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    • 10. 发明授权
    • Heat-developable photosensitive material
    • 热显影感光材料
    • US06344313B1
    • 2002-02-05
    • US09538727
    • 2000-03-30
    • Takahiro GotoToshihide EzoeHiroyuki SuzukiMinoru SakaiHideki MaetaNobuaki InoueMasaru Takasaki
    • Takahiro GotoToshihide EzoeHiroyuki SuzukiMinoru SakaiHideki MaetaNobuaki InoueMasaru Takasaki
    • G03C1498
    • G03C1/49845
    • An object of the present invention is to provide a heat-developable photosensitive material of improved fluctuation of photographic performance (sensitivity, Dmin) arisen from fluctuation of development temperature condition (temperature, time) and storage time after heat development. According to the present invention, there is provided a heat-developable photosensitive material, wherein the photosensitive material comprises, on a support, an image-forming layer containing at least (a) non-photosensitive organic silver salt, (b) photosensitive silver halide, (c) a reducing agent, and (d) a binder, and a protective layer on the image-forming layer, polymer latexes are used as binders of the image-forming layer and the protective layer, and the photosensitive material further comprises, on the image-forming layer side, (e) a nucleating agent and (f) one or more compounds represented by the following formula (1): wherein, in the formula (1), Z1 and Z2 each independently represent a halogen atom, X1 represents a hydrogen atom or an electron withdrawing group, Y1 represents —CO— group or —SO2— group, Q represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent, L represents a linking group, W represents carboxyl group or a salt thereof, slufo group or a salt thereof, phosphoric acid group, hydroxyl group, a quaternary ammonium group, or a polyethyleneoxy group, and n represents 0 or 1.
    • 本发明的目的是提供一种由显影温度条件(温度,时间)的波动和热显影后的储存时间引起的照相性能(灵敏度,Dmin)变动波动的热显影感光材料。 根据本发明,提供了一种热显影感光材料,其中感光材料在载体上包含至少含有(a)非光敏有机银盐的图像形成层,(b)感光卤化银 ,(c)还原剂,和(d)粘合剂和图像形成层上的保护层,聚合物胶乳用作图像形成层和保护层的粘合剂,并且感光材料还包含, 在成像层侧,(e)成核剂和(f)一种或多种由下式(1)表示的化合物:其中,在式(1)中,Z1和Z2各自独立地表示卤素原子, X1表示氢原子或吸电子基,Y1表示-CO-基或-SO2-基,Q表示可具有取代基的亚芳基或可具有取代基的2价杂环基,L表示连接基, W代表羧基 基团或其盐,slufo基团或其盐,磷酸基,羟基,季铵基或聚乙烯氧基,n表示0或1。