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    • 96. 发明申请
    • LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, AND ELECTRONIC DEVICE
    • 发光元件,发光装置和电子装置
    • US20100308320A1
    • 2010-12-09
    • US12859811
    • 2010-08-20
    • Takahiro KAWAKAMITomoya AOYAMAJunichiro SAKATAHisao IKEDASatoshi SEOYuji IWAKI
    • Takahiro KAWAKAMITomoya AOYAMAJunichiro SAKATAHisao IKEDASatoshi SEOYuji IWAKI
    • H01L51/54
    • H01L51/5088H01L51/005H01L51/0052H01L51/0081H01L51/5092
    • It is an object of the present invention to provide a functional layer for protecting a light emitting element from being deteriorated by a physical or chemical influence when the light emitting element is manufactured or driven, and to attain extension of lifetime of an element and improvement of element characteristics without increasing a drive voltage and degrading transmittance and color purity by providing such a functional layer. One feature of the present invention is to provide a buffer layer made of a composite material for a light emitting element including aromatic hydrocarbon containing at least one vinyl skeleton and metal oxide in part of a light emitting substance containing layer, in the light emitting element fowled by interposing the light emitting substance containing layer between a pair of electrodes. The composite material for a light emitting element for forming the buffer layer of the present invention has high conductivity and is superior in transparency.
    • 本发明的目的是提供一种功能层,用于在制造或驱动发光元件时保护发光元件免受物理或化学影响而劣化,并且使元件的使用寿命延长 元件特性,而不增加驱动电压并通过提供这样的功能层降低透射率和色纯度。 本发明的一个特征是提供一种由发光元件的复合材料构成的缓冲层,所述缓冲层包含发光元件的一部分中包含至少一个乙烯基骨架的芳族烃和部分发光物质含有层中的金属氧化物, 通过将发光物质含有层插入在一对电极之间。 本发明的缓冲层形成用发光元件用复合材料的导电性高,透明性优异。
    • 98. 发明申请
    • TRANSISTOR AND METHOD FOR MANUFACTURING THE TRANSISTOR
    • 用于制造晶体管的晶体管和方法
    • US20100193782A1
    • 2010-08-05
    • US12690453
    • 2010-01-20
    • Junichiro SAKATA
    • Junichiro SAKATA
    • H01L29/786H01L29/24H01L21/04H01L21/336
    • H01L29/7869H01L27/1225
    • It is an object to reduce characteristic variation among transistors and reduce contact resistance between an oxide semiconductor layer and a source electrode layer and a drain electrode layer, in a transistor where the oxide semiconductor layer is used as a channel layer. In a transistor where an oxide semiconductor is used as a channel layer, at least an amorphous structure is included in a region of an oxide semiconductor layer between a source electrode layer and a drain electrode layer, where a channel is to be formed, and a crystal structure is included in a region of the oxide semiconductor layer which is electrically connected to an external portion such as the source electrode layer and the drain electrode layer.
    • 在氧化物半导体层用作沟道层的晶体管中,目的是减小晶体管之间的特性变化并降低氧化物半导体层与源电极层和漏电极层之间的接触电阻。 在其中使用氧化物半导体作为沟道层的晶体管中,至少一个非晶结构包括在要形成沟道的源电极层和漏电极层之间的氧化物半导体层的区域中,以及 晶体结构包括在电连接到诸如源极电极层和漏极电极层的外部的氧化物半导体层的区域中。