专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07494226B2 Methods and apparatus for controlling projectors 有权
标题翻译：控制投影机的方法和装置
公开(公告)号：US07494226B2
公开(公告)日：2009-02-24
申请号：US11231455
申请日：2005-09-21
申请人： Ted W. Barnes , David C. Collins , Olan C. Way
发明人： Ted W. Barnes , David C. Collins , Olan C. Way
IPC分类号： G03B21/28
CPC分类号： H04N9/317 , G02B26/10
摘要： An optical component of a projector is driven with a signal that contains one or more components that act to substantially cancel one or more unwanted oscillatory displacements of the optical component resulting from one or more unwanted oscillatory forces.
摘要翻译：投影仪的光学部件由包含一个或多个部件的信号驱动，该部件用于基本上消除由一个或多个不想要的振荡力导致的光学部件的一个或多个不想要的振荡位移。

2. 发明授权

US07279812B2 Light direction assembly shorted turn 失效
标题翻译：光方向组装短路
公开(公告)号：US07279812B2
公开(公告)日：2007-10-09
申请号：US11037959
申请日：2005-01-18
申请人： Ted W. Barnes
发明人： Ted W. Barnes
IPC分类号： H02K41/00
CPC分类号： G02B7/1821 , G02B26/0816 , G02B26/101
摘要： A light direction assembly comprises a tip-tilt platform having a light direction member and at least one current coil coupled to the tip-tilt platform. The light direction assembly also includes a plurality of magnetic producing devices that are positioned in close proximity to the current coil. The magnetic producing devices are configured to selectively tilt the tip-tilt platform in response to a current flowing through the current coil. At least one shorted turn is also included in light direction assembly and is positioned in close proximity to the current coil.
摘要翻译：光方向组件包括具有光方向构件和耦合到尖端倾斜平台的至少一个电流线圈的倾斜平台。光方向组件还包括位于紧邻电流线圈的多个磁性产生装置。磁性产生装置被配置为响应于流过电流线圈的电流而选择性地倾斜尖端倾斜平台。至少一个短路匝也包括在光方向组件中并且被定位成紧邻电流线圈。

3. 发明授权

US5257252A Adaptive control system for a disk drive actuator 失效
标题翻译：磁盘驱动器执行器的自适应控制系统
公开(公告)号：US5257252A
公开(公告)日：1993-10-26
申请号：US812231
申请日：1991-12-18
申请人： Ted W. Barnes , Richard B. Wells
发明人： Ted W. Barnes , Richard B. Wells
IPC分类号： G11B21/10 , G11B7/095 , G11B21/08 , G11B7/00
CPC分类号： G11B21/085 , G11B7/0953
摘要： A servo loop controls an actuator and read head, the loop being responsive to training signals to cause the actuator to move the read head. An error signal is produced that indicates a less than optimum positioning action by the actuator. A compensating filter alters the servo loop's response to a training signal to cause the actuator to produce a more optimum positioning action, the filter exhibiting an initial value filter characteristic. A processor is responsive to a first training signal to alter the filter's initial characteristic value in a first direction to cause the filter to act upon the first training signal in accordance with the altered characteristic value, and is further responsive to a second training signal to alter the filter's initial characteristic in a second direction to cause said filter to act upon the second training signal in accordance with the altered characteristic value. The processor adjusts the filter characteristic in a direction dependent upon which training signal causes a lower value error signal.

4. 发明申请

US20090127225A1 MEASUREMENT OF ETCHING 有权
标题翻译：蚀刻测量
公开(公告)号：US20090127225A1
公开(公告)日：2009-05-21
申请号：US12356942
申请日：2009-01-21
申请人： Ted W. Barnes , Victorio Chavarria , William J. Sudyka , Adam Ghozeil , Timothy R. Emery
发明人： Ted W. Barnes , Victorio Chavarria , William J. Sudyka , Adam Ghozeil , Timothy R. Emery
IPC分类号： B44C1/22
CPC分类号： B41J2/1626 , B41J2/1603
摘要： Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
摘要翻译：通过将检测器元件邻近待蚀刻材料的一部分定位来确定材料中蚀刻程度的方法和装置。元素的宽度不同。在蚀刻该部分时测量元件的电阻。

5. 发明授权

US07491457B2 Fuel cell apparatus 有权
标题翻译：燃料电池装置
公开(公告)号：US07491457B2
公开(公告)日：2009-02-17
申请号：US10222417
申请日：2002-08-16
申请人： Daniel A. Kearl , Ted W. Barnes , David Champion , Gregory Herman
发明人： Daniel A. Kearl , Ted W. Barnes , David Champion , Gregory Herman
IPC分类号： H01M8/04
CPC分类号： H01M8/04604 , H01M8/0432 , H01M8/0438 , H01M8/04544 , H01M8/04574 , H01M8/04925 , H01M8/04955 , H01M8/249
摘要： A fuel cell apparatus including fuel cell blocks electrically re-configurable in at least two arrangements by a control module.
摘要翻译：一种燃料电池装置，其包括通过控制模块以至少两种布置电可重新配置的燃料电池块。

6. 发明授权

US08173032B2 Measurement of etching 有权
标题翻译：蚀刻测量
公开(公告)号：US08173032B2
公开(公告)日：2012-05-08
申请号：US12356942
申请日：2009-01-21
申请人： Ted W. Barnes , Victorio Chavarria , William J. Sudyka , Adam Ghozeil , Timothy R. Emery
发明人： Ted W. Barnes , Victorio Chavarria , William J. Sudyka , Adam Ghozeil , Timothy R. Emery
IPC分类号： B44C1/22
CPC分类号： B41J2/1626 , B41J2/1603
摘要： Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
摘要翻译：通过将检测器元件邻近待蚀刻材料的一部分定位来确定材料中蚀刻程度的方法和装置。元素的宽度不同。在蚀刻该部分时测量元件的电阻。

7. 发明授权

US07586503B2 Reducing acoustical noise in differently aiming sub-frames of image data frame 失效
标题翻译：在不同目标图像数据帧的子帧中降低声学噪声
公开(公告)号：US07586503B2
公开(公告)日：2009-09-08
申请号：US11193888
申请日：2005-07-30
申请人： Stan E. Leigh , Arnold W. Larson , P. Guy Howard , Ted W. Barnes
发明人： Stan E. Leigh , Arnold W. Larson , P. Guy Howard , Ted W. Barnes
IPC分类号： G09G5/10
CPC分类号： G09G3/346 , G09G3/2022 , G09G2310/06 , G09G2320/02 , G09G2340/0414 , G09G2340/0421
摘要： A modulator is controlled in accordance with each sub-frame of a frame of image data. An aiming mechanism is physically adjusted to differently aim each sub-frame. Acoustical noise in physically adjusting the aiming mechanism is reduced.
摘要翻译：根据图像数据帧的每个子帧来控制调制器。物理地调整瞄准机构以不同地瞄准每个子框架。物理调节瞄准机构的噪声降低。

8. 发明授权

US07494596B2 Measurement of etching 有权
标题翻译：蚀刻测量
公开(公告)号：US07494596B2
公开(公告)日：2009-02-24
申请号：US10393735
申请日：2003-03-21
申请人： Ted W. Barnes , Victorio Chavarria , William J. Sudyka , Adam Ghozeil , Timothy R. Emery
发明人： Ted W. Barnes , Victorio Chavarria , William J. Sudyka , Adam Ghozeil , Timothy R. Emery
IPC分类号： H01L21/306
CPC分类号： B41J2/1626 , B41J2/1603
摘要： Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
摘要翻译：通过将检测器元件邻近待蚀刻材料的一部分定位来确定材料中蚀刻程度的方法和装置。元素的宽度不同。在蚀刻该部分时测量元件的电阻。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式