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    • 102. 发明授权
    • Method and system for MIMO channel information feedback
    • MIMO信道反馈的方法和系统
    • US08798185B2
    • 2014-08-05
    • US13577789
    • 2010-10-22
    • Yijian ChenWu YinYu Ngok LiJun XuXun Yang
    • Yijian ChenWu YinYu Ngok LiJun XuXun Yang
    • H04B7/02H04B7/06H04L1/00
    • H04L1/0025H04B7/063H04B7/0645H04L25/03898
    • The present invention discloses a method for Multiple Input Multiple Output (MIMO) channel information feedback, and the method includes: a terminal selecting part of column vectors for MIMO system feedback from a codebook matrix W corresponding to a Precoding Matrix Indicator (PMI) and marking the selected part of column vectors as Wpart; the terminal determining information O which represents high-precision vector quantification information of MIMO along with the part of column vectors Wpart according to a common representation relationship F, and feeding back the information O to a base station. The present invention also discloses a terminal and a base station which support MIMO. The present invention achieves high-precision and low-overhead channel information feedback and can well support multiple vector feedback needed by high rank (more layer multiplexing) MIMO transmission and high-precision feedback needed by low rank MIMO transmission simultaneously.
    • 本发明公开了一种多输入多输出(MIMO)信道信息反馈的方法,该方法包括:从对应于预编码矩阵指示符(PMI)的码本矩阵W中选择一部分用于MIMO系统反馈的列向量, 所选的部分列向量为Wpart; 终端确定信息O,其表示MIMO的高精度矢量量化信息以及根据公共表示关系F的列向量Wpart的一部分,并将信息O反馈到基站。 本发明还公开了一种支持MIMO的终端和基站。 本发明实现了高精度和低开销的信道信息反馈,并且可以很好地支持高秩(多层复用)MIMO传输和低秩MIMO传输所需的高精度反馈所需的多向量反馈。
    • 105. 发明申请
    • Dynamic Random Access Memory Unit And Method For Fabricating The Same
    • 动态随机存取存储单元及其制造方法
    • US20140054546A1
    • 2014-02-27
    • US13703722
    • 2012-10-18
    • Libin LiuRenrong LiangJing WangJun Xu
    • Libin LiuRenrong LiangJing WangJun Xu
    • H01L29/775H01L29/78H01L29/66H01L27/108
    • H01L29/775H01L21/84H01L27/10802H01L27/10844H01L27/1203H01L29/66439H01L29/66795H01L29/78H01L29/7841H01L29/785
    • A dynamic random access memory unit and a method for fabricating the same are provided. The dynamic random access memory unit comprises: a substrate; an insulating buried layer formed on the substrate; a body region formed on the insulating buried layer and used as a charge storing region; two isolation regions formed on the body region, in which a semiconductor contact region is formed between the isolation regions and is a charge channel; a source, a drain and a channel region formed on the isolation regions and the semiconductor contact region respectively and constituting a transistor operating region which is partially separated from the charge storing region by the isolation regions and connected with the charge storing region via the charge channel; a gate dielectric layer formed on the transistor operating region, a gate formed on the gate dielectric layer; a source metal contact layer, a drain metal contact layer.
    • 提供了动态随机存取存储单元及其制造方法。 动态随机存取存储器单元包括:衬底; 形成在基板上的绝缘掩埋层; 形成在绝缘掩埋层上并用作电荷存储区域的体区; 形成在体区的两个隔离区,其中在隔离区之间形成半导体接触区,并且是电荷通道; 分别形成在所述隔离区域和所述半导体接触区域上的源极,漏极和沟道区域,并且构成晶体管工作区域,所述晶体管工作区域由所述隔离区域部分地与所述电荷存储区域分离,并且经由所述充电沟道与所述电荷存储区域连接 ; 形成在所述晶体管工作区上的栅介质层,形成在所述栅介质层上的栅极; 源极金属接触层,漏极金属接触层。
    • 106. 发明授权
    • MOS transistor structure with in-situ doped source and drain and method for forming the same
    • 具有原位掺杂源极和漏极的MOS晶体管结构及其形成方法
    • US08642414B2
    • 2014-02-04
    • US13132768
    • 2011-01-19
    • Jing WangLei GuoJun Xu
    • Jing WangLei GuoJun Xu
    • H01L21/336
    • H01L29/1054H01L29/66636H01L29/7833H01L29/7848
    • A MOS transistor structure with an in-situ doped source and/or drain and a method for forming the same are provided. The method comprises steps of: providing a substrate; forming a high Ge content layer on the substrate; forming a gate stack on the high Ge content layer and forming a side wall of one or more layers on both sides of the gate stack; etching the high Ge content layer to form a source region and/or a drain region; and forming a source and/or a drain in the source region and/or the drain region respectively by a low-temperature selective epitaxy, and introducing a doping gas during the low-temperature selective epitaxy to heavily dope the source and/or the drain and to in-situ activate a doping element.
    • 提供具有原位掺杂源极和/或漏极的MOS晶体管结构及其形成方法。 该方法包括以下步骤:提供衬底; 在所述基板上形成高Ge含量层; 在高Ge含量层上形成栅极叠层,并在栅叠层的两侧形成一层或多层的侧壁; 蚀刻高Ge含量层以形成源区和/或漏区; 以及通过低温选择性外延分别在源区和/或漏区中形成源极和/或漏极,并且在低温选择性外延期间引入掺杂气体以使源极和/或漏极 并原位激活掺杂元素。
    • 109. 发明授权
    • Basic matrix based on irregular LDPC, codec and generation method thereof
    • 基于不规则LDPC的基本矩阵,编解码器及其生成方法
    • US08607125B2
    • 2013-12-10
    • US11795826
    • 2005-05-13
    • Jun XuLiuqing YuanLiujun Hu
    • Jun XuLiuqing YuanLiujun Hu
    • H03M13/00
    • H03M13/033H03M13/1105H03M13/1148H03M13/118
    • The codec includes an encoding/decoding operation module and a basic matrix storage module. In the stored basic matrix Hb, for all girths with length of 4, any column element of i, j, k or l constituting the girths in anti-clockwise or clockwise always satisfies inequality: (i−j+k−1) mod z≠0, wherein z is the extension factor. When generating the basic matrix, firstly the number of rows M, number of columns N, and weight vectors of the rows and columns are determined, an irregularly original basic matrix is constructed; then the position of ‘1’ is filled by a value chosen from set {0, 1, 2, . . . , z−1} to obtain the basic matrix Hb. The basic matrix Hb obtained by storing constitutes the desired encoder/decoder. The encoder/decoder according to the present invention can effectively eliminate error-floor phenomenon of LDPC codes and accelerate the falling speed of BER curve.
    • 编解码器包括编码/解码操作模块和基本矩阵存储模块。 在存储的基本矩阵Hb中,对于长度为4的所有周长,构成反时针或顺时针的周长的i,j,k或l的任何列元素总是满足不等式:(i-j + k-1)mod z <> 0,其中z是扩展因子。 当生成基本矩阵时,首先确定行数M,列数N和行和列的加权向量,构建不规则原始基本矩阵; 那么'1'的位置由从{{0,1,2,...}中选择的值填充。 。 。 ,z-1}以获得基本矩阵Hb。 通过存储获得的基本矩阵Hb构成所需的编码器/解码器。 根据本发明的编码器/解码器可以有效地消除LDPC码的错误现象,加快BER曲线的下降速度。
    • 110. 发明授权
    • Semiconductor device and method for forming the same
    • 半导体装置及其形成方法
    • US08592864B2
    • 2013-11-26
    • US13499661
    • 2011-06-27
    • Jing WangJun XuLei Guo
    • Jing WangJun XuLei Guo
    • H01L21/02
    • H01L29/267H01L21/02381H01L21/0245H01L21/0251H01L21/02538H01L21/0262H01L21/02639H01L21/02647
    • A semiconductor device and a method for forming the same are provided. The semiconductor device comprises: a substrate (1); an insulating layer (2), formed on the substrate (1) and having a trench (21) to expose an upper surface of the substrate (1); a first buffer layer (3), formed on the substrate (1) and in the trench (21); and a compound semiconductor layer (4), formed on the first buffer layer (3), wherein an aspect ratio of the trench (21) is larger than 1 and smaller than 10, wherein the first buffer layer (3) is formed by a low-temperature reduced pressure chemical vapor deposition process at a temperature between 200° C. and 500° C., and wherein the compound semiconductor layer (4) is formed by a low-temperature metal organic chemical vapor deposition process at a temperature between 200° C. and 600° C.
    • 提供半导体器件及其形成方法。 半导体器件包括:衬底(1); 形成在所述基板(1)上并具有用于露出所述基板(1)的上表面的沟槽(21)的绝缘层(2); 形成在所述基板(1)和所述沟槽(21)中的第一缓冲层(3); 和形成在第一缓冲层(3)上的化合物半导体层(4),其中沟槽(21)的纵横比大于1且小于10,其中第一缓冲层(3)由 在200℃至500℃之间的温度下进行低温减压化学气相沉积工艺,其中化合物半导体层(4)通过低温金属有机化学气相沉积工艺在200℃ ℃和600℃