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    • 2. 发明授权
    • Conductive film
    • 导电膜
    • US07626128B2
    • 2009-12-01
    • US11664559
    • 2005-10-06
    • Yasushi TakadaShotaro TanakaJunpei Ohashi
    • Yasushi TakadaShotaro TanakaJunpei Ohashi
    • H05K9/00
    • H05K9/0096H05K9/009Y10T428/24405Y10T428/24413
    • A conductive film has transparency and a high level of electrical conductivity, which is used for an electromagnetic interference film hardly causing a moiré phenomenon, and the like. To achieve the above-mentioned aim, the following disclosure is disclosed. A conductive film in which a conductive portion of a random network structure is present on at least one surface of a base film, a line width of the conductive portion composing the network structure is 30 μm or less, an area of portions where the conductive portion is not present is 50% or more with respect to an area of the conductive film, and an average of ratios of a major axis length to a minor axis length of an area surrounded by the network of the conductive portion, in which the base film is exposed, is larger than 1 and is equal to or less than 3.5.
    • 导电膜具有透明性和高导电性,其用于几乎不引起莫尔现象的电磁干扰膜等。 为了实现上述目的,公开了以下公开内容。 导电膜,其中在基膜的至少一个表面上存在无规网络结构的导电部分,构成网络结构的导电部分的线宽为30μm或更小,导电部分的部分面积 不存在相对于导电膜的面积为50%以上,并且由导电部的网络包围的区域的长轴长度与短轴长度的比率的平均值,其中基膜 暴露,大于1且等于或小于3.5。
    • 4. 发明申请
    • Conductive Film
    • 导电膜
    • US20070264530A1
    • 2007-11-15
    • US11664559
    • 2005-10-06
    • Yasushi TakadaShotaro TanakaJunpei Ohashi
    • Yasushi TakadaShotaro TanakaJunpei Ohashi
    • H01B5/14B32B27/00H05K9/00G09F9/00
    • H05K9/0096H05K9/009Y10T428/24405Y10T428/24413
    • The present invention aims at providing a conductive film having transparency and a high level of electrical conductivity, which is used for an electromagnetic interference film hardly causing a moiré phenomenon, and the like. To achieve the above-mentioned aim, the following invention is disclosed. A conductive film in which a conductive portion of a random network structure is present on at least one surface of a base film, a line width of the conductive portion composing the network structure is 30 μm or less, an area of portions where the conductive portion is not present is 50% or more with respect to an area of the conductive film, and an average of ratios of a major axis length to a minor axis length of an area surrounded by the network of the conductive portion, in which the base film is exposed, is larger than 1 and is equal to or less than 3.5.
    • 本发明的目的在于提供一种具有透明性和高导电性的导电膜,其用于几乎不引起莫尔现象的电磁干扰膜等。 为了实现上述目的,公开了以下发明。 导电膜,其中在基膜的至少一个表面上存在无规网络结构的导电部分,构成网络结构的导电部分的线宽为30μm或更小,导电部分的部分面积 不存在相对于导电膜的面积为50%以上,并且由导电部的网络包围的区域的长轴长度与短轴长度的比率的平均值,其中基膜 暴露,大于1且等于或小于3.5。