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    • 91. 发明授权
    • Piezoelectric single crystal and method of production of same, piezoelectric element, and dielectric element
    • 压电单晶及其制造方法,压电元件和介电元件
    • US08119022B2
    • 2012-02-21
    • US12092664
    • 2006-11-06
    • Ho-Yong LeeSung-Min LeeDong-Ho Kim
    • Ho-Yong LeeSung-Min LeeDong-Ho Kim
    • H01L41/18H01L41/00C04B35/00
    • C30B29/22C30B1/02C30B29/30C30B29/32H01L41/18
    • A piezoelectric single crystal and piezoelectric and dielectric application parts using the same are provided, which have all of high dielectric constant K3T, high piezoelectric constants (d33 and k33), high phase transition temperatures (Tc and TRT), high coercive electric field Ec and improved mechanical properties and thus can be used in high temperature ranges and high voltage conditions. Furthermore, the piezoelectric single crystals are produced by the solid-state single crystal growth adequate for mass production of single crystals and the single crystal composition is developed not to contain expensive raw materials so that the piezoelectric single crystals can be easily commercialized. With the piezoelectric single crystals and piezoelectric single crystal application parts, the piezoelectric and dielectric application parts using the piezoelectric single crystals of excellent properties can be produced and used in the wide temperature range.
    • 提供了具有高介电常数K3T,高压电常数(d33和k33),高相变温度(Tc和TRT),高矫顽电场Ec和高矫顽电场Ec的压电单晶和压电和介电应用部件, 改进的机械性能,因此可以在高温范围和高电压条件下使用。 此外,压电单晶通过适合大量生产单晶的固态单晶生长产生,并且单晶组合物被开发成不含有昂贵的原料,使得压电单晶易于商业化。 使用压电单晶和压电单晶应用部件,可以在宽的温度范围内制造使用具有优异性能的压电单晶的压电和电介质应用部件。
    • 94. 发明申请
    • Photoresist supply apparatus and photoresist supply method
    • 光刻胶供应装置和光刻胶供应方法
    • US20100058985A1
    • 2010-03-11
    • US12585230
    • 2009-09-09
    • Dong Ho KimSoo Min Hwang
    • Dong Ho KimSoo Min Hwang
    • C23C16/00
    • G03F7/16B05C11/1013
    • Provided is a photoresist supply apparatus. The photoresist supply apparatus includes a discharge nozzle, a metering pump, a trap tank, a bottle, and a first drain line. The discharge nozzle discharges a photoresist onto a wafer. The metering pump supplies the photoresist of a fixed quantity into the discharge nozzle. The trap tank temporarily stores the photoresist to be supplied from the metering pump to the discharge nozzle. The bottle contains the photoresist stored in the trap tank. The bubble discernment member determines whether bubbles exist in the standby photoresist to be supplied from the pump to the discharge nozzle. The first drain line connects the pump to a waste liquid tank to drain the standby photoresist from the pump to the waste liquid tank when the bubble discernment member checks the bubbles.
    • 提供了光致抗蚀剂供应装置。 光致抗蚀剂供给装置包括排出喷嘴,计量泵,捕集罐,瓶和第一排水管。 放电喷嘴将光致抗蚀剂排出到晶片上。 计量泵将固定数量的光致抗蚀剂供应到排放喷嘴中。 捕集槽临时存储从计量泵供给到排放喷嘴的光致抗蚀剂。 瓶子中含有存储在捕集罐中的光致抗蚀剂。 气泡识别构件确定待从光泵送到排出喷嘴的备用光致抗蚀剂中是否存在气泡。 当气泡识别构件检查气泡时,第一排水管路将泵连接到废液箱以将备用光致抗蚀剂从泵排出到废液箱。