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    • 95. 发明授权
    • CMOS and HCMOS semiconductor integrated circuit
    • CMOS和HCMOS半导体集成电路
    • US07564073B2
    • 2009-07-21
    • US11294566
    • 2005-12-06
    • Haruyuki SoradaAkira AsaiTakeshi TakagiAkira InoueYoshio Kawashima
    • Haruyuki SoradaAkira AsaiTakeshi TakagiAkira InoueYoshio Kawashima
    • H01L27/04
    • H01L21/823807
    • A semiconductor integrated circuit fabrication method according to this invention includes: a step of forming a pair of first device forming regions and a pair of second device forming regions in a surface layer portion of a semiconductor substrate by surrounding each of the regions by device isolation; a step of forming a first oxide film covering the surface of the semiconductor substrate after the preceding step; a step of removing an intended portion of the first oxide film to expose the pair of second device forming regions; a step of forming a pair of heterojunction structures, by selective epitaxial growth, on the pair of second device forming regions thus exposed; a step of forming a second oxide film covering the surface of the substrate after the preceding step; and a step of forming a pair of gate electrodes above each of the pair of first device forming regions and the pair of second device forming regions, whereby a normal complementary MOS transistor and a heterojunction complementary MOS transistor are eventually formed in the pair of first device forming regions and the pair of second device forming regions, respectively.
    • 根据本发明的半导体集成电路制造方法包括:通过器件隔离来围绕每个区域来在半导体衬底的表面层部分中形成一对第一器件形成区域和一对第二器件形成区域的步骤; 在前述步骤之后形成覆盖半导体衬底的表面的第一氧化物膜的步骤; 去除所述第一氧化物膜的预期部分以暴露所述一对第二器件形成区域的步骤; 通过选择性外延生长形成一对异质结结构在由此露出的一对第二器件形成区上的步骤; 在上述步骤之后形成覆盖基板表面的第二氧化膜的步骤; 以及在所述一对第一器件形成区域和所述一对第二器件形成区域中的每一个上形成一对栅电极的步骤,由此在所述一对第一器件形成区域中最终形成正常互补MOS晶体管和异质结互补MOS晶体管 形成区域和一对第二装置形成区域。
    • 100. 发明申请
    • Machine tool
    • 机床
    • US20080096746A1
    • 2008-04-24
    • US11897398
    • 2007-08-30
    • Miki RyuhanKoji KashuAkira Inoue
    • Miki RyuhanKoji KashuAkira Inoue
    • B23Q3/157
    • B23Q1/012Y10T29/49996Y10T29/5107Y10T409/307728Y10T409/308288Y10T483/1733
    • A machine tool includes a table, a main spindle unit, a cross rail, a plurality of columns and a plurality of supportive transfer mechanisms. The plurality of columns vertically guide the cross rail, the columns being erected at positions on opposite sides of the table and on front and rear sides of the center of gravity of the main spindle unit on each side of the table. The supportive transfer mechanisms vertically move the cross rail while supporting the cross rail. The cross rail has a pair of supporting portions for supporting front and rear portions of the main spindle unit located frontward and rearward with respect to the center of gravity of the main spindle unit, respectively, and a plurality of through holes through which the columns are passed vertically.
    • 一种机床包括台,主轴单元,十字轨,多列和多个支撑传送机构。 多个列垂直地引导十字轨道,该列竖立在桌子的相对侧上的位置,并且在桌子的每一侧上的主轴单元的重心的前侧和后侧。 支撑传送机构在支撑横梁时垂直移动横梁。 所述十字轨道具有一对支撑部,用于分别相对于所述主轴单元的重心分别支撑所述主轴单元的前部和后部;以及多个通孔,通过所述多个通孔, 垂直通过