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    • 93. 发明授权
    • Ambipolar transistor design
    • 双极晶体管设计
    • US07652339B2
    • 2010-01-26
    • US11697604
    • 2007-04-06
    • Yiliang WuBeng S. OngAlphonsus Hon-Chung Ng
    • Yiliang WuBeng S. OngAlphonsus Hon-Chung Ng
    • H01L29/73H01L29/735H01L23/31
    • H01L51/0504H01L51/0068H01L51/0545H01L51/0562
    • An ambipolar transistor, including a p-type semiconductor region and an n-type semiconductor region near the p-type semiconductor region. Also a first terminal and second terminal contact both the p-type semiconductor region and the n-type semiconductor region. Furthermore, the p-type semiconductor region and the n-type semiconductor region substantially do not overlap each other. A method of manufacturing an ambipolar transistor is also disclosed, including forming a p-type semiconductor region, forming an n-type semiconductor region near the p-type semiconductor region, forming a first terminal contacting both the p-type semiconductor region and n-type semiconductor region, forming a second terminal contacting both the p-type semiconductor region and n-type semiconductor region; and wherein the p-type semiconductor region and the n-type semiconductor region substantially do not overlap, and have substantially no interfacial area.
    • 一种双极晶体管,包括p型半导体区域和p型半导体区域附近的n型半导体区域。 第一端子和第二端子也接触p型半导体区域和n型半导体区域。 此外,p型半导体区域和n型半导体区域基本上彼此不重叠。 还公开了制造双极晶体管的方法,包括形成p型半导体区域,在p型半导体区域附近形成n型半导体区域,形成与p型半导体区域和n型半导体区域接触的第一端子, 形成与p型半导体区域和n型半导体区域接触的第二端子; 并且其中p型半导体区域和n型半导体区域基本上不重叠,并且基本上没有界面面积。