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    • 92. 发明授权
    • Method and apparatus for a pipeline architecture
    • 管道架构的方法和装置
    • US07571258B2
    • 2009-08-04
    • US10718270
    • 2003-11-19
    • Shridhar MukundAnjan MitraMahesh Gopalan
    • Shridhar MukundAnjan MitraMahesh Gopalan
    • H04L12/28H04L12/56H04J3/16H04J3/22G06F15/16
    • H04L49/3063H04L49/90H04L69/16H04L69/161
    • A method for efficiently processing layers of a data packet is provided. The method initiates with defining a pipeline of processors communicating with a distributed network and CPU of a host system. Then, a data packet from the distributed network is received into a first stage of the pipeline. Next, the data packet is processed to remove a header associated with the first stage. Then, the processed data packet is transmitted to a second stage. The operations of processing and transmitting the processed data packet are repeated for successive stages until a header associated with a final stage has been removed. Then, the data packet is transmitted to the CPU of the host system. It should be appreciated that the header is not necessarily transformed at each stage. For example, suitable processing that does not strip the header may be applied at each stage.
    • 提供了一种用于有效处理数据分组的层的方法。 该方法通过定义与主机系统的分布式网络和CPU通信的处理器流水线来启动。 然后,来自分布式网络的数据分组被接收到流水线的第一级。 接下来,处理数据分组以移除与第一阶段相关联的报头。 然后,处理的数据分组被发送到第二阶段。 处理和发送处理的数据分组的操作重复连续阶段,直到与最后一级相关联的报头已经被去除。 然后,将数据包发送到主机系统的CPU。 应当理解,头部不一定在每个阶段变换。 例如,可以在每个阶段应用不剥离报头的适当处理。
    • 94. 发明授权
    • Wafer support apparatus for electroplating process and method for using the same
    • 用于电镀工艺的晶片支撑装置及其使用方法
    • US07566390B2
    • 2009-07-28
    • US11014527
    • 2004-12-15
    • Carl Woods
    • Carl Woods
    • C25B9/02
    • C25D17/06C25D5/02C25D17/00C25D17/001
    • A multi-layered wafer support apparatus is provided for performing an electroplating process on a semiconductor wafer (“wafer”). The multi-layered wafer support apparatus includes a bottom film layer and a top film layer. The bottom film layer includes a wafer placement area and a sacrificial anode surrounding the wafer placement area. The top film layer is defined to be placed over the bottom film layer. The top film layer includes an open region to be positioned over a surface of the wafer to be processed, i.e., electroplated. The top film layer provides a liquid seal between the top film layer and the wafer, about a periphery of the open region. The top film layer further includes first and second electrical circuits that are each defined to electrically contact a peripheral top surface of the wafer at diametrically opposed locations about the wafer.
    • 提供一种用于对半导体晶片(“晶片”)进行电镀处理的多层晶片支撑装置。 多层晶片支撑装置包括底部薄膜层和顶部薄膜层。 底部薄膜层包括晶片放置区域和围绕晶片放置区域的牺牲阳极。 顶部薄膜层被定义为放置在底部薄膜层上。 顶部薄膜层包括位于要处理的晶片的表面上的开放区域,即电镀。 顶部膜层围绕开放区域的周边在顶部膜层和晶片之间提供液体密封。 顶部薄膜层还包括第一和第二电路,每个电路限定为在晶片周围的直径相对的位置处电接触晶片的外围顶表面。
    • 95. 发明授权
    • Navigation tool for connectors
    • 连接器导航工具
    • US07562328B1
    • 2009-07-14
    • US11036928
    • 2005-01-14
    • Chin Choi Phaik
    • Chin Choi Phaik
    • G06F17/50
    • G06F17/505G06F2217/74
    • A method for creating a tool for enhancing navigation through a schematic display of a netlist is provided. In the method, the display of the netlist is partitioned into multiple pages. A vector is inserted into one of the partitioned pages and then a marker is inserted into the vector. Whether a node of the netlist is a source node or a destination node is determined. Based on whether the node is a source or a destination node, a page reference is inserted before or after the dummy page. In one embodiment, the method is incorporated as program instructions on a computer readable medium. A computer implemented system and a graphical user interface for navigating through a register transfer level display of an integrated circuit are also provided.
    • 提供了一种用于创建用于通过网表的示意性显示来增强导航的工具的方法。 在该方法中,网表的显示被分割成多页。 将向量插入到一个分割页面中,然后将标记插入到向量中。 是否确定网表的节点是源节点还是目标节点。 基于节点是源节点还是目的节点,在虚页之前或之后插入页引用。 在一个实施例中,该方法作为程序指令并入计算机可读介质中。 还提供了用于在集成电路的寄存器传送级别显示器中导航的计算机实现的系统和图形用户界面。
    • 96. 发明授权
    • In-situ wafer temperature measurement and control
    • 原位晶圆温度测量与控制
    • US07560007B2
    • 2009-07-14
    • US11519542
    • 2006-09-11
    • Keith Gaff
    • Keith Gaff
    • H01L21/306
    • H01L21/67248G01K11/20
    • Broadly speaking, the embodiments of the present invention fill the need by providing in-situ wafer temperature measuring method and apparatus. The in-situ substrate temperature measuring method and apparatus provide instant wafer temperature information to allow for continuous monitoring of the etching process. The method and apparatus also allow for instant substrate temperature control to tighten wafer-to-wafer and chamber-to-chamber process distribution. An exemplary cluster tool system is provided. The cluster tool system includes a substrate holding station for holding a substrate capable of emitting signals indicative of substrate temperature, and a processing chamber, the processing chamber being configured to receive the substrate from the substrate holding station and to run through an active process operation when the substrate is in the processing chamber. The cluster tool system also includes a signal detector for detecting the signals emitted by the substrate when the processing chamber runs through the active process operation, the signal detector being configured to collect the emitted signals indicative of the substrate temperature.
    • 广义地说,本发明的实施例通过提供原位晶片温度测量方法和装置来满足需要。 原位衬底温度测量方法和装置提供即时晶片温度信息以允许连续监测蚀刻工艺。 该方法和装置还允许即时衬底温度控制以紧固晶片到晶片和腔室到室的过程分布。 提供了一种示例性的集群工具系统。 集群工具系统包括:用于保持能够发出指示衬底温度的信号的衬底的衬底保持站;以及处理室,所述处理室被配置为从衬底保持站接收衬底并且通过主动工艺操作运行, 基板处于处理室中。 所述集群工具系统还包括信号检测器,用于当所述处理室经过所述有效过程操作时检测由所述衬底发射的信号,所述信号检测器被配置为收集指示所述衬底温度的发射信号。
    • 98. 发明授权
    • Image processing using object information
    • 使用对象信息进行图像处理
    • US07555140B2
    • 2009-06-30
    • US10486744
    • 2002-09-11
    • Yoshihiro Nakami
    • Yoshihiro Nakami
    • G06K9/36
    • H04N1/32128G06T5/009G06T5/40H04N5/2351H04N2201/3222H04N2201/3242H04N2201/3277
    • A CPU 300 divides an image into plural regions and for each of the regions, generates a histogram and calculates an average brightness Y ave. The CPU 300 determines a focus location on the image by using focus location information, sets a region at the determined location as an emphasis region, and sets the average brightness Y ave of the emphasis region as a brightness criterion Y std. The CPU 300 uses the brightness criterion Y std to determine non-usable regions. By using the regions not excluded as non-usable regions, the CPU 300 calculates an image quality adjustment average brightness Y′ ave, i.e. the average brightness of the entire image, with a weighting W in accordance with the locations of the regions reflected thereto, and executes a bright value correction by using the calculated image quality adjustment average brightness Y′ ave.
    • CPU300将图像划分为多个区域,并且对于每个区域,生成直方图并计算平均亮度Y ​​ave。 CPU300通过使用焦点位置信息来确定图像上的焦点位置,将确定位置处的区域设置为强调区域,并将加亮区域的平均亮度Y ​​ave设置为亮度准则Y std。 CPU300使用亮度准则Y std来确定不可用区域。 通过使用未被排除为不可用区域的区域,CPU300根据反映到其的区域的位置,计算图像质量调整平均亮度Y'ave,即,整个图像的平均亮度,具有加权W, 并通过使用计算出的图像质量调整平均亮度Y'ave执行亮度校正。