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101. 发明申请

US20060246823A1 COOLANT SUPPLY METHOD AND APPARATUS FOR GRINDING MACHINE 有权
标题翻译：冷却剂供应方法和研磨机的设备
公开(公告)号：US20060246823A1
公开(公告)日：2006-11-02
申请号：US11401323
申请日：2006-04-11
申请人： Hiroshi Morita , Kimihiro Ban , Shinichi Yokota
发明人： Hiroshi Morita , Kimihiro Ban , Shinichi Yokota
IPC分类号： B24B51/00 , B24B1/00 , B24B55/02
CPC分类号： B24B55/045
摘要： In a coolant supply method and apparatus for a grinding machine, when an end surface of a workpiece is ground with a grinding wheel end surface of a grinding wheel with coolant being supplied toward a grinding point, a first coolant flow is ejected toward a first position which is on the grinding wheel end surface on an upstream side of the grinding point, and intercepts an air layer rotating to follow the grinding wheel end surface. At the same time, a second coolant flow is ejected toward a second position which is on the grinding wheel end surface and which is closer to the grinding point than the first point, and clings onto the grinding wheel end surface at the second position where the follow air layer has been intercepted by the first coolant flow. Thus, the coolant of a sufficient volume can be supplied to the grinding point where the grinding wheel end surface grinds the end surface of the workpiece.
摘要翻译：在用于研磨机的冷却剂供给方法和装置中，当工件的端面用研磨轮的砂轮端面研磨时，其中朝向研磨点供给冷却剂，第一冷却剂流朝向第一位置喷射其位于研磨点的上游侧的砂轮端面上，并拦截沿着砂轮端面旋转的空气层。同时，向第二位置喷射第二冷却剂流，该第二位置位于砂轮端面上并且比第一点更靠近研磨点，并且在第二位置附着在砂轮端面上，跟随空气层已被第一冷却剂流拦截。因此，足够体积的冷却剂可以被供给到研磨点，其中砂轮端面研磨工件的端面。

102. 发明授权

US06932673B2 Grinding method and device for the same 有权
标题翻译：研磨方法和装置相同
公开(公告)号：US06932673B2
公开(公告)日：2005-08-23
申请号：US10375948
申请日：2003-02-28
申请人： Hiroshi Morita , Takayuki Yoshimi , Ryohei Mukai
发明人： Hiroshi Morita , Takayuki Yoshimi , Ryohei Mukai
IPC分类号： B23Q11/10 , B24B5/04 , B24B55/02 , B24B49/00 , B24B1/00 , B24B51/00
CPC分类号： B24B5/04 , B24B55/02
摘要： The present invention supplies coolant to a grinding wheel surface and reliably guides the coolant to a grinding point on the grinding wheel surface, thereby significantly reducing the amount of coolant to be used.In a grinding method and device for supplying coolant while grinding a workpiece W with a rotating grinding wheel 1, a fluid nozzle 2 is disposed upstream from a grinding point 11 on the circumferential surface 10 of the grinding wheel 1. The fluid nozzle 2 blows a jet of fluid across an air layer 12, which is a layer of flowing air dragged along the circumferential surface 10 of the grinding wheel 1, from one lateral side of the air layer 12 to the other lateral side thereof. A grinding fluid nozzle 3 supplies coolant to a region between the grinding point 11 and a cutoff position 13 at which the fluid jet from the fluid nozzle 2 has deflected the air flow from the air layer 12. The coolant supplied from the grinding fluid nozzle 3 contacts the grinding point 11 on the grinding surface 10.
摘要翻译：本发明将冷却剂提供给砂轮表面并且可靠地将冷却剂引导到砂轮表面上的研磨点，从而显着减少要使用的冷却剂的量。在用旋转砂轮1研磨工件W的同时供给冷却剂的研磨方法和装置中，流体喷嘴2设置在研磨点11的上方，在磨轮1的圆周面10上。流体喷嘴2通过空气层12吹送流体，空气层12是空气层12，空气层12是沿着空气层12的一个横向侧向另一个横向侧沿着砂轮1的圆周表面10拖动的流动空气层。研磨流体喷嘴3向研磨点11和切断位置13之间的区域提供冷却剂，在该区域处，来自流体喷嘴2的流体射流已经使来自空气层12的气流偏转。从研磨液喷嘴3供给的冷却剂与研磨面10上的研磨点11接触。

103. 发明授权

US06817104B2 X-Y stage apparatus 失效
标题翻译： X-Y舞台装置
公开(公告)号：US06817104B2
公开(公告)日：2004-11-16
申请号：US10144750
申请日：2002-05-15
申请人： Makoto Kaneko , Hiroshi Morita , Yasuhito Nakamori , Masanobu Sugimine , Yoshiyuki Tomita
发明人： Makoto Kaneko , Hiroshi Morita , Yasuhito Nakamori , Masanobu Sugimine , Yoshiyuki Tomita
IPC分类号： B23Q1600
CPC分类号： B23Q1/34 , B23Q1/621
摘要： The speed and precision in positioning a moving table in the X-axis and Y-axis directions is enhanced dramatically. An X-Y stage apparatus is provided, in which a moving table is supported relative to a stationary base, with slight displacements made possible within the XY plane, and in which a component mounted and placed on the moving table can be positioned within the XY plane. The X-Y stage apparatus includes an elastic hinge that is flexible only in one or two direction among the X-axis, Y-axis, and Z-axis directions, and rigid in directions of the other axes. The moving table is supported relative to the stationary base with slight displacements made possible in the XY plane, using an elastic deformation of each of the elastic hinges in the flexible direction. Furthermore, the moving table can be slightly displaced within the XY plane, using an X-axis linear motor, and a Y-axis linear motor.
摘要翻译：移动台在X轴和Y轴方向定位的速度和精度大大提高。提供了一种X-Y平台装置，其中移动台相对于固定基座被支撑，在XY平面内具有可能的微小位移，并且其中安装并放置在移动台上的部件可以位于XY平面内。 X-Y平台装置包括弹性铰链，其在X轴，Y轴和Z轴方向上在一个或两个方向上是柔性的，并且在另一个轴线的方向上是刚性的。移动台相对于固定基座被支撑，在XY平面中可以使用弹性铰链在柔性方向上的弹性变形使其具有可能的微小位移。此外，移动台可以使用X轴线性电动机和Y轴线性电动机在XY平面内稍微移位。

104. 发明授权

US06730239B1 Cleaning agent for semiconductor device & method of fabricating semiconductor device 失效
标题翻译：半导体装置用清洗剂及半导体装置的制造方法
公开(公告)号：US06730239B1
公开(公告)日：2004-05-04
申请号：US09678793
申请日：2000-10-04
申请人： Itaru Kanno , Naoki Yokoi , Hiroshi Morita , Naoki Ichiki , Hideaki Nezu , Masayuki Takashima
发明人： Itaru Kanno , Naoki Yokoi , Hiroshi Morita , Naoki Ichiki , Hideaki Nezu , Masayuki Takashima
IPC分类号： C09K1300
CPC分类号： H01L21/02071 , C09K13/02 , C11D1/44 , C11D1/722 , C11D3/044 , C11D11/0047 , H01L21/02052 , H01L21/31116
摘要： A cleaning agent for a semiconductor device contains a hydroxide, water and a compound expressed in the following general formula (I) and/or the following general formula (II): HO—((EO)x—(PO)y)z—H (I) R—[(EO)x—(PO)y)z—H]m (II) Thus provided is a cleaning agent for a semiconductor device, which is so improved as not to disconnect a wire or an embedded conductive layer.
摘要翻译：用于半导体器件的清洁剂包含氢氧化物，水和由以下通式（I）和/或以下通式（II）表示的化合物：因此提供了一种如此改进的半导体器件用清洁剂不要断开电线或嵌入式导电层。

105. 发明授权

US06464867B1 Apparatus for producing water containing dissolved ozone 有权
标题翻译：用于生产含有溶解臭氧的水的装置
公开(公告)号：US06464867B1
公开(公告)日：2002-10-15
申请号：US09958890
申请日：2001-10-12
申请人： Hiroshi Morita , Osamu Ota , Tetsuo Mizuniwa , Kazumi Tsukamoto
发明人： Hiroshi Morita , Osamu Ota , Tetsuo Mizuniwa , Kazumi Tsukamoto
IPC分类号： C02F178
CPC分类号： C02F1/78 , B01F3/04099 , B01F3/04985 , B01F2003/04886 , C01B13/10 , C02F1/32 , C02F1/44 , C02F1/68 , C02F1/725 , C02F2103/04 , C02F2103/12 , C02F2201/782 , Y10S210/90
摘要： An apparatus for producing water containing dissolved ozone which comprises (A) a piping for supplying ultrapure water through which ultrapure water is supplied, (B) a catalytic reaction portion which is connected with the piping for supplying ultrapure water and in which the ultrapure water is brought into contact with an oxidation-reduction catalyst, (C) a filtration apparatus by which the ultrapure water treated in the catalytic reaction portion is filtered and (D) an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water discharged from the filtration apparatus; and an apparatus for producing water containing dissolved ozone which comprises an apparatus for producing ultrapure water which is equipped with an apparatus for irradiating with ultraviolet light, an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water produced in the apparatus for producing ultrapure water and a catalytic reaction portion which is packed with an oxidation-reduction catalyst and disposed between the apparatus for irradiating with ultraviolet light and the apparatus for dissolving ozone. Substances promoting decomposition of ozone which are contained in ultrapure water in very small amounts are removed and water containing dissolved ozone which shows little decrease in the concentration of ozone and has a great residual fraction of ozone dissolved in water after transportation for a long distance can be obtained.
摘要翻译：一种含有溶解臭氧的水的制造装置，其特征在于，包括：（A）供给超纯水的超纯水的配管，（B）与供给超纯水的管道连接的催化反应部，超纯水与氧化还原催化剂接触，（C）将在催化反应部分处理的超纯水过滤的过滤装置和（D）将臭氧溶解在臭氧中的臭氧溶解装置（D）过滤装置; 以及含有溶解臭氧的水的制造装置，其特征在于，包括：设置有紫外线照射装置的超纯水的制造装置，将臭氧溶解在超纯水装置中生成的超纯水中的臭氧溶解装置水和催化反应部分，其被填充有氧化还原催化剂并且设置在用于照射紫外线的装置和用于溶解臭氧的装置之间。可以除去非常少量促进超纯水中包含的臭氧分解的物质，并且在长距离运输后，溶解臭氧浓度几乎不降低，臭氧溶解在水中的溶解臭氧的含有溶解臭氧的水可以是获得。

106. 发明授权

US06409918B1 Apparatus for supplying ozonated ultrapure water 有权
标题翻译：用于提供臭氧超纯水的设备
公开(公告)号：US06409918B1
公开(公告)日：2002-06-25
申请号：US09185836
申请日：1998-11-04
申请人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
发明人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
IPC分类号： C02F178
CPC分类号： C02F1/78 , C02F2103/04 , Y10S210/90
摘要： An ozonated ultrapure water supply system that prevents reduction of the dissolved ozone concentration in the supply pipe system and maintains the dissolved ozone at points of use along the supply system at desired concentrations. This permits the system to supply ozonated water in long pipes. The system includes a sequential arrangement of a circulatory main pipe 3 for supplying ultrapure water, an ozonated gas supplying device 4, and at least two output branch lines 8 each having a gas/liquid separation device 9 and an ultimate point of use 7. The output branch lines are spaced downstream from the ozonated gas supplying device such that the ozone concentration in the ultrapure water has increased to a stable level and the ozonated ultrapure water at each output branch line is at this same stable ozone concentration.
摘要翻译：一种臭氧化的超纯水供应系统，其防止降低供应管系统中的溶解臭氧浓度，并在所需浓度下沿供应系统的使用点维持溶解的臭氧。这允许系统在长管道中提供臭氧水。该系统包括用于提供超纯水的循环主管3，臭氧化气体供应装置4和至少两个输出分支管线8的顺序排列，每个输出分支管线8具有气/液分离装置9和最终使用点7。输出分支管线与臭氧化气体供给装置的下游隔开，使得超纯水中的臭氧浓度增加到稳定水平，并且每个输出分支管线处的臭氧化超纯水处于相同的稳定的臭氧浓度。

107. 发明授权

US6021264A Data processing system capable of avoiding collision between read data and write data 失效
标题翻译：数据处理系统能够避免读取数据与写入数据之间的冲突
公开(公告)号：US6021264A
公开(公告)日：2000-02-01
申请号：US719271
申请日：1996-09-24
申请人： Hiroshi Morita
发明人： Hiroshi Morita
IPC分类号： G06F13/38 , G06F13/42 , G06F1/04
CPC分类号： G06F13/4213
摘要： In a data processing system, when a write mode register stores a delay information, a write data output signal generation unit delays an output start timing of write data by a predetermined time length, so that even if a just preceding read data exists on a data bus, the write data is outputted to the data bus after the just preceding read data has disappeared from the data bus. A write strobe signal generation unit makes an output timing of a write strobe signal in time with the output timing of the write data. Thus, it is possible to avoid collision between read data and write data without providing a special collision preventing buffer on the a data bus and without inserting a halt condition between a read cycle and a write cycle.
摘要翻译：在数据处理系统中，当写入模式寄存器存储延迟信息时，写入数据输出信号生成单元将写入数据的输出开始定时延迟预定的时间长度，使得即使在数据上存在刚才的读取数据总线，在数据总线上消失之后，写入数据被输出到数据总线。写入选通信号生成单元使写入选通信号的输出定时与写入数据的输出定时一致。因此，可以避免读取数据和写入数据之间的冲突，而不会在数据总线上提供特殊的防冲突缓冲器，而不会在读取周期和写入周期之间插入停止条件。

108. 发明授权

US5827606A Low electric noise electrode system 失效
标题翻译：低电噪声电极系统
公开(公告)号：US5827606A
公开(公告)日：1998-10-27
申请号：US610975
申请日：1996-03-01
申请人： Ikuo Marumoto , Taisuke Miyamoto , Satoru Tojo , Toshio Asahi , Hiroshi Morita , Iwao Hibino , Kimitoshi Murata , Nobuyuki Ishihara
发明人： Ikuo Marumoto , Taisuke Miyamoto , Satoru Tojo , Toshio Asahi , Hiroshi Morita , Iwao Hibino , Kimitoshi Murata , Nobuyuki Ishihara
IPC分类号： F02P7/02 , F02P15/00 , H01R39/60 , B32B3/00 , B32B9/00
CPC分类号： H01R39/60 , F02P7/025 , Y10S428/901 , Y10T428/24917 , Y10T428/24926
摘要： In the electrode for preventing noise electric wave according to the present invention in which the resistivity of the second layer is larger than that of the first layer, it is possible to prevent the generation of noise electric wave. In the electrode for preventing noise electric wave according to the present invention in which the layer for preventing noise electric wave has the porosity of not more than 20%, it is possible to prevent the radio noise. In the electrode for preventing noise electric wave according to the present invention in which the high-fusing conductive material layer exists between the substrate and the resisting material layer, it is possible to prevent the formation of the concave portion.
摘要翻译：在第二层的电阻率大于第一层的电阻率的根据本发明的用于防止噪声电波的电极中，可以防止噪声电波的产生。在防噪声电波层的孔隙率为20％以下的本发明的防噪声电波用电极中，能够防止无线电噪声。在本发明的防止高频熔融导电材料层存在于基板和抗蚀材料层之间的防噪声电波用电极中，能够防止形成凹部。

109. 发明授权

US5737154A Rotary magnetic head apparatus with circuitry for driving head and circuitry for transmitting output signals in noncontact fashion disposed on rotary drums 失效
标题翻译：具有用于驱动磁头的电路的旋转磁头装置和用于以非接触方式传送设置在旋转磁鼓上的输出信号的电路
公开(公告)号：US5737154A
公开(公告)日：1998-04-07
申请号：US666652
申请日：1996-06-18
申请人： Seiji Kumagai , Masatoshi Hayakawa , Hiroshi Morita , Norikatsu Fujisawa , Junichi Honda , Yuji Nakano
发明人： Seiji Kumagai , Masatoshi Hayakawa , Hiroshi Morita , Norikatsu Fujisawa , Junichi Honda , Yuji Nakano
IPC分类号： G11B5/00 , G11B5/008 , G11B5/02 , G11B5/39 , G11B5/53 , G11B15/12 , G11B33/12 , G11B5/52
CPC分类号： G11B33/121 , G11B15/125 , G11B33/122 , G11B5/0086 , G11B5/53 , G11B2005/0016 , G11B5/39
摘要： A rotary magnetic head apparatus is provided which is capable of reliably supplying DC power for driving to an active-type reproducing head provided within a rotary drum and which is capable of taking the reproductive output signal of the active-type head to the outside of the drum. The rotary magnetic head apparatus includes a fixed drum, a rotary drum which is rotatable with respect to the fixed drum, an active-type reproducing head, disposed on the rotary drum, for reproducing information from a magnetic tape, a constant-current circuit, disposed on the rotary drum, for supplying a constant current for driving the head to the active-type reproducing head, a noncontact signal transmission device for taking the reproductive output signal which is output when the active-type reproducing head reproduces information from the magnetic tape to the outside of the rotary drum, and a sliding-type contact device for supplying external DC power to the constant-current circuit.
摘要翻译：本发明提供一种旋转磁头装置，其能够可靠地将驱动用的直流电力提供给设置在旋转磁鼓内的有源型重放磁头，并且能够将主动型磁头的生殖输出信号作用于鼓。旋转磁头装置包括固定鼓，相对于固定滚筒可旋转的旋转滚筒，设置在旋转滚筒上的主动型再现头，用于从磁带再现信息，恒流电路，设置在旋转磁鼓上，用于向主动式再现头提供用于驱动磁头的恒定电流;非接触信号传输装置，用于获取当有源型再现头从磁带再现信息时输出的生殖输出信号到旋转鼓的外部，以及用于向恒流电路提供外部DC电力的滑动型接触装置。

110. 发明授权

US5223085A Plasma etching method with enhanced anisotropic property and apparatus thereof 失效
标题翻译：具有增强的等离子体物质的等离子体蚀刻方法及其装置
公开(公告)号：US5223085A
公开(公告)日：1993-06-29
申请号：US653634
申请日：1991-02-12
申请人： Kenji Kawai , Moriaki Akazawa , Takahiro Maruyama , Toshiaki Ogawa , Hiroshi Morita
发明人： Kenji Kawai , Moriaki Akazawa , Takahiro Maruyama , Toshiaki Ogawa , Hiroshi Morita
IPC分类号： H01L21/302 , C23F4/00 , H01L21/3065 , H01L21/3213
CPC分类号： H01L21/32137 , C23F4/00 , H01L21/32136
摘要： A method for anisotropically etching a substrate to be treated using plasma of a reactive gas produced by electron cyclotron resonance is disclosed. A substrate to be treated is located in a processing container, and a chlorine gas and a hydrogen chloride gas are introduced into the processing container. From the mixture of the chlorine and hydrogen chloride gases introduced into the processing container, plasma of the mixed gas is produced by electron cyclotron resonance. According to this method, the energy of the plasma of chlorine is taken by the plasma of H.sup.+, which results in a decrease in kinetic energy of the chlorine. As a result, the plasma of chlorine impinges vertically to the substrate to be treated along the sheath electric field. Consequently, etching with strong anisotropic property is enabled.
摘要翻译：公开了一种通过电子回旋共振产生的反应气体的等离子体各向异性蚀刻待处理的基板的方法。待处理的基板位于处理容器中，并且将氯气和氯化氢气体引入处理容器中。从引入处理容器的氯气和氯化氢气体的混合物中，通过电子回旋共振产生混合气体的等离子体。根据这种方法，氯的等离子体的能量由H +的等离子体摄取，这导致氯的动能降低。结果，氯的等离子体沿护套电场垂直地撞击待处理的基板。因此，能够进行强烈的各向异性特性的蚀刻。

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