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    • 103. 发明授权
    • Method to make a planar writer with low D.C. coil resistance
    • 具有低直流线圈电阻的平面刻录机的方法
    • US07038880B2
    • 2006-05-02
    • US10633132
    • 2003-08-01
    • Cherng-Chyi HanDanning YangMao-Min Chen
    • Cherng-Chyi HanDanning YangMao-Min Chen
    • G11B5/147
    • G11B5/3136G11B5/127G11B5/147G11B5/31G11B5/3196
    • An inductive-type write head and its method of fabrication are disclosed. The write head has a vertically separated two-element planar coil of reduced resistance which is the result of forming the lower of the two coils with windings of a greater height and substantially larger cross-sectional area than those of the upper coil. The formation of a lower coil with greater height is possible because of a surface planarization that allows separating the coils by an alumina layer of minimal thickness. This method allows the reduction of coil resistance without the necessity of enlarging the head dimensions. The reduced resistance results in lower power consumption and the elimination of pole tip protrusion caused by excessive heating during operation.
    • 公开了一种电感式写入头及其制造方法。 写头具有具有降低的电阻的垂直分离的两元件平面线圈,其是形成两个线圈中较低的线圈的结果,其绕组具有比上部线圈的更大的高度和大得多的横截面积的绕组。 由于表面平坦化,允许通过最小厚度的氧化铝层分离线圈,所以形成较高高度的下线圈是可能的。 该方法允许减小线圈电阻而不需要扩大头部尺寸。 降低的电阻导致较低的功率消耗和由于操作期间的过度加热而导致的极尖突起的消除。
    • 109. 发明申请
    • Short yoke length planar writer with low DC coil resistance
    • 具有低直流线圈电阻的短轭长度平面刻录机
    • US20050024769A1
    • 2005-02-03
    • US10633105
    • 2003-08-01
    • Cherng HanMao-Min Chen
    • Cherng HanMao-Min Chen
    • G11B5/147G11B5/31G11B5/39
    • G11B5/3932G11B5/3106Y10T29/49032
    • Present processes used for planarizing a cavity filled with a coil and hard baked photoresist require that a significant amount of the thickness of the coils be removed. This increases the DC resistance of the coil. In the present invention a layer of alumina is deposited onto the surface of the excess photoresist, following which CMP is initiated. The presence of the alumina serves to stabilize the photoresist so that it does not delaminate. CMP is terminated as soon as the coils are exposed, allowing their full thickness to be retained and resulting in minimum DC resistance. Application of this process to the manufacture of a two coil planar magnetic write head is described.
    • 用于平坦化填充有线圈和硬烘烤光致抗蚀剂的空腔的现有方法需要去除大量的线圈厚度。 这增加了线圈的直流电阻。 在本发明中,一层氧化铝沉积在多余的光致抗蚀剂的表面上,随后开始CMP。 氧化铝的存在用于使光致抗蚀剂稳定,使其不分层。 一旦线圈被暴露,CMP就被终止,允许其保持其全部厚度并导致最小的直流电阻。 描述了该方法在制造双线圈平面磁性写入头上的应用。