会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Plasma process apparatus and its processor
    • 等离子体处理装置及其处理器
    • US07478609B2
    • 2009-01-20
    • US10494562
    • 2002-10-11
    • Naoko YamamotoI'atsushi YamamotoMasaki HirayamaI'adahiro Ohmi
    • Naoko YamamotoI'atsushi YamamotoMasaki HirayamaI'adahiro Ohmi
    • C23C16/00C23F1/00H01L21/306
    • H01J37/32238H01J37/32192
    • A plasma processing apparatus and a processing apparatus having a widened process condition range allowing plasma generation are obtained by increasing microwave propagation efficiency. The plasma processing apparatus includes a processing chamber where plasma processing is performed, and microwave introducer for introducing microwaves into the processing chamber. The microwave introducer includes a dielectric member transmitting the microwaves. The dielectric member has a shape in cross section in a direction approximately perpendicular to a transmitting direction of the microwaves through the dielectric member that allows transmission of the microwaves of substantially a single mode. The dielectric member has a thickness T in the transmitting direction that satisfies a condition of (λ×(2m+0.7)/4)≦T≦(λ×(2m+1.3)/4), where λ is a wavelength of the microwaves of the single mode transmitted through the dielectric member and m is an arbitrary integer.
    • 通过提高微波传播效率,可以获得等离子体处理装置和具有允许等离子体产生的加宽处理条件范围的处理装置。 等离子体处理装置包括进行等离子体处理的处理室和用于将微波引入处理室的微波导引器。 微波导引器包括传输微波的电介质构件。 电介质构件的形状在大致垂直于通过电介质构件的微波的传输方向的方向上的横截面,其允许基本上单模的微波的传输。 电介质构件具有满足条件(lambdax(2m + 0.7)/ 4)<= T <=(lambdax(2m + 1.3)/ 4)的传输方向的厚度T,其中λ是微波的波长 通过介电构件传输的单一模式,m是任意整数。
    • 5. 发明授权
    • Process for preparing a tetrakis(fluoroaryl) borate derivative
    • 制备四(氟化芳基)硼酸盐衍生物的方法
    • US06683218B1
    • 2004-01-27
    • US08955854
    • 1997-10-21
    • Hitoshi MitsuiIkuyo KatsumiNaoko Yamamoto
    • Hitoshi MitsuiIkuyo KatsumiNaoko Yamamoto
    • C07F502
    • C07F5/02
    • A fluoroaryl magnesium derivative expressed by General Formula (1): where each of R1-R5 represents a hydrogen atom, a fluorine atom, a hydrocarbon group, or an alkoxy group while at least one of R1-R5 representing a fluorine atom, and Xa represents a chlorine atom, a bromine atom, or an iodine atom; and boron halide expressed by General Formula (2): BXb3  (2)  where Xb represents a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, are reacted with each other in a solvent (a) containing diethyl ether and/or tetrahydrofuran, after which the resulting reaction solution is added to a solvent (b) having a higher boiling point than diethyl ether and/or tetrahydrofuran while diethyl ether and/or tetrahydrofuran are distilled out. Consequently, it has become possible to obtain a (fluoroaryl)borane compound expressed by General Formula (3):  where each of R1-R5, and Xb, represents the same as above, and n represents 2 or 3, from which magnesium halide produced as a by-product is separated and removed, selectively in a simple manner at a low cost.
    • 由通式(1)表示的氟化芳基镁衍生物:其中R1-R5各自表示氢原子,氟原子,烃基或烷氧基,而R1-R5中至少一个表示氟原子,Xa 表示氯原子,溴原子或碘原子; 由通式(2)表示的卤代硼:其中Xb表示氟原子,氯原子,溴原子或碘原子,在含有二乙醚和/或四氢呋喃的溶剂(a)中彼此反应,之后 将所得反应溶液加入到沸点比二乙醚和/或四氢呋喃高的溶剂(b)中,同时蒸馏出乙醚和/或四氢呋喃。 因此,可以获得由通式(3)表示的(氟化芳基)硼烷化合物:其中R1-R5和Xb各自表示与上述相同的含义,n表示2或3,由此产生卤化镁 作为副产物以低成本以简单的方式选择性地分离和除去。
    • 7. 发明授权
    • Skin cleansing compositions
    • 皮肤清洁组合物
    • US07858567B2
    • 2010-12-28
    • US12104200
    • 2008-04-16
    • Naoko YamamotoRyosuke FujiiMasaki Shimizu
    • Naoko YamamotoRyosuke FujiiMasaki Shimizu
    • A61K7/00
    • A61K8/39A61K8/463A61K8/817A61K8/8176A61K2800/5426A61K2800/596A61Q19/10
    • A skin cleansing composition contains the following ingredients (A), (B) and (C): (A) a polyoxyethylene alkylether sulfate, (B) a polyoxyethylene alkylether carboxylate, and (C) a cationic group-containing polymer having a cationic charge density of not less than 4.5 meq/g, and/or polyvinylpyrrolidone. A weight ratio (A):(B) of the ingredient (A) to the ingredient (B) is from 85:15 to 25:75. A total content of the ingredients (A) and (B) based on the whole composition ranges from 5 to 25 wt %. A content of the ingredient (C) ranges from 0.05 to 1 wt %. The skin cleansing composition is excellent in foamability and foam quality, and provides a good stop feeling during rinsing and a refreshed touch feeling after towel blotting.
    • 皮肤清洁组合物含有下列成分(A),(B)和(C):(A)聚氧乙烯烷基醚硫酸酯,(B)聚氧乙烯烷基醚羧酸酯和(C)具有阳离子电荷的阳离子基团聚合物 密度不小于4.5meq / g,和/或聚乙烯吡咯烷酮。 成分(A)与成分(B)的重量比(A):( B)为85:15〜25:75。 基于整个组合物的成分(A)和(B)的总含量为5〜25重量%。 成分(C)的含量为0.05〜1重量%。 皮肤清洁组合物的起泡性和泡沫质量优异,并且在漂洗后提供良好的停止感和毛巾印迹后的清爽触感。