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    • 93. 发明授权
    • Nanotube fuse structure
    • 纳米管保险丝结构
    • US07598127B2
    • 2009-10-06
    • US11284503
    • 2005-11-22
    • Bruce J. WhitefieldDerryl D. J. AllmanThomas RueckesClaude L. Bertin
    • Bruce J. WhitefieldDerryl D. J. AllmanThomas RueckesClaude L. Bertin
    • H01L21/86
    • H01L23/5258H01L23/5256H01L2924/0002Y10S977/742H01L2924/00
    • A method of forming a carbon nanotube fuse by depositing a carbon nanotube layer, then depositing a cap layer directly over the carbon nanotube layer. The cap layer is formed of a material that has an insufficient amount of oxygen to significantly oxidize the carbon nanotube layer under operating conditions, and is otherwise sufficiently robust to protect the carbon nanotube layer from oxygen and plasmas. A photoresist layer is formed over the cap layer, and the photoresist layer is patterned to define a desired size of fuse. Both the cap layer and the carbon nanotube layer are completely etched, without removing the photoresist layer, to define the fuse having two ends in the carbon nanotube layer. Just the cap layer is etched, without removing the photoresist layer, so as to reduce the cap layer by a desired amount at the edges of the cap layer under the photoresist layer, without damaging the carbon nanotube layer. The photoresist layer is removed, and electrically conductive contacts are formed on each of the two ends of the fuse.
    • 通过沉积碳纳米管层形成碳纳米管熔丝,然后在碳纳米管层上直接沉积覆盖层的方法。 盖层由具有不足量的氧的材料形成,以在操作条件下显着地氧化碳纳米管层,否则足够坚固以保护碳纳米管层免受氧气和等离子体的影响。 在盖层上形成光致抗蚀剂层,并且将光致抗蚀剂层图案化以限定所需尺寸的熔丝。 完全蚀刻盖层和碳纳米管层,而不去除光致抗蚀剂层,以限定在碳纳米管层中具有两端的熔丝。 只是盖层被蚀刻,而不去除光致抗蚀剂层,以便在光致抗蚀剂层下的盖层的边缘处将盖层减少所需量,而不损害碳纳米管层。 去除光致抗蚀剂层,并且在熔丝的两端的每一端上形成导电触点。