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1. 发明授权

US06713746B2 Arrangement and method for illuminating a specimen field in an optical instrument 失效
标题翻译：用于照射光学仪器中的样品场的布置和方法
公开(公告)号：US06713746B2
公开(公告)日：2004-03-30
申请号：US10193126
申请日：2002-07-12
申请人： Michael Veith , Uwe Graf , Joachim Wienecke
发明人： Michael Veith , Uwe Graf , Joachim Wienecke
IPC分类号： G01J132
CPC分类号： G01J1/32 , G02B21/06
摘要： An arrangement for illuminating a specimen field in an optical instrument for specimen viewing includes: an illumination device, arranged in a housing, including a light source and an illuminating optical system, where a position of the light source or illuminating optical system is adjustable within the illumination device; a setting device including at least one drive system and configured to positionally adjust the light source or illuminating optical system; at least one linkage member connected to the light source or illuminating optical system, where the linkage member includes a coupling member accessible by the setting device from outside the housing; at least one measurement device configured to sense parameters of the light generated by the illumination device; and a control device that is configured to generate positioning commands for positional adjustment of the light source or illuminating optical system by the drive system as a function of the sensed parameters.
摘要翻译：用于照射用于样本观察的光学仪器中的样本场的装置包括：照明装置，布置在包括光源和照明光学系统的壳体中，其中光源或照明光学系统的位置在照明装置设置装置，包括至少一个驱动系统，并且被配置为对所述光源或照明光学系统进行位置调整; 连接到所述光源或照明光学系统的至少一个连杆构件，其中所述连杆构件包括从所述壳体外部可由所述调节装置接近的联接构件; 至少一个测量装置，被配置为感测由所述照明装置产生的光的参数; 以及控制装置，其被配置为根据所感测的参数产生用于通过驱动系统对光源或照明光学系统进行位置调整的定位命令。

2. 发明授权

US07002740B2 Setting module for the illumination of an optical instrument 失效
标题翻译：用于照明光学仪器的设置模块
公开(公告)号：US07002740B2
公开(公告)日：2006-02-21
申请号：US10192874
申请日：2002-07-11
申请人： Michael Veith , Uwe Graf , Joachim Wienecke
发明人： Michael Veith , Uwe Graf , Joachim Wienecke
IPC分类号： G02B21/06
CPC分类号： G02B21/06
摘要： The invention refers to a setting module for an illumination apparatus (2) of an optical instrument (1), in particular of a microscope, in which the illumination apparatus (2) comprises a light source (4), an illuminating optical system, and positioning elements (7, 8, 9, 16) with which the position of the light source (4) and/or of the illuminating optical system within the illumination apparatus (2) can be modified. The setting module (17) comprises a module housing (18) having at least one drive device (19, 20, 21, 22) and coupling members (27, 28, 29, 30) for the transfer of a drive motion to the positioning elements (7, 8, 9, 16).Also described is an illumination system comprising the illumination apparatus and the setting module. The result is to create an alignment capability with excellent functionality and user-friendliness, thereby making possible rapid positional adjustment of the light source and/or the illuminating optical system in the context of use under clean-room conditions.
摘要翻译：本发明涉及一种用于光学仪器（1）的照明装置（2）的设置模块，特别是显微镜，其中照明装置（2）包括光源（4），照明光学系统和能够改变照明装置（2）内的光源（4）和/或照明光学系统的位置的定位元件（7,8,9,16）。设置模块（17）包括具有至少一个驱动装置（19,20,21,22）和联接构件（27,28,29,30）的模块壳体（18），用于将驱动运动传递到定位元素（7,8,9,16）。

3. 发明授权

US06696679B1 Method for focusing of disk-shaped objects with patterned surfaces during imaging 失效
标题翻译：在成像期间用盘状物体聚焦图案化表面的方法
公开(公告)号：US06696679B1
公开(公告)日：2004-02-24
申请号：US09446463
申请日：2000-04-12
申请人： Michael Graef , Uwe Graf , Joachim Wienecke , Guenter Hoffmann , Karl-Heinz Franke , Lutz Jakob
发明人： Michael Graef , Uwe Graf , Joachim Wienecke , Guenter Hoffmann , Karl-Heinz Franke , Lutz Jakob
IPC分类号： G02B2740
CPC分类号： G02B21/244 , G01N21/8851 , G01N21/9506
摘要： A method for focusing on disk-shaped objects with patterned and unpatterned surfaces includes imaging of the patterned and unpatterned surfaces on a disk-shaped object for defect detection and defect classification by using various preset values of a focus regulation system to acquire the image sequence. At least one preset value is learned on the basis of an image sequence at least at one position in a substantially flat reference region of the surface of the disk-shaped object. A regulated adjustment is provided of a measurable distance from a carrier plane to a reference plane, wherein the carrier plane serves as a support for the disk-shaped objects. The distance is adjusted by applying the at least one preset value, which is overlaid on the regulation system, a focus state is evaluated by an image processor according to at least one rule, and the at least one preset value is ascertained therefrom.
摘要翻译：用于聚焦在具有图案化和未图案化表面的盘形物体的方法包括通过使用聚焦调节系统的各种预设值来获取图像序列，将用于缺陷检测和缺陷分类的图案化和未图案化表面成像在盘形物体上。基于至少在盘状物体的表面的基本上平坦的参考区域的一个位置处的图像序列来学习至少一个预设值。提供了从载体平面到参考平面的可测量距离的调节调节，其中载体平面用作盘形物体的支撑。通过应用覆盖在调节系统上的至少一个预设值来调整距离，根据至少一个规则由图像处理器评估聚焦状态，并且从其确定至少一个预设值。

4. 发明授权

US06879440B2 Autofocus module and method for a microscope-based system 有权
标题翻译：自动对焦模块和基于显微镜的系统的方法
公开(公告)号：US06879440B2
公开(公告)日：2005-04-12
申请号：US10355868
申请日：2003-01-31
申请人： Franz Cemic , Lambert Danner , Robert Mainberger , Michael Veith , Martin Osterfeld , Uwe Graf
发明人： Franz Cemic , Lambert Danner , Robert Mainberger , Michael Veith , Martin Osterfeld , Uwe Graf
IPC分类号： G02B7/28 , G02B21/24 , G02B21/06
CPC分类号： G02B7/28 , G02B21/247
摘要： An autofocus module for a microscope-based system includes at least two light sources, each of which generates a light beam for focusing. An optical directing device is provided that directs a respective portion of each light beam onto an incoupling means, which couples each of the light beams into the illuminating light beam of the microscope-based system and directs the light beams onto a specimen. A first and a second detector receive the light beams of the first and second light source reflected from the surface of the specimen, and ascertain the intensities on the first and second detector in time-multiplexed fashion.
摘要翻译：用于基于显微镜的系统的自动对焦模块包括至少两个光源，每个光源产生用于聚焦的光束。提供一种光引导装置，其将每个光束的相应部分引导到一个耦合装置上，该耦合装置将每个光束耦合到基于显微镜的系统的照明光束中，并将光束引导到样本上。第一和第二检测器接收从样本表面反射的第一和第二光源的光束，并以时分复用的方式确定第一和第二检测器上的强度。

5. 发明申请

US20070247618A1 Apparatus and Method for Inspecting Microstructures in Reflected or Transmitted Infrared Light 有权
标题翻译：用于检测反射或透射红外光中的微结构的装置和方法
公开(公告)号：US20070247618A1
公开(公告)日：2007-10-25
申请号：US11568949
申请日：2005-05-23
申请人： Uwe Graf , Lambert Danner
发明人： Uwe Graf , Lambert Danner
IPC分类号： G01N21/01
CPC分类号： G02B21/088 , G01N21/59 , G01N21/9501 , G01N21/9505
摘要： Previously used examination devices and methods mostly operate with reflected visible or UV light to analyze microstructured samples of a wafer (38), for example. The aim of the invention is to increase the possible uses of said devices, i.e. particularly in order to represent structural details, e.g. of wafers that are structured on both sides, which are not visible in VIS or UV because coatings or intermediate materials are not transparent. Said aim is achieved by using IR light as reflected light while creating transillumination (52) which significantly improves contrast in the IR image, among other things, thus allowing the sample to be simultaneously represented in reflected or transmitted IR light and in reflected visible light.
摘要翻译：以前使用的检查装置和方法大多以反射的可见光或UV光来操作，以分析例如晶片（38）的微结构样品。本发明的目的是增加所述装置的可能用途，即特别是为了表示结构细节，例如，的两面结构的晶片，其在VIS或UV中不可见，因为涂层或中间材料不透明。所述目的通过使用IR光作为反射光来实现，同时产生透光（52），其显着地改善了IR图像中的对比度，从而允许样品在反射或透射的IR光和反射的可见光中同时被表示。

6. 发明授权

US08154718B2 Apparatus and method for inspecting micro-structured devices on a semiconductor substrate 有权
标题翻译：用于检查半导体衬底上的微结构器件的装置和方法
公开(公告)号：US08154718B2
公开(公告)日：2012-04-10
申请号：US11568949
申请日：2005-05-23
申请人： Uwe Graf , Lambert Danner
发明人： Uwe Graf , Lambert Danner
IPC分类号： G01N21/00
CPC分类号： G02B21/088 , G01N21/59 , G01N21/9501 , G01N21/9505
摘要： Previously used examination devices and methods mostly operate with reflected visible or UV light to analyze microstructured samples of a wafer (38), for example. The aim of the invention is to increase the possible uses of said devices, i.e. particularly in order to represent structural details, e.g. of wafers that are structured on both sides, which are not visible in VIS or UV because coatings or intermediate materials are not transparent. Said aim is achieved by using IR light as reflected light while creating transillumination (52) which significantly improves contrast in the IR image, among other things, thus allowing the sample to be simultaneously represented in reflected or transmitted IR light and in reflected visible light.
摘要翻译：以前使用的检查装置和方法大多以反射的可见光或UV光来操作，以分析例如晶片（38）的微结构样品。本发明的目的是增加所述装置的可能用途，即特别是为了表示结构细节，例如，的两面结构的晶片，其在VIS或UV中不可见，因为涂层或中间材料不透明。所述目的通过使用IR光作为反射光来实现，同时产生透光（52），其显着地改善了IR图像中的对比度，从而允许样品在反射或透射的IR光和反射的可见光中同时被表示。

7. 发明授权

US07271889B2 Device and method for inspecting an object 失效
标题翻译：用于检查物体的装置和方法
公开(公告)号：US07271889B2
公开(公告)日：2007-09-18
申请号：US10524687
申请日：2003-08-21
申请人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sönksen , Volker Knorz
发明人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sönksen , Volker Knorz
IPC分类号： G01N21/00 , G01N21/55
CPC分类号： G02B21/10 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8825 , G01N2021/8838 , G01N2201/0696 , G02B21/125
摘要： A device and method for inspecting an object (2) uses a bright field illumination beam path (4) of a bright field light source (5), said beam path being formed so that it passes through the projection optics (3), and a dark field illumination beam path (6) of a dark field light source (7), this beam path being formed so that it also passes through the projection optics (3). The object (2) can be projected by the projection optics (3) onto the least one detector (8), and the object (2) is simultaneously illuminated by both light sources (5, 7). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the light used for the dark field illumination is pulsed and the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.
摘要翻译：用于检查物体（2）的装置和方法使用亮场光源（5）的亮场照明光束路径（4），所述光束路径形成为使得其通过投影光学器件（3），并且暗场光源（7）的暗场照明光束路径（6），该光束路径被形成为使得其也穿过投影光学器件（3）。物体（2）可以被投影光学器件（3）投影到最少一个检测器（8）上，物体（2）同时被两个光源（5,7）照射。为了同时检测亮场图像和暗场图像而不涉及复杂的滤波操作，用于暗场照明的光被脉冲，并且用于暗场照明的光的脉冲强度大于至少一个数量级比在脉冲间隔期间用于亮场照明的连续光的强度高。

8. 发明申请

US20050259245A1 Device and method for inspecting an object 失效
标题翻译：用于检查物体的装置和方法
公开(公告)号：US20050259245A1
公开(公告)日：2005-11-24
申请号：US10524687
申请日：2003-08-21
申请人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sonksen , Volker Knorz
发明人： Franz Cemic , Lambert Danner , Uwe Graf , Robert Mainberger , Dirk Sonksen , Volker Knorz
IPC分类号： G01B11/30 , G01N21/88 , G01N21/95 , G01N21/956 , G02B21/06 , G02B21/10 , G02B21/12 , H01L21/66
CPC分类号： G02B21/10 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8825 , G01N2021/8838 , G01N2201/0696 , G02B21/125
摘要： The invention relates to a device and method for inspecting an object (2) involving the use of a bright field illumination beam path (4) of a bright field light source (5), said beam path being formed so that it passes through the projection optics (3), and involving the use or a dark field illumination beam path (6) of a dark field light source (7), this beam path being formed so that it also passes through the projection optics (3). The object (2) can be projected by the projection optics (3) onto the least one detector (8), and the object (2) is simultaneously illuminated by both light sources (5, 7). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the inventive device or method for inspecting an object (2) is characterized in that the light used for the dark field illumination is pulsed and in that the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.
摘要翻译：本发明涉及一种用于检查涉及使用明场光源（5）的亮场照明光束路径（4）的物体（2）的装置和方法，所述光束路径被形成为使得其通过突起光学器件（3），并且涉及暗场光源（7）的使用或暗场照明光束路径（6），该光束路径被形成为使得其也穿过投影光学器件（3）。物体（2）可以被投影光学器件（3）投影到最少一个检测器（8）上，物体（2）同时被两个光源（5,7）照射。为了同时检测亮场图像和暗场图像而不涉及复杂的滤波操作，本发明的用于检测物体（2）的装置或方法的特征在于用于暗场照明的光是脉冲的，并且脉冲强度用于暗场照明的光比在脉冲间隔期间用于亮场照明的连续光的强度至少大一个数量级。

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