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    • 1. 发明授权
    • Micro-optic device and method of manufacturing same
    • 微光器件及其制造方法
    • US07515783B2
    • 2009-04-07
    • US10942583
    • 2004-09-16
    • Yoshichika KatoSatoshi YoshidaKeiichi MoriKenji KondouYoshihiko HamadaOsamu Imaki
    • Yoshichika KatoSatoshi YoshidaKeiichi MoriKenji KondouYoshihiko HamadaOsamu Imaki
    • G02B6/26
    • G02B6/3584B81B3/0083B81B2201/045B81C1/00182G02B6/122G02B6/136G02B6/3514G02B6/3518G02B6/3546G02B6/357G02B6/3596G02B26/0841
    • A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constructed as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.
    • 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被构造为镜面的表面被选择为在硅晶体的平面内。 使用掩模,通过反应离子干蚀刻垂直蚀刻器件层,直到中间层露出。 随后,使用KOH溶液,对晶体取向进行各向异性的湿式蚀刻,以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度, 镜子变成光滑的结晶表面。 随后,中间层选择性地进行湿式蚀刻,仅在位于光学器件的可移动部分下方的区域中除去中间层。
    • 2. 发明授权
    • Miniature movable device
    • 微型移动装置
    • US07203395B2
    • 2007-04-10
    • US10957284
    • 2004-10-01
    • Yoshichika KatoKeiichi MoriSatoshi YoshidaOsamu ImakiYoshihiko HamadaKenji Kondou
    • Yoshichika KatoKeiichi MoriSatoshi YoshidaOsamu ImakiYoshihiko HamadaKenji Kondou
    • G02B6/35G02B26/08
    • G02B6/358G02B6/3514G02B6/3546G02B6/357G02B6/3584G02B6/3596H02N1/008
    • A miniature movable device comprises a movable part (a mirror, a movable rod, support arms, and a movable comb tooth electrode) formed on a substrate and adapted to be displaced in a direction parallel to the sheet surface of the substrate, a fixing part formed and fixedly mounted on the substrate, and hinges, each having its opposite ends connected to the movable part and the fixing part and assuming two flexural conditions which are reversed in flexural, the hinges being effective to maintain the movable part at two positions by a self-holding action when it assumes either flexural condition. The substrate is formed with wall surfaces which are disposed oppositely to the opposite surfaces of the hinges over a movable range of the hinges. Spacings between the hinges and the wall surfaces disposed on the opposite sides thereof are equal to each other at every point along the lengthwise direction of the hinges when the hinges assume one of the two flexural conditions (an initial condition assumed upon manufacture). This eliminates an inconvenience that during a drying step which follows a wet etching operation during the manufacture, a liquid may remain on only one side of the hinges to cause the hinges to be held attracted to the wall surfaces.
    • 微型可移动装置包括:形成在基板上的可移动部分(反射镜,活动杆,支撑臂和可移动梳齿电极),并且适于在平行于基板的片材表面的方向上移位;固定部分 形成并固定地安装在基板上,以及铰链,每个铰链的相对端连接到可动部分和固定部分,并且假设两个在弯曲中相反的弯曲条件,铰链有效地将可动部件保持在两个位置, 当它承担弯曲状态时的自我保持动作。 衬底形成有在铰链的可移动范围上相对于铰链的相对表面设置的壁表面。 铰链和设置在其相对侧的壁表面之间的间隔在铰链处于两个弯曲条件(制造时假定的初始条件)之一时沿着铰链的长度方向的每个点处彼此相等。 这消除了在制造期间在湿蚀刻操作之后的干燥步骤期间的液体可以仅保留在铰链的一侧上以使铰链被保持被吸引到壁表面的不便。
    • 3. 发明申请
    • Optical device
    • 光学装置
    • US20050213876A1
    • 2005-09-29
    • US10975208
    • 2004-10-27
    • Satoshi YoshidaKenji KondouOsamu ImakiYoshihiko HamadaYoshichika KatoKeiichi Mori
    • Satoshi YoshidaKenji KondouOsamu ImakiYoshihiko HamadaYoshichika KatoKeiichi Mori
    • B81B3/00G02B6/35
    • G02B6/358G02B6/3514G02B6/3546G02B6/357G02B6/3584
    • An optical device formed on a substrate comprises: plural fiber channels formed in the top surface of the substrate; a mirror to be pushed into and pulled out of an optical path between optical fibers disposed in the fiber channels; a movable rod carrying at one end the mirror; a comb-type electrostatic actuator disposed in association with the intermediate portion of the movable rod, for moving the movable rod lengthwise thereof; and plural support beams disposed near the one and the other end of the movable rod on both sides of the point of application of driving force by the comb-type electrostatic actuator, for movably supporting the movable rod. The support beams support the movable rod at positions having line symmetry with respect to a center line parallel to the lengthwise direction of the movable rod, and points of supporting the movable rod by the plural support beams are symmetrical with respect to the point of application of the driving force by the comb-type electrostatic actuator. Even if the driving force by the comb-type electrostatic actuator contains a vector component of a direction different from the desired one in which to drive the movable rod, it is possible to suppress movement of the movable rod in other directions than the desired one to drive the movable rod.
    • 形成在基板上的光学元件包括:形成在基板的顶面的多个光纤通道; 被设置在光纤通道中的光纤之间的光路中被推入和拉出的反射镜; 一个可移动的杆,在一端承载镜子; 与可动杆的中间部分相关联地设置的用于使活动杆纵向移动的梳状静电致动器; 以及多个支撑梁,其设置在通过梳型静电致动器施加驱动力的两侧的可动杆的一端和另一端附近,用于可移动地支撑可动杆。 支撑梁将可动杆支撑在相对于可移动杆的长度方向的中心线具有对称性的位置处,并且通过多个支撑梁支撑可动杆的点相对于应用点对称 梳状静电执行机构的驱动力。 即使通过梳型静电致动器的驱动力包含与驱动可动杆的期望方向不同的方向的矢量分量,也可以抑制可动杆在除了所需的方向以外的方向上的移动, 驱动可动杆。
    • 8. 发明申请
    • Method of manufacturing micro-optic device
    • 微光器件制造方法
    • US20090004765A1
    • 2009-01-01
    • US12070931
    • 2008-02-22
    • Yoshichika KatoSatoshi YoshidaKeiichi MoriKenji KondouYoshihiko HamadaOsamu Imaki
    • Yoshichika KatoSatoshi YoshidaKeiichi MoriKenji KondouYoshihiko HamadaOsamu Imaki
    • H01L21/02
    • G02B6/3584B81B3/0083B81B2201/045B81C1/00182G02B6/122G02B6/136G02B6/3514G02B6/3518G02B6/3546G02B6/357G02B6/3596G02B26/0841
    • A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constricted as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.
    • 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被收缩成为镜面的表面被选择在硅晶体的平面内。 使用掩模,通过反应离子干蚀刻垂直蚀刻器件层,直到中间层露出。 随后,使用KOH溶液,对晶体取向进行各向异性的湿式蚀刻,以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度, 镜子变成光滑的结晶表面。 随后,中间层选择性地进行湿式蚀刻,仅在位于光学器件的可移动部分下方的区域中除去中间层。