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    • 95. 发明授权
    • Portable light irradiation apparatus
    • 便携式光照射装置
    • US6126294A
    • 2000-10-03
    • US319932
    • 1999-06-17
    • Emi KoyamaHozumi MatsubaraHiroyuki NishimuraToshio NakanoYoshimasa TanakaSuehiro Morita
    • Emi KoyamaHozumi MatsubaraHiroyuki NishimuraToshio NakanoYoshimasa TanakaSuehiro Morita
    • A61M21/00A61M21/02A61N5/06F21V21/084
    • A61M21/00A61M2021/0044A61M2021/0083A61N2005/0648
    • A portable light irradiation device for providing a stimulus of light to the eyes of user is used to regulate biological rhythm and improve awakening level of the user. This device includes an elongate illumination unit for irradiating the light to the user's eyes, a pair of pads adapted to be fitted to sides of the user's head, a headband adapted to be fitted to a top of the user's head and coupled to the pads at opposite ends thereof, and a supporting arm extending from at least one of the pads for supporting the illumination unit at the forward end thereof such that the illumination unit can be disposed in front of the eyes of the user wearing the light irradiation device. The supporting arm is slidably supported to the pad at the rear end thereof such that a projection length of the supporting arm against the pad is adjustable. By this component, since a distance between the user's eyes and the illumination unit can be suitably determined, it is possible to effectively provide an optical medical treatment to the user by use of the light irradiation device.
    • PCT No.PCT / JP98 / 04737 Sec。 371日期1999年6月17日第 102(e)日期1999年6月17日PCT提交1998年10月20日PCT公布。 WO99 /​​ 20333 PCT出版物 1999年04月29日利用用于向使用者的眼睛提供光的刺激的便携式光照射装置来调节生物节律并提高使用者的觉醒水平。 该装置包括用于将光照射到使用者的眼睛的细长的照明单元,适于安装到使用者头部侧面的一对垫片,适于安装在使用者头部的顶部并与垫子连接的头带 以及支撑臂,其从至少一个垫延伸,用于在其前端支撑照明单元,使得照明单元可以布置在佩戴光照射装置的使用者的眼睛的前方。 支撑臂在其后端可滑动地支撑在垫上,使得支撑臂抵靠垫的突出长度是可调节的。 通过该部件,由于可以适当地确定使用者的眼睛与照明单元之间的距离,因此可以通过使用光照射装置向用户有效地提供光学医疗。
    • 97. 发明授权
    • Dumping method for dumping data to a dump data storage device that
manages the the dumping of data updated since a previous dump request
    • 将数据转储到转储数据存储设备的转储方法,该设备管理从先前的转储请求以来更新的数据的转储
    • US5809542A
    • 1998-09-15
    • US369186
    • 1995-01-05
    • Toshiaki TsuboiAkira YamamotoShigeru KishiroToshio Nakano
    • Toshiaki TsuboiAkira YamamotoShigeru KishiroToshio Nakano
    • G06F12/08G06F11/14G06F11/34G06F12/16
    • G06F11/1402G06F11/0727G06F11/0778
    • An information processing system has a processor, a first storage unit, a controller connected between said processor and said first storage unit, and a second storage unit connected to said processor and for storing dump data, and a dump method thereof are disclosed. The controller manages updated regions of the first storage unit as write regions. In response to a dump request issued by the processor, the controller manages regions which are managed as the write regions and included in a dump portion as protected regions. If a write request for a region which is managed as protected region, the controller saves contents of the region to dump point file before executing a write operation, and release the region from the protected regions. The controller transfers contents of regions managed as protected track and contents of the dump point file to the processor as contents of regions to be dumped. At the end of dump processing, the controller deletes the dump point file and terminates management of the protected regions.
    • 信息处理系统具有处理器,第一存储单元,连接在所述处理器和所述第一存储单元之间的控制器,以及连接到所述处理器并用于存储转储数据的第二存储单元及其转储方法。 控制器管理第一存储单元的更新区域作为写入区域。 响应于由处理器发出的转储请求,控制器管理作为写入区域管理的并作为保护区域包含在转储部分中的区域。 如果对作为受保护区域进行管理的区域的写入请求,则在执行写入操作之前,控制器将该区域的内容保存到转储点文件,并将该区域从受保护区域释放。 控制器将作为保护轨道管理的区域的内容和转储点文件的内容作为要转储的区域的内容传送到处理器。 在转储处理结束时,控制器删除转储点文件,并终止受保护区域的管理。
    • 98. 发明授权
    • Method of producing material patterns by evaporating material through a
perforated mask having a reinforcing bridge
    • 通过具有加强桥的穿孔掩模蒸发材料来生产材料图案的方法
    • US4273812A
    • 1981-06-16
    • US8587
    • 1979-02-01
    • Ken TsutsuiAkira SasanoToshio NakanoHaruo MatsumaruEiichi Maruyama
    • Ken TsutsuiAkira SasanoToshio NakanoHaruo MatsumaruEiichi Maruyama
    • C23C14/04H05K3/14H05K3/10C23C13/00C23C13/02
    • H05K3/143C23C14/042
    • A method of producing material patterns in which at least one substrate is fixed together with a mask to a substrate holder, and an evaporated film of desired substances is formed on the surface of the substrate by means of evaporation sources provided to confront the substrate. The mask is fabricated to have a plurality of reinforcing bridges formed in the desired portions of the mask openings of desired shape formed in the mask. The mask is held spaced from the substrate by a small distance during the evaporation, so that the evaporation may be effected at least through two pattern openings defined at both sides of each bridge. The evaporation is performed by means of evaporation sources which are located such that the line interconnecting one of the edges of each bridge and the evaporation source located at the same side with respect to the substantial bridging direction of the bridge and another line interconnecting the other edge of the bridge and the evaporation source located at the same side as the other edge intersect each other at a point on the surface of the substrate or in the clearance between the substrate surface and the mask. This method makes it possible to produce patterns which could never be produced by the conventional evaporation method.
    • 一种生产材料图案的方法,其中至少一个基板与掩模一起固定到基板保持器上,并且通过设置成面对基板的蒸发源在基板的表面上形成所需物质的蒸发膜。 掩模被制造成具有形成在形成在掩模中的所需形状的掩模开口的所需部分中的多个加强桥。 掩模在蒸发期间与衬底间隔开一小段距离,使得蒸发可以至少通过限定在每个桥的两侧的两个图案开口进行。 通过蒸发源进行蒸发,所述蒸发源被定位成使得相对于桥的基本桥接方向互连每个桥的边缘之一的线和位于同一侧的蒸发源的线,另一条线与另一边相互连接 和位于与另一边缘相同侧的蒸发源在基板的表面上的点处或基板表面与掩模之间的间隙中彼此相交。 这种方法使得可以产生由常规蒸发方法所不能产生的图案。