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    • 91. 发明授权
    • Pattern transfer with self-assembled nanoparticle assemblies
    • 带有自组装纳米颗粒组件的图案转移
    • US09487869B2
    • 2016-11-08
    • US13907716
    • 2013-05-31
    • Carnegie Mellon University
    • Sara MajetichTianlong Wen
    • C23F1/04B05D3/14G03F7/00B82Y40/00
    • C23F1/04B05D3/148B82Y40/00G03F7/0002Y10S977/773Y10S977/89Y10S977/932
    • In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
    • 在一个方面,一种方法包括:提供具有至少一个层的衬底,其中将制造图案化点阵列; 沉积纳米颗粒层,其中所述纳米颗粒层包含一种或多种表面活性剂和用所述一种或多种表面活性剂涂覆的纳米颗粒; 处理涂覆纳米颗粒的一种或多种表面活性剂和填充纳米颗粒之间的空间的一种或多种表面活性剂的部分; 去除填充纳米颗粒之间的空间的一种或多种表面活性剂的部分以暴露要制造图案化点阵列的至少一层的部分; 蚀刻要制造图案化点阵列的至少一个层的暴露部分; 并除去至少一部分纳米颗粒。
    • 97. 发明申请
    • Pattern Transfer With Self-assembled Nanoparticle Assemblies
    • 带有自组装纳米粒子组件的图案转移
    • US20130327636A1
    • 2013-12-12
    • US13907716
    • 2013-05-31
    • Carnegie Mellon University
    • Sara MajetichTianlong Wen
    • C23F1/04B05D3/14
    • C23F1/04B05D3/148B82Y40/00G03F7/0002Y10S977/773Y10S977/89Y10S977/932
    • In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
    • 在一个方面,一种方法包括:提供具有至少一个层的衬底,其中将制造图案化点阵列; 沉积纳米颗粒层,其中所述纳米颗粒层包含一种或多种表面活性剂和用所述一种或多种表面活性剂涂覆的纳米颗粒; 处理涂覆纳米颗粒的一种或多种表面活性剂和填充纳米颗粒之间的空间的一种或多种表面活性剂的部分; 去除填充纳米颗粒之间的空间的一种或多种表面活性剂的部分以暴露要制造图案化点阵列的至少一层的部分; 蚀刻要制造图案化点阵列的至少一个层的暴露部分; 并除去至少一部分纳米颗粒。
    • 99. 发明申请
    • PRODUCING METHOD FOR GRATER
    • GRATER的生产方法
    • US20110198233A1
    • 2011-08-18
    • US13057095
    • 2007-11-26
    • Qitian Lin
    • Qitian Lin
    • C25F3/02C23F1/02
    • A47J43/25A47J27/002B23H9/08C23F1/04C25F3/14
    • A producing method for grater includes: coating etching resistant layers (2, 3) with etching openings (5, 6) on the front surface and the rear surface of a metal plate (1), the opening (6) on the rear surface being larger than the opening (5) on the front surface, etching liquid attacking the metal plate (1) via the etching opening (6) on the rear surface and corroding towards the etching opening (5) on the front surface without pressure, thereby etching the exposed area in the etching opening (5, 6), then, forming a sharp edge (7) near the front surface and a curved surface along the discharging direction. The edge of the grater produced by the method is sharp, and cutting is smooth.
    • 磨碎机的制造方法包括:在金属板(1)的前表面和后表面上涂覆有耐蚀刻层(2,3)和蚀刻开口(5,6),后表面上的开口(6)为 大于前表面上的开口(5),蚀刻液体经由后表面上的蚀刻开口(6)侵蚀金属板(1)并且在前表面上没有压力腐蚀到蚀刻开口(5),从而蚀刻 在蚀刻开口(5,6)中的暴露区域,然后沿着排出方向在前表面附近形成尖锐边缘(7)和弯曲表面。 通过该方法生产的磨机的边缘是锋利的,切割是平滑的。
    • 100. 发明授权
    • Methods for manufacturing endodontic instruments
    • 制造牙髓器械的方法
    • US07665212B2
    • 2010-02-23
    • US11063354
    • 2005-02-23
    • Paul LewisJohn Nielsen
    • Paul LewisJohn Nielsen
    • A61C5/10
    • C23F1/04A61C5/42B21C3/04B21F7/00B21H3/02B21H3/06B21J9/06B23H9/00Y10T29/49567Y10T29/49568Y10T409/300504Y10T409/307168
    • Endodontic instruments having a desired cutting edge are formed, at least in part, using a cold forming process. The method of forming the endodontic instrument includes providing a blank metal thread or wire and at least one die that has a negative impression of a cutting edge. The die is pressed against the blank with sufficient force in order for the die to form an at least partially formed cutting edge in the blank. Any desired shape can be formed into the blank by selecting a die with the proper corresponding negative impression. Cold forming techniques suitable for forming endodontic instruments include roll forming, flat rolling, radial forming, cold drawing, and similar techniques. The files can be sharpened or otherwise modified before or after cold-forming using techniques such as cutting, grinding, and chemical milling.
    • 至少部分地使用冷成型工艺形成具有所需切削刃的牙髓器具。 形成牙根管器械的方法包括提供空白金属线或线以及至少一个模具,其具有切削刃的消极印象。 模具以足够的力压在坯件上,以便模具在坯件中形成至少部分形成的切割边缘。 可以通过选择具有适当的相应负面印象的模具,将任何期望的形状形成为坯料。 适合于形成牙髓治疗仪器的冷成形技术包括辊压成型,平轧,径向成形,冷拔和类似技术。 使用诸如切割,研磨和化学研磨之类的技术,在冷成形之前或之后,可以对这些文件进行锐化或修改。