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    • 95. 发明授权
    • Electron affinity engineered VCSELs
    • 电子亲和性工程VCSELs
    • US07065124B2
    • 2006-06-20
    • US10767920
    • 2004-01-29
    • James R. BiardRalph H. JohnsonKlein L. Johnson
    • James R. BiardRalph H. JohnsonKlein L. Johnson
    • H01S3/08H01S5/00
    • H01S5/18358H01S5/0421H01S5/18308H01S5/2009H01S5/205H01S5/3211H01S5/423H01S2301/166
    • A VCSEL having an N-type Bragg mirror with alternating layers of high bandgap (low index) and low bandgap (high index) layers of AlGaAs. The layers may be separated by a step change of Al composition followed by a graded region, and vice versa for the next layer, in the N-type mirror to result in a lower and more linear series resistance. Also, an N-type spacer layer may be adjacent to an active region of quantum wells. There may be a similar step in a change of Al composition from the nearest layer of the N-type mirror to the N-type spacer formed from a lower bandgap direct AlGaAs layer to provide lower free carrier absorption. With electron affinity engineering, a minority carrier hole barrier may be inserted adjacent to the quantum wells to improve hole confinement at high current density and high temperature.
    • 具有具有高带隙(低折射率)和低带隙(高折射率)AlGaAs层的交替层的N型布拉格反射镜的VCSEL。 这些层可以通过Al组分的阶跃变化和随后的渐变区域分离,反之亦然,在N型反射镜中可以产生较低和更线性的串联电阻。 此外,N型间隔层可以与量子阱的有源区相邻。 从最近的N型反射镜层到由较低带隙的直接AlGaAs层形成的N型间隔物的Al组成变化可能有类似的步骤,以提供较低的自由载流子吸收。 通过电子亲和力工程,可以在量子阱附近插入少数载流子阱屏障,以在高电流密度和高温下改善孔隙限制。