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101. 发明授权

US08654301B2 Electro-optical device 有权
标题翻译：电光装置
公开(公告)号：US08654301B2
公开(公告)日：2014-02-18
申请号：US13418535
申请日：2012-03-13
申请人： Jun Sato
发明人： Jun Sato
IPC分类号： G02F1/1345
CPC分类号： G02F1/13452 , G02F2201/506
摘要： Inter-substrate connection terminals are provided between four corners of an opposed substrate and a TFT substrate. Lines are provided between first and second terminals in the TFT substrate and an external circuit connection terminal. Lines are provided between first and second terminals, between first and third terminals, between the third and fourth terminals, and between second and fourth terminals, respectively. Lines bypassing the first terminal are provided between lines. A line bypassing the second terminal is provided between lines.
摘要翻译：衬底间连接端子设置在相对衬底和TFT衬底的四个角之间。线路设置在TFT基板中的第一和第二端子与外部电路连接端子之间。线路分别设置在第一和第二端子之间，第一和第三端子之间，第三和第四端子之间以及第二端子和第四端子之间。在线路之间提供绕过第一终端的线路。在线路之间提供绕过第二终端的线路。

102. 发明授权

US08593800B2 Electronic equipment with hinge mechanism 有权
标题翻译：具有铰链机构的电子设备
公开(公告)号：US08593800B2
公开(公告)日：2013-11-26
申请号：US12913331
申请日：2010-10-27
申请人： Hirofumi Asakura , Jun Sato , Isao Shimada
发明人： Hirofumi Asakura , Jun Sato , Isao Shimada
IPC分类号： G06F1/16 , H05K5/00 , H05K7/00 , E05D7/04 , E05D15/00
CPC分类号： G06F1/1616 , G06F1/1681 , G06F1/1683
摘要： In the electronic equipment of the present application, a center axis of a cylindrical portion 11a of a shaft 11 is eccentric with respect to a rotation center axis of the shaft 11, whereby even when a cable 21 comes closest to the shaft 11 in the turning of a first housing 1 or second housing 2, a sufficient space can be secured between the shaft 11 and the cable 21. Thus, in a turning range of the first housing 1 or second housing 2, it is highly unlikely that the shaft 11 and the cable 21 come into contact with each other, which avoids an increase in a tension of the cable 21 and wear on an insulation cover of the cable 21. By avoiding the increase in the tension of the cable 21, breakage of the electric wires in the cable 21 can be avoided.
摘要翻译：在本申请的电子设备中，轴11的圆筒部11a的中心轴相对于轴11的旋转中心轴偏心，由此即使电缆21在转动时最靠近轴11 第一壳体1或第二壳体2可以在轴11和电缆21之间确保足够的空间。因此，在第一壳体1或第二壳体2的转动范围内，轴11和电缆21彼此接触，这避免了电缆21的张力的增加和电缆21的绝缘盖上的磨损。通过避免电缆21的张力的增加，电线的断裂可以避免电缆21。

103. 发明授权

US08576564B2 Electronic apparatus 有权
标题翻译：电子仪器
公开(公告)号：US08576564B2
公开(公告)日：2013-11-05
申请号：US13222621
申请日：2011-08-31
申请人： Masato Murakata , Jun Sato , Kenichi Shindo
发明人： Masato Murakata , Jun Sato , Kenichi Shindo
IPC分类号： G06F1/16
CPC分类号： H05K5/023 , G06F1/1613 , G06F1/1626
摘要： Operability of an electronic apparatus while grasping it in the hand is improved, and display panel visibility is improved. The electronic apparatus includes a main body part, a display device, and a handle portion. The handle portion includes first and second leg portions having first ends connected to the main body part, and a grip portion to which second ends of the leg portions are connected. The handle portion has a shape such that the grip portion is positioned on the back surface side relative to the main body part thickness direction centerline that is at an equal distance from the front surface and the back surface.
摘要翻译：电子设备在手抓住时的可操作性得到改善，显示面板的可视性得到改善。电子设备包括主体部分，显示装置和手柄部分。手柄部分包括具有连接到主体部分的第一端的第一和第二腿部以及腿部的第二端连接到的把手部分。把手部分具有这样的形状，使得把手部分相对于与前表面和后表面相等的距离的主体部分厚度方向中心线位于背面侧。

104. 外观设计

USD689538S1 Electronic flash device for camera 有权
标题翻译：相机电子闪光灯装置
公开(公告)号：USD689538S1
公开(公告)日：2013-09-10
申请号：US29415903
申请日：2012-03-15
申请人： Jun Sato
设计人： Jun Sato

105. 发明授权

US08394200B2 Vertical plasma processing apparatus for semiconductor process 有权
标题翻译：用于半导体工艺的垂直等离子体处理装置
公开(公告)号：US08394200B2
公开(公告)日：2013-03-12
申请号：US12277344
申请日：2008-11-25
申请人： Hiroyuki Matsuura , Toshiki Takahashi , Jun Sato , Katsuyoshi Aikawa , Katsutoshi Ishii
发明人： Hiroyuki Matsuura , Toshiki Takahashi , Jun Sato , Katsuyoshi Aikawa , Katsutoshi Ishii
IPC分类号： C23C16/505
CPC分类号： C23C16/45578 , C23C16/452 , C23C16/45565 , C23C16/45574
摘要： A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a vertical direction. A partition plate having an insulative surface is located between a process field and the plasma generation. The partition plate includes a gas passage disposed over a length corresponding to the plurality of target substrates in a vertical direction. A process gas is exited while passing through the plasma generation area, and is then supplied through the gas passage to the process field.
摘要翻译：用于半导体工艺的垂直等离子体处理装置包括由具有绝缘内表面并与处理容器一体化的壳体限定的气密辅助室。辅助室包括在垂直方向上在对应于多个目标基板的长度上延伸的等离子体产生区域。具有绝缘表面的隔板位于处理场和等离子体产生之间。隔板包括沿垂直方向设置在与多个目标基板相对应的长度上的气体通道。在通过等离子体产生区域时排出处理气体，然后通过气体通道供给到处理区域。

106. 发明授权

US08379386B2 Electronic apparatus 有权
标题翻译：电子仪器
公开(公告)号：US08379386B2
公开(公告)日：2013-02-19
申请号：US12976104
申请日：2010-12-22
申请人： Toshiya Senoh , Takeshi Mori , Jun Sato
发明人： Toshiya Senoh , Takeshi Mori , Jun Sato
IPC分类号： H05K7/20
CPC分类号： G06F1/203 , G06F2200/201
摘要： An electronic apparatus includes the following: a heat dissipation chamber that is formed by liquid tightly separating the inside of a main unit case with a partition, has an inlet air vent and an outlet air vent in the partition, and includes a heat dissipation portion; a cooling fan that is located in the heat dissipation chamber; an inlet that is provided in the main unit case to introduce outside air into the heat dissipation chamber through the inlet air vent; and an outlet that is provided in the main unit case to exhaust an air flow sent from the cooling fan to the outside through the outlet air vent. An air channel that extends from the inlet air vent through a side wall of the main unit case to communicate the heat dissipation chamber with the inlet is liquid tightly sealed from the internal space of the main unit case with a sealing wall. A plurality of plate-shaped ribs are provided in the air channel so as to extend in a flow path direction and arranged in a lateral direction of the inlet air vent. The rigidity of the main unit case can be ensured sufficiently while maintaining the liquid tightness between the inside of the main unit case and the heat dissipation chamber.
摘要翻译：一种电子设备，包括以下部分：散热室，其通过将主单元壳体的内部与隔板液密地分离而形成，在隔板中具有入口通气口和出气口，并且包括散热部; 位于散热室内的冷却风扇; 入口，设置在主单元壳体中，以通过入口通风口将外部空气引入散热室; 以及出口，其设置在主单元壳体中，以通过出口空气排出从冷却风扇向外部排出的空气流。从入口通气口通过主单元壳体的侧壁延伸以将散热室与入口连通的空气通道与主单元壳体的内部空间与密封壁液密密封。多个板状肋设置在空气通道中，以沿着流路方向延伸并且沿着入口通风口的横向布置。可以充分确保主单元壳体的刚性，同时保持主单元壳体的内部和散热室之间的液密性。

107. 发明授权

US08360468B2 Head-protecting airbag apparatus 有权
标题翻译：头部保护气囊装置
公开(公告)号：US08360468B2
公开(公告)日：2013-01-29
申请号：US13369396
申请日：2012-02-09
申请人： Jun Sato , Ryosuke Jinnai
发明人： Jun Sato , Ryosuke Jinnai
IPC分类号： B60R21/16
CPC分类号： B60R21/232
摘要： A head-protecting airbag apparatus covers a window so that an occupant's head can be protected. The airbag includes a front window shielding portion with an inclining inflatable portion and a horizontal inflatable portion in the shape of a pipe. The inclining inflatable portion is disposed between an upper guide portion that extends continuously from a portion that partitions an upper edge region of the gas supply passage, and a lower guide portion that extends from a portion that partitions a lower edge region of the gas supply passage. The inclining inflatable portion and the horizontal inflatable portion respectively include an inclining peak portion and a horizontal peak portion formed by ridgelines that swell thickly. The respective width dimensions of the inclining inflatable portion and the horizontal inflatable portion in a flat state are larger than the vertical width dimension of the gas supply passage that is flatly deployed.
摘要翻译：头部保护气囊装置覆盖窗户，从而能够保护乘客的头部。安全气囊包括具有倾斜可充气部分和呈管形状的水平可充气部分的前窗遮蔽部分。所述倾斜充气部设置在从所述气体供给路径的上边缘区域分隔的部分连续地延伸的上部引导部和从所述气体供给路径的下边缘区域分隔的部分延伸的下部引导部。倾斜的可充气部分和水平的可充气部分分别包括倾斜峰部分和由隆起的隆起形成的水平峰部分。平坦状态下的倾斜可膨胀部分和水平可膨胀部分的相应宽度尺寸大于平坦展开的气体供应通道的垂直宽度尺寸。

108. 发明授权

US08349401B2 Film formation apparatus and method for using same 有权
标题翻译：成膜装置及其使用方法
公开(公告)号：US08349401B2
公开(公告)日：2013-01-08
申请号：US12684283
申请日：2010-01-08
申请人： Jun Sato , Kiyotaka Kikuchi , Hiroki Murakami , Shigeru Nakajima , Kazuhide Hasebe
发明人： Jun Sato , Kiyotaka Kikuchi , Hiroki Murakami , Shigeru Nakajima , Kazuhide Hasebe
IPC分类号： B05D7/22 , C23C16/00
CPC分类号： C23C16/4405
摘要： A method for using a film formation apparatus includes performing a main cleaning process and a post cleaning process in this order inside a reaction chamber. The main cleaning process is arranged to supply a cleaning gas containing fluorine into the reaction chamber while exhausting gas from inside the reaction chamber, thereby etching a film formation by-product containing silicon. The post cleaning process is arranged to remove a silicon-containing fluoride generated by the main cleaning process and remaining inside the reaction chamber and to alternately repeat, a plurality of times, supplying an oxidizing gas into the reaction chamber to transform the silicon-containing fluoride into an intermediate product by oxidization, and supplying hydrogen fluoride gas into the reaction chamber while exhausting gas from inside the reaction chamber to remove the intermediate product by a reaction between the hydrogen fluoride gas and the intermediate product.
摘要翻译：使用成膜装置的方法包括在反应室内依次进行主清洗处理和后清洗处理。主要的清洗过程是在从反应室内部排出气体的同时，向反应室内供给含有氟的清洗气体，从而蚀刻含有硅的成膜副产物。后清洗处理被设置为除去由主要清洗过程产生的含氟氟化物，并保留在反应室内，并交替重复多次，将氧化气体供应到反应室中以将含硅氟化物通过氧化进入中间产物，并且在从反应室内排出气体的同时将氟化氢气体供应到反应室中，以通过氟化氢气体和中间产物之间的反应除去中间产物。

109. 发明授权

US08338312B2 Film formation method, film formation apparatus, and method for using film formation apparatus 有权
标题翻译：成膜方法，成膜装置以及使用成膜装置的方法
公开(公告)号：US08338312B2
公开(公告)日：2012-12-25
申请号：US13024607
申请日：2011-02-10
申请人： Jun Sato , Eiji Kikama , Masataka Toiya , Tetsuya Shibata
发明人： Jun Sato , Eiji Kikama , Masataka Toiya , Tetsuya Shibata
IPC分类号： H01L21/31
CPC分类号： C23C16/402 , C23C16/4408 , C23C16/4554
摘要： A film formation method includes a film formation process for forming an SiO2 film on a surface of a target object inside a process container by use of an Si source gas and an oxidizing agent, and an oxidation purge process for performing oxidation on films deposited inside the process container while exhausting gas from inside the process container after unloading the target object from the process container, wherein the film formation process and the oxidation purge process are alternately repeated a plurality of times without, interposed therebetween, a process for removing the films deposited inside the process container.
摘要翻译：成膜方法包括使用Si源气体和氧化剂在处理容器内的目标物体的表面上形成SiO 2膜的成膜方法，以及对沉积在其内的膜上进行氧化的氧化吹扫法在从处理容器卸载目标物体之后从处理容器内部排出气体的处理容器，其中成膜处理和氧化吹扫处理交替重复多次而不插入其间，用于除去沉积在其中的膜的方法处理容器。

110. 发明授权

US08312294B2 Information processing apparatus, authentication method, and storage medium 有权
标题翻译：信息处理装置，认证方法和存储介质
公开(公告)号：US08312294B2
公开(公告)日：2012-11-13
申请号：US12504563
申请日：2009-07-16
申请人： Jun Sato , Shinichi Matsukawa , Taku Kato
发明人： Jun Sato , Shinichi Matsukawa , Taku Kato
IPC分类号： G06F12/14
CPC分类号： G06F21/606 , G06F21/10 , H04L9/0844 , H04L9/3273 , H04L2209/603
摘要： According to one embodiment, a storage medium comprises an encrypted content, key management information which is updated whenever necessary and includes a media key block including encrypted media keys obtained by encrypting a media key which is a base of an authentication key used for mutual authentication with another apparatus by using different device keys, and first and second application keys which encrypt the title keys for each application of the content and are alternately updated and encrypted when the key management information is updated.
摘要翻译：根据一个实施例，存储介质包括加密内容，密钥管理信息，其在必要时被更新，并且包括媒体密钥块，该媒体密钥块包括通过加密作为用于相互认证的认证密钥的基础的媒体密钥而获得的加密媒体密钥，通过使用不同的设备密钥的另一设备，以及第一和第二应用密钥，其对每个内容的应用加密标题密钥，并且在更新密钥管理信息时交替更新和加密。

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