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    • 3. 发明授权
    • Dual panel-type organic electroluminescent device and method for fabricating the same
    • 双面板型有机电致发光器件及其制造方法
    • US07132801B2
    • 2006-11-07
    • US11011778
    • 2004-12-15
    • Jae-Yong ParkSung-Ki KimHae-Yeol Kim
    • Jae-Yong ParkSung-Ki KimHae-Yeol Kim
    • G09G3/10
    • H01L27/1214H01L27/12H01L27/3253
    • A dual panel-type active matrix organic electroluminescent device includes: first and second substrates spaced apart from each other; a driving thin film transistor on an inner surface of the first substrate; a connection electrode layer connected to the driving thin film transistor and formed of a first conductive material having a first hardness; a first electrode on an inner surface of the second substrate; an organic electroluminescent layer on the first electrode; and a second electrode on the organic electroluminescent layer, the second electrode connected to the connection electrode layer and formed of a second conductive material having a second hardness, wherein the first hardness is different from the second hardness.
    • 双面板型有源矩阵有机电致发光器件包括:彼此间隔开的第一和第二衬底; 在所述第一基板的内表面上的驱动薄膜晶体管; 连接电极层,连接到所述驱动薄膜晶体管并由具有第一硬度的第一导电材料形成; 在所述第二基板的内表面上的第一电极; 第一电极上的有机电致发光层; 以及在所述有机电致发光层上的第二电极,所述第二电极连接到所述连接电极层,并且由具有第二硬度的第二导电材料形成,其中所述第一硬度与所述第二硬度不同。
    • 9. 发明授权
    • Method of fabricating polysilicon thin film transistor
    • 制造多晶硅薄膜晶体管的方法
    • US06727122B2
    • 2004-04-27
    • US10310975
    • 2002-12-06
    • Hyun-Sik SeoBinn KimJong-Uk BaeHae-Yeol Kim
    • Hyun-Sik SeoBinn KimJong-Uk BaeHae-Yeol Kim
    • H01L2184
    • H01L21/02672H01L21/02532H01L21/2022H01L27/12H01L27/1277H01L29/66757H01L29/78603H01L29/78609H01L29/78675Y10S260/35
    • A method of forming a polycrystalline silicon active layer for use in a thin film transistor is provided. The method includes forming a buffer layer over a substrate, forming an amorphous silicon layer over the buffer layer, applying a catalytic metal to a surface of the amorphous silicon layer, crystallizing the amorphous silicon layer having the catalytic metal thereon into a polycrystalline silicon layer, forming an island pattern on the polycrystalline silicon layer, thereby defining an active region underneath in the polycrystalline silicon layer, applying n-type ions to the polycrystalline silicon layer and then heat-treating the polycrystalline silicon layer to remove the catalytic metal from the active region underneath the island pattern, patterning the polycrystalline silicon layer using the island pattern as a mask to form an active layer and to expose a surface of the adjacent buffer layer, removing the island pattern from the active layer using an etchant, and etching the exposed surface of the buffer layer when removing the island pattern.
    • 提供一种形成用于薄膜晶体管的多晶硅有源层的方法。 该方法包括在衬底上形成缓冲层,在缓冲层上形成非晶硅层,向非晶硅层的表面施加催化金属,使其上具有催化金属的非晶硅层结晶成多晶硅层, 在所述多晶硅层上形成岛状图案,从而在所述多晶硅层中限定下面的有源区,向所述多晶硅层施加n型离子,然后热处理所述多晶硅层以从所述活性区域除去所述催化金属 在岛状图案之下,使用岛状图案作为掩模来图案化多晶硅层以形成有源层并暴露相邻缓冲层的表面,使用蚀刻剂从活性层除去岛状图案,并蚀刻暴露表面 的去除岛图案时的缓冲层。