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91. 发明申请

US20100193997A1 METHOD OF MAKING A MOLD AND MOLDED ARTICLE 审中-公开
标题翻译：制作模具和模制品的方法
公开(公告)号：US20100193997A1
公开(公告)日：2010-08-05
申请号：US11916468
申请日：2006-06-08
申请人： Franklyn L. Frederickson , Dennis E. Ferguson
发明人： Franklyn L. Frederickson , Dennis E. Ferguson
IPC分类号： B29C33/42 , B29C59/02 , B29C35/08
CPC分类号： B81C99/009 , B29C33/00 , B29L2031/7544 , B29L2031/756 , B81B2201/055 , B81C1/00111
摘要： The present invention is directed to a method of forming a mold for use in making molded articles having a plurality of microprojections. Additionally, the present invention provides a method of forming a molded article having a plurality of microprojections. In one aspect, a mold workpiece is provided, a tool having a tip with a shape corresponding to the microprojection, wherein the hardness of the tool is greater than that of the mold workpiece, is pressed into the mold workpiece and removed, thereby creating a mold with a microprojection cavity suitable for use in making the molded article.
摘要翻译：本发明涉及一种形成用于制造具有多个微喷射体的模制品的模具的方法。另外，本发明提供了形成具有多个微喷射体的成型品的方法。一方面，提供了模具工件，具有具有对应于微喷射体的形状的尖端的工具，其中刀具的硬度大于模具工件的硬度，被压入模具工件并移除，从而形成具有适合用于制造模制品的微型喷射腔的模具。

92. 发明授权

US07760435B2 Method of fabricating tridimensional micro- and nanostructures as well as optical element assembly having a tridimensional convex structure obtained by the method 失效
标题翻译：制造立体微结构和纳米结构的方法以及通过该方法获得的具有三维凸结构的光学元件组件
公开(公告)号：US07760435B2
公开(公告)日：2010-07-20
申请号：US11816804
申请日：2005-02-21
申请人： Massimo Tormen , Alessandro Carpentiero , Enzo Mario Di Fabrizio
发明人： Massimo Tormen , Alessandro Carpentiero , Enzo Mario Di Fabrizio
IPC分类号： G02B27/10 , B29D11/00 , C03C15/00
CPC分类号： B81C99/009 , B81B2207/056 , B81C99/0085 , B81C2201/0132 , B81C2201/0143 , B82Y20/00 , G02B3/0012
摘要： A method is for forming three-dimensional micro- and nanostructures, based on the structuring of a body of material by a mould having an impression area which reproduces the three-dimensional structure in negative form. This method includes providing a mould having a substrate of a material which can undergo isotropic chemical etching, in which the impression area is to be formed. An etching pattern is defined on (in) the substrate, having etching areas having zero-, uni- or bidimensional extension, which can be reached by an etching agent. A process of isotropic chemical etching of the substrate from the etching areas is carried out for a corresponding predetermined time, so as to produce cavities which in combination make up the impression area. The method is advantageously used in the fabrication of sets of microlenses with a convex three-dimensional structure, of the refractive or hybrid refractive/diffractive type, for forming images on different focal planes.
摘要翻译：一种用于形成三维微结构和纳米结构的方法，其基于通过具有以负形式再现三维结构的印模区域的模具构造材料体。该方法包括提供具有能够进行各向同性化学蚀刻的材料的基材的模具，其中将形成印模区域。蚀刻图案被定义在衬底的（在）中，其蚀刻区域具有零，一维或二维延伸，这可由蚀刻剂达到。从蚀刻区域对基板进行各向同性化学蚀刻的过程进行相应的预定时间，以产生组合构成印模区域的空腔。该方法有利地用于制造具有折射或混合折射/衍射类型的凸立体结构的微透镜组，用于在不同焦平面上形成图像。

93. 发明授权

US07690912B2 Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same 有权
标题翻译：图案转印模具，图案转印装置和使用其的装置制造方法
公开(公告)号：US07690912B2
公开(公告)日：2010-04-06
申请号：US11364631
申请日：2006-02-27
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
IPC分类号： B29C33/44 , B29C35/08
CPC分类号： B82Y10/00 , B81C99/009 , B81C2201/0152 , B81C2201/036 , B82Y40/00 , G03F7/0002
摘要： One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
摘要翻译：本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上固化树脂。模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。

94. 发明申请

US20090289029A1 MOLD HAVING NANOMETRIC FEATURES, METHOD FOR REALIZING SUCH A MOLD AND CORRESPONDING USE OF IT IN A METHOD FOR REALIZING AN ARRAY OF CARBON NANOTUBES 有权
标题翻译：具有纳米特征的模具，用于实现这种模具的方法以及用于实现碳纳米管阵列的方法的相关使用
公开(公告)号：US20090289029A1
公开(公告)日：2009-11-26
申请号：US12413688
申请日：2009-03-30
申请人： Raffaele VECCHIONE , Luigi OCCHIPINTI
发明人： Raffaele VECCHIONE , Luigi OCCHIPINTI
IPC分类号： C23C16/26 , B29C33/42 , B29C33/44 , C25B1/00
CPC分类号： H01L51/0012 , B81C99/009 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L51/0048
摘要： A mold is for obtaining, on a substrate, an array of carbon nanotubes with a high control of their positioning. The mold includes a first layer of a first preset material having a surface having in relief at least one first plurality of projections having a free end portion with a substantially pointed profile.
摘要翻译：模具用于在衬底上获得具有高度控制其定位的碳纳米管阵列。模具包括第一预设材料的第一层，其具有具有至少一个第一多个突起的表面，所述至少一个第一多个突起具有具有基本上尖锐的轮廓的自由端部。

95. 发明申请

US20090092791A1 MOLD, MOLD PRODUCTION PROCESS, PROCESSING APPARATUS, AND PROCESSING METHOD 有权
标题翻译：模具，模具生产工艺，加工设备和加工方法
公开(公告)号：US20090092791A1
公开(公告)日：2009-04-09
申请号：US12091845
申请日：2008-03-14
申请人： Atsunori Terasaki , Junichi Seki
发明人： Atsunori Terasaki , Junichi Seki
IPC分类号： B29C33/42 , B29C43/02 , B32B3/00
CPC分类号： B82Y10/00 , B81C99/009 , B82Y40/00 , G03F7/0002 , G03F9/7084 , Y10T428/24479
摘要： A mold for imprinting a pattern onto a member to be processed is constituted by a mold body having a front surface, at which the pattern is formed, and a rear surface opposite from the front surface; a coating layer for covering the front surface of the mold body; and a coating layer for covering the rear surface of the mold body. The coating layer for covering the rear surface of the mold body is partially provided with an opening at the rear surface of the mold body.
摘要翻译：用于将图案压印到待加工构件上的模具由具有形成图案的前表面和与前表面相对的后表面的模体构成; 用于覆盖模具主体的前表面的涂层; 以及用于覆盖模具体的后表面的涂层。用于覆盖模具体的后表面的涂层在模体的后表面部分地设置有开口。

96. 发明申请

US20080292805A1 METHOD FOR MANUFACTURING STAMPER, METHOD FOR MANUFACTURING NANOHOLE STRUCTURE, AND METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM 审中-公开
标题翻译：制造冲压件的方法，制造纳米结构的方法和制造磁记录介质的方法
公开(公告)号：US20080292805A1
公开(公告)日：2008-11-27
申请号：US12121218
申请日：2008-05-15
申请人： Hiroaki Tamura , Mitsuo Takeuchi , Ken-ichi Itoh , Hideyuki Kikuchi
发明人： Hiroaki Tamura , Mitsuo Takeuchi , Ken-ichi Itoh , Hideyuki Kikuchi
IPC分类号： B05D1/24
CPC分类号： G11B5/855 , B81C99/009
摘要： According to an aspect of an embodiment, a method for manufacturing a stamper for duplicating a pit pattern on a substrate includes forming on another substrate, a layer of a material insoluble to a liquid of a suspension of particles in a pattern having a plurality of land portions and a plurality of groove portions between the land portions, and dipping the another substrate having the layer of the material having the pattern in the liquid of the suspension of the particles so that the particles are adhered to the groove portions. The-method further includes forming a mold having a plurality of pits corresponding to the particles by transferring the shapes of the particles on the another substrate to the mold, and forming a stamper having a plurality of protrusions corresponding to the pits by transferring the shapes of the pits of the molds to the stamper.
摘要翻译：根据实施例的一个方面，制造用于在衬底上复制凹坑图案的压模的方法包括在另一衬底上形成不溶于具有多个焊盘的图案的颗粒悬浮液的液体的材料层部分和多个凹槽部分之间，并且将具有图案的材料层的另一基底浸渍在颗粒悬浮液的液体中，使得颗粒粘附到凹槽部分。该方法还包括通过将另一基底上的颗粒的形状转移到模具来形成具有与颗粒相对应的多个凹坑的模具，并且通过转印形状来形成具有对应于凹坑的多个突起的压模模具的凹坑到压模。

97. 发明授权

US07455789B2 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern 有权
标题翻译：压模，使用压模的光刻方法和通过光刻图案形成结构的方法
公开(公告)号：US07455789B2
公开(公告)日：2008-11-25
申请号：US11362146
申请日：2006-02-27
申请人： Mitsuru Hasegawa , Akihiro Miyauchi
发明人： Mitsuru Hasegawa , Akihiro Miyauchi
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： B82Y10/00 , B29C33/424 , B29C43/36 , B81C99/009 , B81C2201/036 , B82Y40/00 , G03F7/0002 , G03F7/0017 , H01L21/76817
摘要： A stamper includes a substrate and a plurality of protrusions of different heights formed on one of the surfaces of the substrate, the protrusions of larger height having a stack structure formed of at least two layers of at least two types of materials, thereby transferring a plurality of patterns at the same time.
摘要翻译：压模包括基板和形成在基板的一个表面上的不同高度的多个突起，较大高度的突起具有由至少两层至少两种类型的材料形成的堆叠结构，从而传输多个的模式在同一时间。

98. 发明申请

US20080217796A1 Method for Manufacturing a Component Having a Three-Dimensional Structure in a Surface Region and a Ceramic Component 审中-公开
标题翻译：在表面区域和陶瓷部件中制造具有三维结构的部件的方法
公开(公告)号：US20080217796A1
公开(公告)日：2008-09-11
申请号：US12064634
申请日：2006-08-14
申请人： Michel Paul Barbara Van Bruggen , Marcus Antonius Verschuuren
发明人： Michel Paul Barbara Van Bruggen , Marcus Antonius Verschuuren
IPC分类号： B29D11/00
CPC分类号： B81C1/00 , B81C1/0046 , B81C99/009
摘要： A method of manufacturing a component having a three-dimensional structure in a surface region, includes:—a step of forming a substantially solid layer (13) of material, which step comprises the steps of applying a substantially fluid composition over a surface, and—a step of removing an intermediate composition (12), impervious to at least a component of the substantially fluid composition and occupying at least part of the three-dimensional structure when the substantially fluid composition has at least partially set. The step of forming the substantially solid layer (13) of material is preceded by the steps of—providing a structure including recessed parts (5 to 7) on a surface of a substantially solid further layer (3), and—applying the intermediate composition (12) so as at least partially to fill at least the recessed parts (5 to 7) of the structure on the surface of the substantially solid further layer (3).
摘要翻译：一种在表面区域制造具有三维结构的部件的方法包括： - 形成基本上固体的材料层（13）的步骤，该步骤包括以下步骤：在表面上施加基本上流体的组合物，以及 - 当基本上流体组合物至少部分地固化时，去除不能渗透至基本上流体组合物的至少一种组分并占据至少一部分三维结构的中间组合物（12）的步骤。形成材料的基本上固体层（13）的步骤之前是提供在基本上固体的另外的层（3）的表面上包括凹部（5至7）的结构的步骤，并且施加中间组合物（12），以至少部分地填充至少基本上固体的另外的层（3）的表面上的结构的凹部（5至7）。

99. 发明申请

US20080182070A1 Method of manufacturing an imprinting template using a semiconductor manufacturing process and the imprinting template obtained 有权
标题翻译：使用半导体制造工艺制造压印模板的方法和获得的压印模板
公开(公告)号：US20080182070A1
公开(公告)日：2008-07-31
申请号：US11669168
申请日：2007-01-31
申请人： Pei-Yu Chou , Jiunn-Hsiung Liao
发明人： Pei-Yu Chou , Jiunn-Hsiung Liao
IPC分类号： H01L21/302 , B32B3/10
CPC分类号： B82Y10/00 , B81C99/009 , B82Y40/00 , G03F7/0002 , H01L33/44 , H01L2933/0083 , Y10T428/24331
摘要： The method of manufacturing an imprinting template according to the present invention utilizes a semiconductor manufacturing process and comprises a step of etching an oxide layer having a thickness of from 1000 to 8000 angstroms on a substrate by a microlithography and etching process, to form a pattern having a plurality of pillar-shaped holes, thereby forming an imprinting plate having a plurality of pillar-shaped holes. A material layer may be filled into the holes and a part of the oxide layer is removed to form an imprinting template having a plurality of pillar-shaped protrusions. Alternatively, a silicon substrate may be used instead of the substrate and the oxide layer. The imprinting template according to the present invention has advantages of mass production, fast production, and low cost, and is suitable to serve as the imprinting plate for making photonic crystals.
摘要翻译：根据本发明的制造压印模板的方法利用半导体制造工艺，并且包括通过微光刻和蚀刻工艺在衬底上蚀刻具有1000至8000埃厚度的氧化物层的步骤，以形成具有多个柱状孔，从而形成具有多个柱状孔的压印板。可以将材料层填充到孔中，并且去除氧化物层的一部分以形成具有多个柱状突起的压印模板。或者，可以使用硅衬底代替衬底和氧化物层。根据本发明的压印模板具有批量生产，快速生产和低成本的优点，并且适合用作制造光子晶体的压印板。

100. 发明申请

US20080000373A1 Printing form precursor and process for preparing a stamp from the precursor 审中-公开
标题翻译：印刷前体和从前体制备印模的方法
公开(公告)号：US20080000373A1
公开(公告)日：2008-01-03
申请号：US11479779
申请日：2006-06-30
申请人： Maria Petrucci-Samija , Graciela Beatriz Blanchet , Robert Blomquist , Hee Hyun Lee
发明人： Maria Petrucci-Samija , Graciela Beatriz Blanchet , Robert Blomquist , Hee Hyun Lee
IPC分类号： B41N3/00
CPC分类号： G03F7/0002 , B29C35/0888 , B29C2035/0833 , B81C99/009 , B82Y10/00 , B82Y40/00 , Y10T428/24479
摘要： The invention pertains to a printing form precursor and a method for preparing a stamp from the precursor for use in soft lithographic applications. The printing form precursor includes a composition layer of a fluorinated compound capable of polymerization upon exposure to actinic radiation and a flexible support transparent to the actinic radiation adjacent the composition layer.
摘要翻译：本发明涉及一种印刷版前体和用于从软化平版印刷应用中使用的前体制备印模的方法。印刷版前体包括能够在暴露于光化辐射下聚合的氟化化合物的组合物层和对组合物层附近的光化辐射透明的柔性支撑体。

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