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91. 发明授权

US09618448B2 Grazing order metrology 有权
公开(公告)号：US09618448B2
公开(公告)日：2017-04-11
申请号：US14706343
申请日：2015-05-07
申请人： KLA-Tencor Corporation
发明人： Amnon Manassen
IPC分类号： G02B5/18 , G01N21/41 , G06F17/50 , G03F7/20
CPC分类号： G01N21/41 , G01N2201/061 , G03F7/70633 , G03F7/70683 , G06F17/50
摘要： Metrology targets, optical systems and methods are provided, which enable metrology measurements of very small features, using resonance of illuminated radiation within periodical structures of the target, under appropriate illumination. Metrology targets comprise periodical structure(s) configured to resonate incident radiation and having a pitch defined by the grating equation with respect to configured parameters such as the selected diffraction order, refractive indices and the illumination's wavelength(s) and incidence angles. Possibly, the target may further comprise substructure(s) which are optically coupled with the resonating incident radiation in the periodical structure(s). The spatial organization of the periodic structures and the substructures, as well as the optical organization of illuminated and scattered radiation provide collecting phase signals from the targets at a range of parameters, such as different wavelengths, spatial angles and polarizations to enhance the metrology signal and achieve a very high sensitivity to very small target features.

92. 发明授权

US09182219B1 Overlay measurement based on moire effect between structured illumination and overlay target 有权
标题翻译：基于结构照明和覆盖目标之间的莫尔效应的叠加测量
公开(公告)号：US09182219B1
公开(公告)日：2015-11-10
申请号：US14160279
申请日：2014-01-21
申请人： KLA-Tencor Corporation
发明人： Amnon Manassen , Barry Loevsky , Zeev Bomzon
IPC分类号： G01B11/14 , H01L23/544 , G03F7/20
CPC分类号： G03F7/70633 , G01B11/02 , G01B11/14 , G06K9/00 , G06K9/3216 , G06T7/0004 , H01L22/30 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： A method and system for overly measurement is disclosed. The overlay measurement is performed based on moiré effect observed between structured illumination grids and overlay targets. A structured illumination is used to illuminate a first overlay target and a second overlay target. Upon obtaining an image of the first overlay target illuminated by the structured illumination and an image of the second overlay target illuminated by the structured illumination, relative displacement between the first overlay target and the structured illumination and relative displacement between the second overlay target and the structured illumination are measured. The overlay between the first overlay target and the second overlay target is then measured based on their relative displacements with respect to the structured illumination.
摘要翻译：公开了一种用于过度测量的方法和系统。基于在结构化照明网格和覆盖目标之间观察到的莫尔效应来进行覆盖测量。结构照明用于照亮第一覆盖目标和第二覆盖目标。在获得由结构化照明照明的第一覆盖目标的图像和由结构化照明照明的第二覆盖目标的图像时，第一覆盖目标和结构化照明之间的相对位移以及第二覆盖目标与结构化照明之间的相对位移测量照度。然后基于它们相对于结构化照明的相对位移来测量第一覆盖目标和第二覆盖目标之间的覆盖。

93. 发明申请

US20150316783A1 Apodization for Pupil Imaging Scatterometry 有权
标题翻译：瞳孔影像散斑测量法
公开(公告)号：US20150316783A1
公开(公告)日：2015-11-05
申请号：US14799132
申请日：2015-07-14
申请人： KLA-Tencor Corporation
发明人： Andrew V. Hill , Amnon Manassen , Barak Bringoltz , Ohad Bachar , Mark Ghinovker , Zeev Bomzon , Daniel Kandel
IPC分类号： G02B27/58 , G01B11/00 , G01N21/47
CPC分类号： G02B27/58 , G01B11/00 , G01N21/47 , G01N21/55 , G01N2201/06113 , G01N2201/068 , G03F7/70625 , G03F7/70633
摘要： The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.
摘要翻译：本公开涉及用于瞳孔成像散射测量的各种变迹方案。在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。在一些实施例中，系统还包括变迹集合区域停止。可以组合这里描述的各种实施例以实现某些优点。

94. 发明申请

US20150233818A1 GRAZING ORDER METROLOGY 有权
公开(公告)号：US20150233818A1
公开(公告)日：2015-08-20
申请号：US14706343
申请日：2015-05-07
申请人： KLA-Tencor Corporation
发明人： Amnon Manassen
IPC分类号： G01N21/41 , G06F17/50
CPC分类号： G01N21/41 , G01N2201/061 , G03F7/70633 , G03F7/70683 , G06F17/50
摘要： Metrology targets, optical systems and methods are provided, which enable metrology measurements of very small features, using resonance of illuminated radiation within periodical structures of the target, under appropriate illumination. Metrology targets comprise periodical structure(s) configured to resonate incident radiation and having a pitch defined by the grating equation with respect to configured parameters such as the selected diffraction order, refractive indices and the illumination's wavelength(s) and incidence angles. Possibly, the target may further comprise substructure(s) which are optically coupled with the resonating incident radiation in the periodical structure(s). The spatial organization of the periodic structures and the substructures, as well as the optical organization of illuminated and scattered radiation provide collecting phase signals from the targets at a range of parameters, such as different wavelengths, spatial angles and polarizations to enhance the metrology signal and achieve a very high sensitivity to very small target features.
摘要翻译：提供了计量目标，光学系统和方法，其使得能够在适当照明下使用目标周期结构内的照明辐射的共振来测量非常小的特征。计量目标包括配置成谐振入射辐射并且相对于诸如所选择的衍射级，折射率和照明的波长和入射角的配置参数由光栅方程定义的间距的周期性结构。可能地，目标还可以包括与周期性结构中的谐振入射辐射光学耦合的子结构。周期性结构和子结构的空间组织以及照明和散射辐射的光学组织在一系列参数（例如不同波长，空间角度和极化）上提供来自目标的收集相位信号，以增强测量信号，以及对非常小的目标特征实现非常高的灵敏度。

95. 发明申请

US20150198524A1 NEAR FIELD METROLOGY 审中-公开
标题翻译：近场计量学
公开(公告)号：US20150198524A1
公开(公告)日：2015-07-16
申请号：US14583447
申请日：2014-12-26
申请人： KLA-Tencor Corporation
发明人： Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
IPC分类号： G01N21/47
CPC分类号： G01N21/4788 , G01N2201/06113 , G02B27/56 , G02B27/58
摘要： Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
摘要翻译：本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。光学元件布置成增强目标反射的辐射消散模式。公开了各种配置：光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质叠层以及用于放大照明辐射的渐逝模式的谐振元件。计量系统和方法可配置为各种计量类型，包括成像和散射方法。

96. 发明授权

US08873054B2 Metrology systems and methods 有权
标题翻译：计量系统和方法
公开(公告)号：US08873054B2
公开(公告)日：2014-10-28
申请号：US13865104
申请日：2013-04-17
申请人： KLA-Tencor Corporation
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01B11/14 , G01B11/04 , G01B11/00 , G01N21/47 , G01B11/02 , G03F7/20 , G01B11/06 , G01N21/21 , G01N21/956
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
摘要翻译：提供了各种计量系统和方法。一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。

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