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91. 发明授权

US08323725B2 Soft magnetic material, powder magnetic core and method of manufacturing soft magnetic material 有权
标题翻译：软磁材料，粉末磁芯和软磁材料的制造方法
公开(公告)号：US08323725B2
公开(公告)日：2012-12-04
申请号：US12816833
申请日：2010-06-16
申请人： Toru Maeda , Naoto Igarashi , Haruhisa Toyoda , Hirokazu Kugai , Kazuyuki Hayashi , Hiroko Morii , Seiji Ishitani
发明人： Toru Maeda , Naoto Igarashi , Haruhisa Toyoda , Hirokazu Kugai , Kazuyuki Hayashi , Hiroko Morii , Seiji Ishitani
IPC分类号： H01F1/20
CPC分类号： B22F1/02 , B22F2998/10 , H01F1/24 , H01F1/26 , H01F41/0246 , Y10T428/2991 , B22F3/02 , B22F3/24
摘要： A soft magnetic material is a soft magnetic material including a composite magnetic particle (30) having a metal magnetic particle (10) mainly composed of Fe and an insulating coating (20) covering metal magnetic particle (10), and insulating coating (20) contains an iron phosphate compound and an aluminum phosphate compound. The atomic ratio of Fe contained in a contact surface of insulating coating (20) in contact with metal magnetic particle (10) is larger than the atomic ratio of Fe contained in the surface of insulating coating (20). The atomic ratio of Al contained in the contact surface of insulating coating (20) in contact with metal magnetic particle (10) is smaller than the atomic ratio of Al contained in the surface of insulating coating (20). Thus, iron loss can be reduced.
摘要翻译：软磁性材料是包括具有主要由Fe构成的金属磁性粒子（10）和覆盖金属磁性粒子（10）的绝缘涂层（20）的复合磁性体（30）和绝缘涂层（20）的软磁性材料，含有磷酸铁化合物和磷酸铝化合物。包含在与金属磁性颗粒（10）接触的绝缘涂层（20）的接触表面中的Fe的原子比大于绝缘涂层（20）表面中所含的Fe的原子比。绝缘涂层（20）与金属磁性颗粒（10）接触的接触表面中所含的Al的原子比小于绝缘涂层（20）表面中的Al的原子比。因此，可以减少铁损。

92. 发明申请

US20120164320A1 MANUFACTURING METHOD OF SOFT MAGNETIC MATERIAL AND MANUFACTURING METHOD OF DUST CORE 有权
标题翻译：软磁材料的制造方法及其制造方法
公开(公告)号：US20120164320A1
公开(公告)日：2012-06-28
申请号：US13409850
申请日：2012-03-01
申请人： Toru Maeda , Naoto Igarashi , Haruhisa Toyoda , Seiji Ishitani , Hiroko Morii , Kazuyuki Hayashi
发明人： Toru Maeda , Naoto Igarashi , Haruhisa Toyoda , Seiji Ishitani , Hiroko Morii , Kazuyuki Hayashi
IPC分类号： B05D5/12
CPC分类号： H01F1/24 , B22F1/02 , B22F2998/10 , C22C33/02 , H01F1/26 , H01F3/08 , H01F41/0246 , Y10T428/2991 , Y10T428/2998 , B22F1/007 , B22F3/02 , B22F3/10
摘要： A manufacturing method of a soft magnetic material has a step of preparing a metal magnetic particle containing iron as the main component, and a step of forming an insulating film surrounding the surface of the metal magnetic particle. The step of forming the insulating film includes a step of mixing and stirring the metal magnetic particle, aluminum alkoxide, silicon alkoxide, and phosphoric acid.
摘要翻译：软磁性材料的制造方法具有制备以铁为主要成分的金属磁性体的工序，以及形成包围金属磁性体的表面的绝缘膜的工序。形成绝缘膜的步骤包括混合和搅拌金属磁性颗粒，醇铝，硅烷氧化物和磷酸的步骤。

93. 发明授权

US08208775B2 Silica-based single core optical fiber, silica-based multi core optical fiber, and fabrication method for the same 失效
公开(公告)号：US08208775B2
公开(公告)日：2012-06-26
申请号：US12909504
申请日：2010-10-21
申请人： Manabu Kudou , Kazuyuki Hayashi , Takashi Tsumanuma
发明人： Manabu Kudou , Kazuyuki Hayashi , Takashi Tsumanuma
IPC分类号： G02B6/02
CPC分类号： G02B6/02 , C03B19/1461 , C03B2201/12 , C03B2201/20 , C03B2201/31 , C03B2203/26 , G02B6/02042
摘要： A silica-based multi core optical fiber and a fabrication method for the same are provided, and include two or more cores of GeO2—SiO2 glass including an fluorine concentration not less than about 15 w % and a germanium concentration about 0.05 wt % to 2 wt %, in a core. A relative refractive index difference of a cladding and a core is not less than about 3%; and a ratio of a cladding diameter to a core diameter is about 1.02 to 3.0. A silica-based single core optical fiber is also provided, and includes a core having a germanium concentration not less than about 15 wt % and an fluorine concentration about 0.05 wt % to 2 wt %.

94. 发明授权

US08153256B2 Soft magnetic material comprising an insulating layer containing aluminum, silicon, phosphorous and oxygen; dust magnetic core; process for producing soft magnetic material; and process for producing dust magnetic core 有权
标题翻译：软磁性材料包括含有铝，硅，磷和氧的绝缘层; 防尘磁芯; 软磁材料生产工艺; 以及生产粉尘磁芯的工艺
公开(公告)号：US08153256B2
公开(公告)日：2012-04-10
申请号：US12160079
申请日：2006-11-22
申请人： Toru Maeda , Naoto Igarashi , Haruhisa Toyoda , Seiji Ishitani , Hiroko Morii , Kazuyuki Hayashi
发明人： Toru Maeda , Naoto Igarashi , Haruhisa Toyoda , Seiji Ishitani , Hiroko Morii , Kazuyuki Hayashi
IPC分类号： B32B5/16 , H01F1/12 , H01F1/24
CPC分类号： H01F1/24 , B22F1/02 , B22F2998/10 , C22C33/02 , H01F1/26 , H01F3/08 , H01F41/0246 , Y10T428/2991 , Y10T428/2998 , B22F1/007 , B22F3/02 , B22F3/10
摘要： The soft magnetic material includes a plurality of composite magnetic particles having a metal magnetic particle and an insulating film surrounding the surface of the metal magnetic particle. The metal magnetic particle contains iron as the main component. The insulating film contains aluminum, silicon, phosphorus, and oxygen. The insulating film satisfies the relationship 0.4≦MAl/(MAl+MSi)≦0.9 and the relationship of 0.25≦(MAl+MSi)/MP≦1.0 in the case that molar amount of aluminum contained in the insulating film is represented by MAl, the sum of the molar amount of aluminum contained in the insulating film and the molar amount of silicon contained in the insulating film is represented by (MAl+MSi), and the molar amount of phosphorus contained in the insulating film is represented by MP.
摘要翻译：软磁性材料包括具有金属磁性颗粒的多个复合磁性颗粒和围绕金属磁性颗粒表面的绝缘膜。金属磁性粒子含有铁作为主要成分。绝缘膜含有铝，硅，磷和氧。在绝缘膜中包含的铝的摩尔量表示的情况下，该绝缘膜满足关系0.4＆nlE; MA1 /（MA1 + MSi）＆nlE; 0.9以及0.25＆nlE;（MA1 + MSi）/MP_nlE1.0的关系通过MA1，绝缘膜中所含的铝的摩尔量和绝缘膜中所含的硅的摩尔量之和由（MA1 + MSi）表示，绝缘膜中所含的磷的摩尔量由 MP。

95. 发明授权

US08137872B2 Reflective mask blank for EUV lithography 失效
标题翻译： EUV光刻用反光罩
公开(公告)号：US08137872B2
公开(公告)日：2012-03-20
申请号：US12952254
申请日：2010-11-23
申请人： Kazuyuki Hayashi
发明人： Kazuyuki Hayashi
IPC分类号： G03F1/00 , B32B9/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/84 , Y10T428/31616
摘要： To provide a reflective mask blank for EUV lithography having a low reflective layer having a low reflectance in the wavelength region of EUV light and an inspection light for a mask pattern, particularly having low reflection properties in the entire wavelength region (190 to 260 nm) of an inspection light for a mask pattern, and having a high etching rate in chlorine type gas etching. A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer to reflect EUV light, an absorber layer to absorb EUV light and a low reflective layer to an inspection light (wavelength:190 nm to 260 nm) for a mask pattern, formed in this order over the substrate, wherein the low reflective layer contains silicon (Si) and nitrogen (N) in a total content of at least 95 at %, has a Si content of from 5 to 80 at %, and a N content of from 15 to 90 at %.
摘要翻译：为了提供一种用于EUV光刻的反射掩模板，其具有在EUV光的波长区域中具有低反射率的低反射层和用于掩模图案的检查光，特别是在整个波长区域（190-260nm）具有低反射特性，的掩模图案的检查光，并且在氯气蚀刻中具有高蚀刻速率。用于EUV光刻的反射掩模板，包括基板和反射EUV光的反射层，用于将掩模图案的EUV光和低反射层吸收到检查光（波长：190nm至260nm）的吸收层，其中低反射层含有至少95原子％的总含量的硅（Si）和氮（N），Si含量为5-80原子％，N 含量从15％到90％。

96. 发明授权

US08003282B2 Reflective mask blank for EUV lithography, and substrate with functional film for the mask blank 有权
标题翻译：用于EUV光刻的反光掩模板，以及具有掩模板功能膜的基板
公开(公告)号：US08003282B2
公开(公告)日：2011-08-23
申请号：US12483785
申请日：2009-06-12
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/38 , G21K1/062 , Y10T428/24355
摘要： Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film.A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal state of at least a surface of the conductive film being amorphous, the sheet resistance of the conductive film being at most 27 Ω/□, and the surface roughness (rms) of the conductive film being at most 0.5 nm.
摘要翻译：提供一种具有用于EUV掩模坯料的导电膜的基板，其中防止了由于静电卡盘和基板之间的磨损而产生的颗粒; 以及具有多层反射膜的基板和使用这种具有导电膜的基板的EUV掩模板。具有用于制造用于EUV光刻的反射掩模板的导电膜的基板，含有铬（Cr）和氮（N）的导电膜，导电膜中的N的平均浓度为至少0.1原子％以下 40原子％以上，导电膜的至少表面的晶体状态为无定形，导电膜的薄层电阻为27〜OHgr /□以下，导电膜的表面粗糙度（rms）为最多 0.5nm。

97. 发明授权

US07906259B2 Reflective mask blank for EUV lithography 有权
标题翻译： EUV光刻用反光罩
公开(公告)号：US07906259B2
公开(公告)日：2011-03-15
申请号：US12205967
申请日：2008-09-08
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/22
摘要： To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness. A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the absorber layer, the B content is at least 1 at % and less than 5 at %, the Si content is from 1 to 25 at %, and the compositional ratio of Ta to N (Ta:N) is from 8:1 to 1:1.
摘要翻译：为了提供具有吸收层的EUV光刻用的反射掩模板，其对EUV光和图案检查光的波长范围内的光呈现低反射率，并且易于控制以具有所需的膜组成和膜厚度。一种用于EUV光刻的反射掩模板，包括基板和用于反射EUV光的反射层和用于吸收在基板上依次形成的EUV光的吸收层，其中吸收层包含钽（Ta），硼（B），硅（Si）和氮（N），并且在吸收层中，B含量为至少1原子％且小于5原子％，Si含量为1至25原子％，Ta的组成比至N（Ta：N）为8:1至1:1。

98. 发明申请

US20090245742A1 SILICA-BASED SINGLE CORE OPTICAL FIBER, SILICA-BASED MULTI CORE OPTICAL FIBER, AND FABRICATION METHOD FOR THE SAME 有权
标题翻译：基于二氧化硅的单芯光纤，基于硅的多芯光纤及其制造方法
公开(公告)号：US20090245742A1
公开(公告)日：2009-10-01
申请号：US12333970
申请日：2008-12-12
申请人： Manabu Kudou , Kazuyuki Hayashi , Takashi Tsumanuma
发明人： Manabu Kudou , Kazuyuki Hayashi , Takashi Tsumanuma
IPC分类号： G02B6/036 , G02B6/00 , C03C25/10
CPC分类号： G02B6/02 , C03B19/1461 , C03B2201/12 , C03B2201/20 , C03B2201/31 , C03B2203/26 , G02B6/02042
摘要： A silica-based multi core optical fiber and a fabrication method for the same are provided, and include two or more cores of GeO2—SiO2 glass including an fluorine concentration not less than about 15 w % and a germanium concentration about 0.05 wt % to 2 wt %, in a core. A relative refractive index difference of a cladding and a core is not less than about 3%; and a ratio of a cladding diameter to a core diameter is about 1.02 to 3.0. A silica-based single core optical fiber is also provided, and includes a core having a germanium concentration not less than about 15 wt % and an fluorine concentration about 0.05 wt % to 2 wt %.
摘要翻译：提供了一种二氧化硅基多芯光纤及其制造方法，并且包括两个或更多个GeO 2 -SiO 2玻璃芯，其包含氟浓度不小于约15w％，锗浓度为约0.05wt％至2 重量％。包层和芯的相对折射率差不小于约3％; 并且包层直径与芯直径的比率为约1.02〜3.0。还提供了二氧化硅基单芯光纤，并且包括锗浓度不小于约15重量％，氟浓度为约0.05重量％至2重量％的芯。

99. 发明申请

US20090130574A1 SPUTTERING TARGET USED FOR PRODUCTION OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
标题翻译：用于生产反射掩膜的溅射目标用于EUV光刻
公开(公告)号：US20090130574A1
公开(公告)日：2009-05-21
申请号：US12353284
申请日：2009-01-14
申请人： Kazuyuki Hayashi , Takashi Sugiyama
发明人： Kazuyuki Hayashi , Takashi Sugiyama
IPC分类号： G03F1/00 , C23C14/34
CPC分类号： C23C14/3414 , B82Y10/00 , B82Y40/00 , G03F1/24 , G21K2201/067
摘要： To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles.A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5 at % to 50 at %.
摘要翻译：为了提供用于生产EUV掩模坯料的溅射靶，即使在形成作为反射层的反射性多层膜和作为保护层的Ru层作为保护层的情况下也能够防止膜剥离的粒子，使用实际的机器进行大量的循环。一种用于在反射层中形成钌（Ru）层的溅射靶，其用于在基底上反射EUV光，其含有Ru和选自硼（B）和锆（Zr）中的至少一种元素，总含量的B和Zr为5原子％至50原子％。

100. 发明申请

US20080248245A1 Soft Magnetic Material, Method of Manufacturing Soft Magnetic Material, Dust Core, and Method of Manufacturing Dust Core 审中-公开
标题翻译：软磁材料，软磁材料制造方法，粉尘芯和制造粉尘芯的方法
公开(公告)号：US20080248245A1
公开(公告)日：2008-10-09
申请号：US11919704
申请日：2006-07-20
申请人： Toru Maeda , Haruhisa Toyoda , Naoto Igarashi , Kazuhiro Hirose , Seiji Ishitani , Hiroko Morii , Kazuyuki Hayashi
发明人： Toru Maeda , Haruhisa Toyoda , Naoto Igarashi , Kazuhiro Hirose , Seiji Ishitani , Hiroko Morii , Kazuyuki Hayashi
IPC分类号： B32B5/16 , B32B15/02 , B05D1/00 , C04B35/634
CPC分类号： H01F3/08 , B22F1/02 , B22F1/025 , B22F2998/10 , C22C33/02 , C22C2202/02 , H01F1/24 , H01F1/26 , H01F1/33 , H01F41/0246 , Y10T428/2438 , Y10T428/2991 , B22F1/0059 , B22F3/02
摘要： A soft magnetic material includes a plurality of composite magnetic particles. Each of the plurality of composite magnetic particles has a metal magnetic particle including iron, a lower film surrounding the surface of the metal magnetic particle and including a nonferrous metal, and an insulating upper film surrounding the surface of the lower film and including an inorganic compound. The inorganic compound contains at least one element of oxygen and carbon. The nonferrous metal has an affinity with at least one of oxygen and carbon that is larger than such affinity of iron. The nonferrous metal has a diffusion coefficient with respect to at least one of oxygen and carbon that is smaller than such diffusion coefficient of iron. Thus, a soft magnetic material that provides desirable magnetic properties, a method of manufacturing a soft magnetic material, a dust core, and a method of manufacturing a dust core are provided.
摘要翻译：软磁性材料包括多个复合磁性颗粒。多个复合磁性颗粒中的每一个具有包含铁的金属磁性颗粒，围绕金属磁性颗粒的表面的下部膜，并且包含有色金属，以及包围下部膜的表面的包含无机化合物的绝缘上层膜。无机化合物含有至少一种氧和碳元素。有色金属与氧和碳中的至少一种具有比铁的这种亲和力更大的亲和力。有色金属相对于氧和碳中的至少一种具有小于铁的扩散系数的扩散系数。因此，提供了提供所需磁性的软磁性材料，软磁性材料的制造方法，防尘芯，以及制造防尘芯的方法。

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