshi Watanabe
IPC分类号： A63F9/24 , A63F13/00
CPC分类号： G02B6/0036 , A63F7/02 , A63F2009/2445 , G07F17/32 , G07F17/3202
摘要： A medium position detection device including: a medium moving space (10) formed in which a plurality of media (30) can simultaneously move without overlapping in a predetermined direction; a light-guiding plate (11) which perpendicularly intersects the predetermined direction and defines the front of the medium moving space (10); a light source (20) disposed to emit light entering an end surface of the light-guiding plate (11); a reflecting section (13) formed in the light-guiding plate (11) so that the light having entered the light-guiding plate (11) is reflected by the reflecting section (13) and exits the light-guiding plate (11) through a back surface of the light-guiding plate (11); and detection means which detects the light from the light-guiding plate (11).
摘要翻译：一种介质位置检测装置，包括：介质移动空间（10），其中多个介质（30）可以在预定方向上同时移动而不重叠; 导光板（11），其垂直于所述预定方向并且限定所述介质移动空间（10）的前部; 光源（20），设置为发射进入所述导光板（11）端面的光; 形成在导光板（11）中的反射部分（13），使得已经进入导光板（11）的光被反射部分（13）反射并且通过导光板（11）通过导光板（11）的背面; 以及检测来自导光板（11）的光的检测装置。

110. 发明授权

US08164899B2 Dust-and-water proof casing 有权
标题翻译：防尘外壳
公开(公告)号：US08164899B2
公开(公告)日：2012-04-24
申请号：US12759127
申请日：2010-04-13
申请人： Shingo Yamaguchi , Satoshi Watanabe
发明人： Shingo Yamaguchi , Satoshi Watanabe
IPC分类号： G06F1/16
CPC分类号： H05K5/061 , G06F1/1616 , G06F1/1656 , H04M1/0214 , H04M1/0249 , H04M1/18
摘要： In order to seal an internal space of a casing having an upper and lower casing members, a continuous groove with a semicircular cross-section is formed around a dust-and-water proof area of the lower casing member, and a continuous elongated protrusion is formed on the portion of the upper casing member corresponding to the groove, so that the protrusion is inserted in the groove when two casing members are engaged. Spherical sealing members each having the same diameter as the groove width are arrayed continuously in the groove without gaps therebetween. The width of the elongated protrusion is configured to be smaller than the groove width, so that the spherical sealing members compressed when the casing members are fitted are deformed to enter a space defined between the elongated protrusion and the groove, to thereby form a dust-and-water proof structure. Inserting the spherical sealing members in the groove is easy.
摘要翻译：为了密封具有上壳体构件和下壳体构件的壳体的内部空间，在下壳体构件的防尘防水区域周围形成具有半圆形横截面的连续槽，并且连续的细长突起形成在与槽相对应的上壳体部件的部分上，使得当两个壳体构件接合时突起插入凹槽中。每个具有与槽宽度相同直径的球形密封构件连续地排列在凹槽中，而没有间隙。细长突起的宽度被构造成小于槽宽度，使得当壳体构件配合时被压缩的球形密封构件变形以进入限定在细长突起和槽之间的空间，从而形成防尘层，防水结构。将球形密封件插入槽很容易。

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