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    • 93. 发明授权
    • Method for preparing colloidal solution of bismuth sodium tartrate
    • 酒石酸铋钠胶体溶液的制备方法
    • US06482865B1
    • 2002-11-19
    • US09547704
    • 2000-04-12
    • Fernando Palafox, Sr.
    • Fernando Palafox, Sr.
    • B01F312
    • A61K9/0095A61K31/191A61K31/29A61K33/245C07F9/94Y10S514/819
    • A method for preparation of a semitransparent colloidal solution of bismuth sodium tartrate generally comprises producing an aqueous solution of bismuth sodium tartrate; extracting a magma of bismuth sodium tartrate from the aqueous solution at a pH of approximately 2.2; and then dissolving the magma into a salting-in mixture. It is critical that the magma be extracted at a pH of at least 2.2 but not more than 2.3. As a result, the magma is extracted by washing with a wash liquor comprising an addition of distilled water; allowing the magma to settle out of the wash liquor; measuring the pH of the wash liquor after the magma has settled; and then decanting the wash liquor from the magma. This process is then repeated as necessary to arrive at a magma within the critical pH range, whereafter the magma is air dried in preparation for salting-in. After addition of preservative and strength testing, the base solution is diluted to an elixir strength. In order to maintain the semitransparent nature of the elixir, however, it is necessary to buffer the elixir to a pH range of about 7.2 to about 7.3.
    • 酒石酸铋钠半透明胶体溶液的制备方法一般包括制备酒石酸铋钠水溶液; 在大约2.2的pH下从水溶液中提取酒石酸铋钠的岩浆; 然后将岩浆溶解成盐析混合物。 在至少2.2但不超过2.3的pH下提取岩浆是至关重要的。 结果,通过用包含蒸馏水的洗涤液洗涤来提取岩浆; 允许岩浆从洗涤液中沉淀出来; 在岩浆沉降后测量洗涤液的pH值; 然后从岩浆中滗出洗涤液。 然后根据需要重复该过程以在临界pH范围内到达岩浆,此后将岩浆风干以准备盐析。 加入防腐剂和强度试验后,将碱溶液稀释至酏剂强度。 然而,为了保持酏剂的半透明性质,必须将酏剂缓冲至约7.2至约7.3的pH范围。
    • 97. 发明授权
    • Organic bismuth derivatives for X-ray imaging
    • 有机铋衍生物用于X射线成像
    • US5939045A
    • 1999-08-17
    • US860320
    • 1997-07-18
    • Hitomi SuzukiKeizo TanikawaKatsuaki MiyajiNobuhiro Suzuki
    • Hitomi SuzukiKeizo TanikawaKatsuaki MiyajiNobuhiro Suzuki
    • A61K49/04C07F9/94
    • C07F9/94A61K49/04Y10S424/90
    • An organic bismuth derivative represented by formula (I) or its salt: �wherein X.sup.1 is YNR.sup.1 R.sup.2 (wherein Y is --SO.sub.2 -- or --C(O)--, R.sup.1 is a C.sub.3-6 alkyl group which have from 2 to 5 hydroxyl groups which may be protected, and R.sup.2 is a hydrogen atom, a C.sub.1-6 alkyl group or a C.sub.1-5 acyl group which may have from 1 to 5 hydroxyl groups which may be protected, or R.sup.1 and R.sup.2, together with each other, represent a C.sub.2-6 cyclic alkylene which may have from 1 to 4 hydroxyl groups which may be protected), and each of X.sup.2 and X.sup.3 is, independently of each other, a hydrogen atom, a C.sub.1-4 alkyl group, a C.sub.1-4 alkoxy group, a C.sub.1-4 alkylsulfonyl group, a C.sub.1-4 alkylcarbonyl group, a nitro group, a cyano group or the same as defined for X.sup.1 !.
    • PCT No.PCT / JP95 / 02551 Sec。 371日期1997年7月18日 102(e)1997年7月18日PCT 1995年12月13日PCT PCT。 WO96 / 19487 PCT出版物 日期:1996年6月27日由式(I)表示的有机铋衍生物或其盐:[其中X1为YNR1R2(其中Y为-SO2-或-C(O) - ,R1为C3-6烷基, 2〜5个可被保护的羟基,R2是氢原子,可以具有1〜5个可被保护的羟基的C1-6烷基或C1-5酰基,或者R1和R2一起 彼此表示可以具有1〜4个可被保护的羟基的C 2-6环状亚烷基,X2和X3各自独立地为氢原子,C1-4烷基, C 1-4烷氧基,C 1-4烷基磺酰基,C 1-4烷基羰基,硝基,氰基或与X 1所定义的相同]。
    • 98. 发明授权
    • Method of forming bismuth-containing films by using bismuth amide
compounds
    • 通过使用铋酰胺化合物形成含铋膜的方法
    • US5902639A
    • 1999-05-11
    • US828566
    • 1997-03-31
    • Timothy E. GlassmanGautam BhandariThomas H. Baum
    • Timothy E. GlassmanGautam BhandariThomas H. Baum
    • C07F9/94C23C16/40G02F1/00G02F1/05C23C16/00
    • G02F1/0027C07F9/94C23C16/40C23C16/407G02F1/0541G02F2203/12
    • A method of forming a bismuth-containing material layer on a substrate, comprising bubbler delivery or liquid delivery vaporization of a bismuth amide source reagent to form a bismuth-containing source vapor, and deposition on the substrate of bismuth from the bismuth-containing source vapor, to form the bismuth-containing material layer on the substrate. The bismuth amide source reagent may include a bismuth amide compound of the formula BiL.sup.1.sub.x L.sup.2.sub.y (NR.sup.1 R.sub.2).sub.z wherein: z is an integer of from 1 to 3; x+y+z=3; each of L.sup.1 and L.sup.2 is independently selected from C.sub.1 -C.sub.4 alkyl, C.sub.1 14 C.sub.4 alkoxide, .beta.-diketonate, cyclic amido, cyclic tris-alkoxoamine, and C.sub.6 -C.sub.10 aryl; and each of R.sup.1 and R.sup.2 is independently selected from C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.8 alkoxy, C.sub.6 -C.sub.8 cycloalkyl, C.sub.6 -C.sub.10 aryl, C.sub.1 -C.sub.4 carboxyl, and --SiR.sup.3.sub.3 wherein each R.sup.3 is independently selected from H and C.sub.1 -C.sub.4 alkyl. Bismuth-containing films of the invention may be utilized in the construction of spatial light modulator devices, as buffer layers for the fabrication of ferroelectric material devices, and in dielectric, ferroelectric and superconductor thin film applications.
    • 一种在基板上形成含铋材料层的方法,包括用于形成含铋源源蒸气的铋酰胺源试剂的起泡器输送或液体输送蒸发,以及从含铋源源蒸气在铋基底上沉积 以在基板上形成含铋材料层。 铋酰胺源试剂可以包括式BiL1xL2y(NR1R2)z的铋酰胺化合物其中:z是1至3的整数; x + y + z = 3; L1和L2各自独立地选自C 1 -C 4烷基,C 11-14 C 4醇盐,β-二酮酸盐,环状酰胺基,环状三烷氧基胺和C 6 -C 10芳基; R 1和R 2各自独立地选自C 1 -C 8烷基,C 1 -C 8烷氧基,C 6 -C 8环烷基,C 6 -C 10芳基,C 1 -C 4羧基和-SiR 33,其中每个R 3独立地选自H和C 1 -C 4 烷基。 本发明的含铋膜可用于构造空间光调制器件,作为用于制造铁电材料器件的缓冲层,以及介电,铁电和超导体薄膜应用。