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1. 发明授权

US5362521A Method of forming coating films 失效
标题翻译：涂膜形成方法
公开(公告)号：US5362521A
公开(公告)日：1994-11-08
申请号：US036407
申请日：1993-03-24
申请人： Tohru Ozaki , Akira Kasari , Shigeru Nakamura
发明人： Tohru Ozaki , Akira Kasari , Shigeru Nakamura
IPC分类号： B05D5/06 , B05D7/00 , C08L61/28 , C08L83/04 , C09D5/00 , C09D5/38 , C09D201/06 , B05D1/36
CPC分类号： B05D7/532 , B05D5/068 , B05D7/577 , C09D201/06 , C09D5/002 , C09D5/38 , B05D2601/04 , C08L61/28 , C08L83/04
摘要： The invention provides a method of forming a coating film by forming in sequence a pigmented base coat and a clear top coat on a substrate followed by finishing by the two-coat one-bake technique, the method being characterized by using, as a coating composition for pigmented base coat formation, a composition comprising, as essential components thereof,(1) an OH-containing resin,(2) an amino resin,(3) a polyorganosiloxane which has, on an average, at least two groups, per molecule, each selected from the class consisting of a silanol group and an alkoxysilane group and has a number average molecular weight of at least 1,000,(4) a metal chelate compound(5) a flaky metal powder and/or a mica powder, and(6) an organic solvent,and using, as a coating composition for clear top coat formation, a composition comprising, as essential components thereof,(1) an OH- and epoxy-containing base resin which further contains at least one group selected from the group consisting of a silanol group and a hydrolyzable group bound directly to a silicon atom,(2) a curing catalyst, and(3) an organic solvent.
摘要翻译：本发明提供了一种形成涂膜的方法，该方法通过在基材上依次形成着色底涂层和透明面漆，然后通过双涂层单烘烤技术进行精加工，该方法的特征在于使用作为涂料组合物对于着色底涂层形成，包含作为其主要组分的组合物，（1）含OH树脂，（2）氨基树脂，（3）每分子平均具有至少两个基团的聚有机硅氧烷各自选自由硅烷醇基和烷氧基硅烷基组成的类别，数均分子量为1,000以上，（4）金属螯合物（5）为片状金属粉末和/或云母粉末，（ 6）有机溶剂，并且使用作为透明外涂层形成用涂料组合物的组合物，其包含作为其主要组分的组合物，（1）含OH-和环氧基的基础树脂，其还含有至少一种选自由硅烷醇组成的组（2）固化催化剂，和（3）有机溶剂。

2. 发明授权

US5218018A Hydroxyl and carboxyl groups-containing resin with alicyclic polyepoxide 失效
标题翻译：含羟基和含羧基的树脂与脂环族聚环氧化物
公开(公告)号：US5218018A
公开(公告)日：1993-06-08
申请号：US635970
申请日：1990-12-31
申请人： Akira Tominaga , Reiziro Nishida , Hiroshi Inoue , Motoshi Yabuta , Yoshio Sasaki , Akira Kasari , Hiroshi Igarashi , Tohru Ozaki
发明人： Akira Tominaga , Reiziro Nishida , Hiroshi Inoue , Motoshi Yabuta , Yoshio Sasaki , Akira Kasari , Hiroshi Igarashi , Tohru Ozaki
IPC分类号： B05D7/00 , C08G59/20 , C08G59/68 , C09D5/38 , C09D163/00 , C09D201/06
CPC分类号： B05D7/532 , C08G59/20 , C08G59/68 , C09D163/00 , C09D201/06 , C09D5/38
摘要： A thermosetting coating composition comprising as essential components:(a) a hydroxyl group-containing base resin,(b) an alicyclic polyepoxide crosslinking agent, and(c) a catalyst selected from the group consisting of a quaternary ammonium hydroxide and a metal chelate.
摘要翻译：一种热固性涂料组合物，其包含作为必要组分的（a）含羟基的基础树脂，（b）脂环族聚环氧化物交联剂和（c）选自季铵氢氧化物和金属螯合物的催化剂。

3. 发明申请

US20120139024A1 NONVOLATILE SEMICONDUCTOR MEMORY AND METHOD FOR MANUFACTURING THE SAME 失效
标题翻译：非易失性半导体存储器及其制造方法
公开(公告)号：US20120139024A1
公开(公告)日：2012-06-07
申请号：US13050297
申请日：2011-03-17
申请人： Takayuki TOBA , Tohru Ozaki
发明人： Takayuki TOBA , Tohru Ozaki
IPC分类号： H01L29/788 , H01L21/336
CPC分类号： H01L27/11524 , H01L27/11534 , H01L29/66825
摘要： In one embodiment, a nonvolatile semiconductor memory includes a memory cell array, a first silicon nitride film and a second silicon nitride film. The memory cell array includes NAND cell units. Each of the NAND cell units has memory cell transistors, a source-side select gate transistor and a drain-side select gate transistor. The source-side select gate transistors is disposed in such a manner as to face each other and the drain-side select gate transistors is disposed in such a manner as to face each other. The first silicon nitride film is present in a region between the source-side select gate transistors and is disposed at a position lowest from the upper surface of the semiconductor substrate. The second silicon nitride film is formed in a region between the drain-side select gate transistors and is disposed at a position lowest from the upper surface of the semiconductor substrate.
摘要翻译：在一个实施例中，非易失性半导体存储器包括存储单元阵列，第一氮化硅膜和第二氮化硅膜。存储单元阵列包括NAND单元单元。每个NAND单元单元具有存储单元晶体管，源极选择栅极晶体管和漏极侧选择栅极晶体管。源极侧选择栅极晶体管以彼此面对的方式设置，并且漏极侧选择栅极晶体管以彼此面对的方式设置。第一氮化硅膜存在于源极选择栅晶体管之间的区域中，并且设置在从半导体衬底的上表面最低的位置。第二氮化硅膜形成在漏极侧选择栅晶体管之间的区域中，并且设置在从半导体衬底的上表面最低的位置。

4. 发明申请

US20100320518A1 SEMICONDUCTOR DEVICE 失效
标题翻译：半导体器件
公开(公告)号：US20100320518A1
公开(公告)日：2010-12-23
申请号：US12869502
申请日：2010-08-26
申请人： Tohru Ozaki
发明人： Tohru Ozaki
IPC分类号： H01L27/06
CPC分类号： H01L28/60 , G11C11/22 , H01L27/105 , H01L27/11502 , H01L27/11507 , H01L27/11509 , H01L28/55
摘要： According to an aspect of the present invention, there is provided a semiconductor device including: a transistor including: a source, a drain and a gate; first and second plugs on the source and the drain; a third plug on the gate to have a top face higher than that of the first plug; an interlayer insulating film covering the transistor and the first to the third plugs; a ferroelectric capacitor on the interlayer insulating film, one electrode thereof being connected to the first plug; a barrier film covering surfaces of the ferroelectric capacitor and the interlayer insulating film to prevent a substance affecting the ferroelectric capacitor from entering therethrough; and fourth and fifth plugs disposed on the second and the third plugs and connected thereto through connection holes formed in the barrier film.
摘要翻译：根据本发明的一个方面，提供了一种半导体器件，包括：晶体管，包括：源极，漏极和栅极; 源极和漏极上的第一和第二插头; 栅极上的第三个插头具有高于第一插头的顶面; 覆盖晶体管和第一至第三插头的层间绝缘膜; 层间绝缘膜上的铁电电容器，其一个电极连接到第一插头; 覆盖铁电电容器和层间绝缘膜的表面的阻挡膜，以防止影响铁电电容器的物质进入其中; 以及设置在第二和第三插头上的第四和第五插头，并且通过形成在阻挡膜中的连接孔与其连接。

5. 发明授权

US07816717B2 Semiconductor memory device 有权
标题翻译：半导体存储器件
公开(公告)号：US07816717B2
公开(公告)日：2010-10-19
申请号：US12020210
申请日：2008-01-25
申请人： Tohru Ozaki
发明人： Tohru Ozaki
IPC分类号： H01L21/00 , H01L29/76 , H01L29/94
CPC分类号： H01L27/11502 , H01L27/11507 , Y10S257/905 , Y10S257/906 , Y10S257/908
摘要： A semiconductor memory device, comprising: a semiconductor substrate; a memory cell section comprising a memory transistor provided on the semiconductor substrate, the memory transistor including a first gate electrode provided on the semiconductor substrate with a gate insulating film interposed therebetween, and a source and drain provided at both sides of the first gate electrode on the semiconductor substrate, and a ferroelectric capacitor provided above the memory transistor, the ferroelectric capacitor including a first electrode film connected to any one of a source and drain of the memory transistor, a second electrode film connected to the other one of the drain and source of the memory transistor, and a ferroelectric film provided between the first electrode film and the second electrode film, the memory cell section having the memory transistor and the ferroelectric capacitor connected in parallel to each other; and a select transistor section, comprising a select transistor provided at an end of the memory cell section, the select transistor including a second gate electrode provided on the semiconductor substrate with the gate insulating film interposed therebetween, and a source and drain provided at both sides of the second gate electrode on the semiconductor substrate, and a third electrode film connected to the source and drain of the select transistor and connected to a bit line via a bit line contact.
摘要翻译：一种半导体存储器件，包括：半导体衬底; 存储单元部分，包括设置在所述半导体衬底上的存储晶体管，所述存储晶体管包括设置在所述半导体衬底上的栅极绝缘膜之间的第一栅电极，以及设置在所述第一栅电极的两侧的源极和漏极，所述半导体衬底和设置在所述存储晶体管上方的强电介质电容器，所述强电介质电容器包括连接到所述存储晶体管的源极和漏极中的任一个的第一电极膜，连接到所述漏极和源极中的另一个的第二电极膜以及设置在第一电极膜和第二电极膜之间的铁电体膜，具有彼此并联连接的存储晶体管和强电介质电容器的存储单元部分; 以及选择晶体管部分，包括设置在存储单元部分的一端的选择晶体管，所述选择晶体管包括设置在半导体衬底上的栅极绝缘膜之间的第二栅电极，以及设置在两侧的源极和漏极的第二栅极电极，以及连接到选择晶体管的源极和漏极并经由位线接触连接到位线的第三电极膜。

6. 发明申请

US20100163943A1 SEMICONDUCTOR MEMORY DEVICE 审中-公开
标题翻译：半导体存储器件
公开(公告)号：US20100163943A1
公开(公告)日：2010-07-01
申请号：US12559358
申请日：2009-09-14
申请人： Tohru Ozaki
发明人： Tohru Ozaki
IPC分类号： H01L27/115 , H01L21/8246
CPC分类号： H01L27/11507 , H01L21/76895 , H01L28/55
摘要： A memory includes a first interlayer on transistors; a first and second plugs connected to the transistor; ferroelectric capacitors; a second interlayer covering a side surface of the capacitor; a local interconnection connecting the second plug to the upper electrode, wherein two upper electrodes adjacent to each other on the second plug are connected to the second plug, the lower electrodes adjacent to each other on the first plug are connected to the first plug, cell blocks comprising the connected capacitors are arranged, cell blocks adjacent to each other are arranged to be shifted by a half pitch of the local interconnection, a first gap between two capacitors adjacent to each other on the second plug is larger than twice a thickness of the second interlayer, and a second gap between the cell blocks adjacent to each other is smaller than twice the thickness of the second interlayer.
摘要翻译：存储器包括晶体管上的第一中间层; 连接到所述晶体管的第一和第二插头; 铁电电容器; 覆盖所述电容器的侧表面的第二夹层; 将第二插头连接到上电极的局部互连，其中在第二插头上彼此相邻的两个上电极连接到第二插头，在第一插头上彼此相邻的下电极连接到第一插头单元包括连接的电容器的块被布置成彼此相邻的单元块被布置成以局部互连的半间距偏移，在第二插头上彼此相邻的两个电容器之间的第一间隙大于第二中间层和彼此相邻的电池块之间的第二间隙小于第二中间层的厚度的两倍。

7. 发明申请

US20090127602A1 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：半导体存储器件及其制造方法
公开(公告)号：US20090127602A1
公开(公告)日：2009-05-21
申请号：US12252451
申请日：2008-10-16
申请人： Tohru Ozaki
发明人： Tohru Ozaki
IPC分类号： H01L29/51 , H01L21/02 , G11C11/22 , H01L29/68
CPC分类号： H01L27/11507 , H01L21/76831 , H01L21/76897 , H01L27/11502 , H01L28/55
摘要： This disclosure concerns a memory including transistors provided on a substrate; ferroelectric capacitors provided on the transistors, the ferroelectric capacitors respectively including a ferroelectric film provided between a lower electrode and an upper electrode; and a barrier film covering a first side surface of the ferroelectric capacitor, and blocking passing of hydrogen, wherein adjacent two of the ferroelectric capacitors connected in the lower electrode form one capacitor unit, a plurality of the capacitor units connected in the upper electrode form one capacitor chain, the capacitor units are arranged with a deviation of a half pitch of the capacitor unit in adjacent plurality of capacitor chains, and when D1 is a distance between the adjacent ferroelectric capacitors within the capacitor unit, D2 is a distance between the adjacent capacitor chains, and D3 is a distance between the adjacent capacitor units within the capacitor chain, D3 is larger than D1 and D2.
摘要翻译：本公开涉及包括设置在基板上的晶体管的存储器; 设置在晶体管上的铁电电容器，铁电电容器分别包括设置在下电极和上电极之间的铁电体膜; 以及覆盖所述强电介质电容器的第一侧面的阻挡膜和阻挡氢的通过，其中，连接在所述下部电极中的相邻的两个所述铁电电容器形成一个电容器单元，在所述上部电极中连接的多个所述电容器单元形成一个电容器链，电容器单元在相邻的多个电容器链中以电容器单元的半间距的偏差排列，并且当D1是电容器单元内的相邻强电介质电容器之间的距离时，D2是相邻电容器之间的距离链，D3是电容器链内的相邻电容器单元之间的距离，D3大于D1和D2。

8. 发明授权

US07312488B2 Semiconductor storage device and manufacturing method for the same 失效
标题翻译：半导体存储器件及其制造方法相同
公开(公告)号：US07312488B2
公开(公告)日：2007-12-25
申请号：US11134414
申请日：2005-05-23
申请人： Tohru Ozaki , Iwao Kunishima
发明人： Tohru Ozaki , Iwao Kunishima
IPC分类号： H01L29/76
CPC分类号： H01L27/11507 , H01L27/105 , H01L27/11502 , H01L27/11509 , H01L28/57
摘要： There is provided a semiconductor storage device comprising a ferroelectric capacitor superior in barrier capability against penetration of hydrogen from all directions including a transverse direction. The device comprises a transistor formed on a semiconductor substrate, the ferroelectric capacitor formed above the transistor and including a lower electrode, a ferroelectric film, and an upper electrode, a first hydrogen barrier film which continuously surrounds side portions of a ferroelectric capacitor cell array constituted of a plurality of ferroelectric capacitors, and a second hydrogen barrier film which is formed above the ferroelectric capacitor cell array and which is brought into contact with the first hydrogen barrier film in the whole periphery.
摘要翻译：提供了一种包括铁电电容器的半导体存储装置，该铁电电容器的阻挡能力优于氢气从包括横向的所有方向渗透。该器件包括形成在半导体衬底上的晶体管，形成在晶体管上方并包括下电极，铁电体膜和上电极的铁电电容器，连续围绕构成的铁电电容器单元阵列的侧部的第一氢阻挡膜的多个强电介质电容器，以及形成在铁电体电容器单元阵列上方并与整个周边与第一氢阻挡膜接触的第二氢阻挡膜。

9. 发明申请

US20060280023A1 Semiconductor memory device using a ferroelectric capacitor 审中-公开
标题翻译：使用铁电电容器的半导体存储器件
公开(公告)号：US20060280023A1
公开(公告)日：2006-12-14
申请号：US11440110
申请日：2006-05-25
申请人： Katsuhiko Hoya , Tohru Ozaki
发明人： Katsuhiko Hoya , Tohru Ozaki
IPC分类号： G11C8/00
CPC分类号： G11C11/22
摘要： A semiconductor memory device includes a row of memory cells connected in series, each of the memory cells including a ferroelectric capacitor and a cell transistor having a gate terminal and source/drain terminals, the source/drain terminals being connected in parallel with two electrodes of the ferroelectric capacitor, a word line connected to the gate terminal, memory cell blocks each including the row of memory cells and a block select transistor, a drain terminal of the block select transistor being connected to one end of the row of memory cells, a plate line connected to another end thereof, a bit line connected to a source terminal of the block select transistor, and a block select line connected to a gate terminal of the block select transistor, wherein a contact is provided under the plate line to connect the source terminal of the block select transistor and the bit line.
摘要翻译：半导体存储器件包括串联连接的一行存储器单元，每个存储器单元包括铁电电容器和具有栅极端子和源极/漏极端子的单元晶体管，源极/漏极端子与两个电极铁电电容器，连接到栅极端子的字线，每个包括行存储单元的存储单元块和块选择晶体管，块选择晶体管的漏极端子连接到该行存储单元的一端，连接到其另一端的板线，连接到块选择晶体管的源极端的位线和连接到块选择晶体管的栅极端子的块选择线，其中在板线下方提供接触以将块选择晶体管的源极端子和位线。

10. 发明申请

US20050205910A1 Semiconductor device having ferroelectric memory and manufacturing method of the semiconductor device 审中-公开
标题翻译：具有铁电存储器的半导体器件和半导体器件的制造方法
公开(公告)号：US20050205910A1
公开(公告)日：2005-09-22
申请号：US10960029
申请日：2004-10-08
申请人： Yoshinori Kumura , Hiroyuki Kanaya , Tohru Ozaki
发明人： Yoshinori Kumura , Hiroyuki Kanaya , Tohru Ozaki
IPC分类号： H01L27/105 , H01L21/00 , H01L21/8246 , H01L27/115 , H01L29/76
CPC分类号： H01L27/11502 , H01L27/11507
摘要： A transistor including a source/drain region is formed on a semiconductor substrate. A plug electrode is formed on the source/drain region. A conductive film is formed on the plug electrode. A first insulation film is formed on the conductive film. A lower electrode is formed on the first insulation film, and electrically connected to the conductive film formed on the plug electrode. A ferroelectric film is formed on the lower electrode. An upper electrode is formed on the ferroelectric film.
摘要翻译：包括源极/漏极区域的晶体管形成在半导体衬底上。插头电极形成在源极/漏极区域上。在插头电极上形成导电膜。在导电膜上形成第一绝缘膜。在第一绝缘膜上形成下电极，与形成在插塞电极上的导电膜电连接。在下电极上形成铁电体膜。在铁电体膜上形成上部电极。

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