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1. 发明授权

US5798323A Non-corrosive stripping and cleaning composition 失效
标题翻译：无腐蚀性剥离和清洗组合物
公开(公告)号：US5798323A
公开(公告)日：1998-08-25
申请号：US850991
申请日：1997-05-05
申请人： Kenji Honda , Richard M. Molin , Gale L. Hansen
发明人： Kenji Honda , Richard M. Molin , Gale L. Hansen
IPC分类号： G03F7/42 , C11D7/26 , C11D7/32 , C11D7/34 , C11D7/50 , C23G5/02 , H01L21/027 , H01L21/304
CPC分类号： G03F7/425 , C11D7/261 , C11D7/5009 , C11D7/5013 , G03F7/426 , C11D7/264 , C11D7/265 , C11D7/32 , C11D7/3263 , C11D7/3281 , C11D7/34
摘要： The present invention is directed to a non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5% to about 50% solvent selected from the group consisting of N-methyl-2-pyrrolidinone, N-hydroxyethyl-2-pyrrolidinone, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide, N,N-dimethylacetamide, diacetone alcohol, ethylene glycol, propylene glycol and admixtures thereof; (b) about 10% to about 90% of an alkanolamine selected from the group consisting of diethyleneglycolamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethylamino)ethanol, and admixtures thereof; (c) about 0.1% to about 4% of Formula I: ##STR1## where R.sub.1 -R.sub.4 are individually selected from the group consisting of hydrogen, alkyl groups having 1-4 carbon atoms, alkoxy groups having 1-4 carbon atoms, halogen groups, amino groups, hydroxyl groups, carboxyl groups or combinations thereof; and (d) about 0.1% to about 40% of water, all percentages by weight of the total stripping and cleaning composition.
摘要翻译：本发明涉及非腐蚀性光致抗蚀剂剥离和清洁组合物，其包含：（a）约5％至约50％的溶剂，其选自N-甲基-2-吡咯烷酮，N-羟乙基-2-吡咯烷酮 1,3-二甲基-2-咪唑啉酮，二甲基亚砜，N，N-二甲基乙酰胺，双丙酮醇，乙二醇，丙二醇及其混合物; （b）约10％至约90％的选自二甘醇胺，单乙醇胺，二乙醇胺，三乙醇胺，2-（2-氨基乙基氨基）乙醇及其混合物的链烷醇胺; （c）约0.1％至约4％的式I：其中R 1 -R 4各自选自氢，具有1-4个碳原子的烷基，具有1-4个碳原子的烷氧基原子，卤素基团，氨基，羟基，羧基或其组合; 和（d）约0.1％至约40％的水，所有百分比均为总剥离和清洁组合物的重量百分比。

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