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    • 92. 发明授权
    • Optical multiplexer/demultiplexer and manufacturing method thereof
    • 光复用器/解复用器及其制造方法
    • US07228026B2
    • 2007-06-05
    • US11345941
    • 2006-02-02
    • Hiromi TotaniHayami Hosokawa
    • Hiromi TotaniHayami Hosokawa
    • G02B6/28G02B6/26
    • G02B6/2937G02B6/12007G02B6/2938
    • An optical multiplexer/demultiplexer and a manufacturing method thereof are disclosed, wherein a core is arranged on each side of a filter element, and the light is caused to enter the filter element from one of the cores without using a collimator lens. The loss of the transmitted light is reduced by optimizing the axial shift amount of the cores on the two sides. The optical axes of the cores 21, 23 located on both sides of the filter element 26 are displaced by δ. This axial shift amount δ is determined as A(λ)•T•tan θ, where A(λ) is a predetermined coefficient depending on the wavelength of the incident light, θ the angle between the optical axis of the incident light and the normal to the entrance surface of the filter element, and T the thickness in terms of a medium depending on the refractive indexes of the high refractive index layer and the low refractive index layer making up a multilayer film of the filter element.
    • 公开了一种光复用器/解复用器及其制造方法,其中芯片布置在滤光元件的每一侧上,并且使光从芯中的一个芯进入滤光元件,而不使用准直透镜。 通过优化两侧的芯的轴向位移量来减少透射光的损失。 位于过滤元件26两侧的芯21,23的光轴位移三角形。 该轴向移动量Δδ被确定为A(λ).T.tanθ,其中A(λ)是取决于入射光的波长的预定系数,θ是入射光的光轴与正常光轴之间的角度 到达滤色器元件的入射面,T是介质的厚度,取决于构成过滤元件的多层膜的高折射率层和低折射率层的折射率。