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    • 92. 发明申请
    • METHOD FOR CONTROLLING HIGH-FREQUENCY RADIATOR
    • 控制高频散热器的方法
    • US20080266012A1
    • 2008-10-30
    • US12109804
    • 2008-04-25
    • Kazuhiro YahataTakashi UnoHiroyuki SakaiTsuyoshi TanakaDaisuke Ueda
    • Kazuhiro YahataTakashi UnoHiroyuki SakaiTsuyoshi TanakaDaisuke Ueda
    • H03L7/099
    • H03H7/40H05B6/686H05B6/705Y02B40/146
    • A method for controlling a high-frequency radiator includes the steps of: (a) applying a high-frequency radiation through the solid-state oscillator and the antenna; (b) sensing part of the high-frequency radiation returned from the antenna to the solid-state oscillator; (c) adjusting radiation/propagation conditions for the high-frequency radiation on the basis of the sensed results in the step (b), the high-frequency radiation propagating from the solid-state oscillator to the antenna; and (d) after the step (c), applying the high-frequency radiation through the solid-state oscillator and the antenna to a target object. In the step (c), the oscillation frequency of the solid-state oscillator, the power of the high-frequency radiation applied by the solid-state oscillator, the power supply voltage supplied to the solid-state oscillator, the impedance match between the output impedance of the solid-state oscillator and the impedance of the antenna, or any other condition is changed.
    • 一种用于控制高频辐射器的方法包括以下步骤:(a)通过固态振荡器和天线施加高频辐射; (b)感测从天线返回到固态振荡器的一部分高频辐射; (c)基于步骤(b)中检测到的结果,调整从固态振荡器传播到天线的高频辐射来调整高频辐射的辐射/传播条件; 和(d)在步骤(c)之后,将高频辐射通过固态振荡器和天线施加到目标对象。 在步骤(c)中,固态振荡器的振荡频率,由固态振荡器施加的高频辐射的功率,提供给固态振荡器的电源电压, 固体振荡器的输出阻抗和天线的阻抗,或任何其他条件改变。
    • 95. 发明授权
    • Transistor
    • 晶体管
    • US07683399B2
    • 2010-03-23
    • US11758304
    • 2007-06-05
    • Hidetoshi IshidaTsuyoshi TanakaDaisuke Ueda
    • Hidetoshi IshidaTsuyoshi TanakaDaisuke Ueda
    • H01L31/0328
    • H01L29/7787H01L29/045H01L29/0891H01L29/1066H01L29/2003H01L29/432H01L29/452
    • There is provided a normally-off type transistor made of a nitride semiconductor. The transistor includes; an undoped GaN layer which forms a channel region; an undoped Al0.2Ga0.8N layer which is formed on the undoped GaN layer and has a band gap larger than that of the undoped GaN layer; a p-type Al0.2Ga0.8N control layer which is formed on the undoped Al0.2Ga0.8N layer, has a p-type conductivity and forms a control region; an Ni gate electrode which contacts with the p-type Al0.2Ga0.8N control layer; a Ti/Al source electrode and a Ti/Al drain electrode which are formed beside the p-type Al0.2Ga0.8N control layer; and an Ni ohmic electrode which is connected to the undoped GaN layer and serves as a hole absorbing electrode. With this transistor, it is possible to achieve a large-current operation and a high switching speed.
    • 提供了由氮化物半导体制成的常关型晶体管。 晶体管包括: 形成沟道区的未掺杂GaN层; 未掺杂的Al0.2Ga0.8N层,其形成在未掺杂的GaN层上,并且具有比未掺杂的GaN层的带隙大的带隙; 形成在未掺杂的Al0.2Ga0.8N层上的p型Al0.2Ga0.8N控制层具有p型导电性并形成控制区; 与p型Al0.2Ga0.8N控制层接触的Ni栅电极; 形成在p型Al0.2Ga0.8N控制层旁边的Ti / Al源电极和Ti / Al漏电极; 以及连接到未掺杂的GaN层并用作空穴吸收电极的Ni欧姆电极。 利用该晶体管,可以实现大电流动作和高切换速度。