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    • 1. 发明授权
    • Detecting elevator brake and other dragging by monitoring motor current
    • 通过监测电机电流来检测电梯制动器和其他拖动
    • US07350883B2
    • 2008-04-01
    • US10523608
    • 2002-10-15
    • James L. HubbardArmando Servia-ReymundoMichael Mann
    • James L. HubbardArmando Servia-ReymundoMichael Mann
    • B60T8/32
    • B66B5/0018B66B5/0037
    • Elevator brake or other drag is checked by establishing (10-13) baseline motor currents at plural determined positions as the car is moved up and down both empty and with full load. In a normal run (21), the load is recorded (22) and the motor current required to drive the load at rated speed at the next determined position is both predicted (28) and measured. If the difference between the predicted and actual current exceeds a tolerance (33, 34), the car stops at the next floor (35), the system is shut down (39) and a message generated (40). When the brake is in proper operating condition, baseline motor current required to move a car with the brake engaged is recorded. Thereafter, a high fraction (such as 90%) of baseline motor current is applied to attempt to move the car. If the car moves, the system is shut down (101) and a message generated (102).
    • 电梯制动器或其他拖曳是通过在多个确定的位置建立(10 - 13)基准电动机电流来检查的,因为汽车在空载和满载时上下移动。 在正常运行(21)中,记录负载(22),并且预测(28)并测量在下一个确定位置处以额定速度驱动负载所需的电动机电流。 如果预测和实际电流之间的差异超过公差(33,34),则汽车停在下一层(35),系统关闭(39)并生成消息(40)。 当制动器处于正常工作状态时,记录在制动器接合时移动汽车所需的基准电机电流。 此后,施加基准电动机电流的高分数(例如90%)来试图移动汽车。 如果汽车移动,则关闭系统(101)并生成消息(102)。
    • 7. 发明授权
    • Mask alignment system
    • 面罩对齐系统
    • US4652134A
    • 1987-03-24
    • US645871
    • 1984-08-28
    • Nicholas F. PaschJames L. Hubbard
    • Nicholas F. PaschJames L. Hubbard
    • H01L21/30G03F9/00H01L21/027G01B11/26
    • G03F9/70
    • A system for aligning a semiconductor wafer with a mask bearing a pattern to be formed on the wafer, in which both the wafer and the mask bear an alignment mark, and in which light used for alignment is filtered to transmit only in a selected bandwidth, uses a reflector system to gather light reflected from edges of the alignment mark on the wafer. In order to minimize the effect of erroneous alignment signals from standing waves generated when the alignment signal is reflected from a wafer coated with a layer of photoresist, a second filter is placed in the path of light after it has reflected from the target. This second filter transmits a range of the reflected light which does not produce standing waves.
    • 用于使半导体晶片与在晶片上形成的图案对准半导体晶片的系统,其中晶片和掩模都具有对准标记,并且其中用于对准的光被滤波以仅在选定的带宽中传输, 使用反射器系统收集从晶片上的对准标记的边缘反射的光。 为了最小化当从涂覆有光致抗蚀剂层的晶片反射对准信号时产生的驻波的错误对准信号的影响,在从靶标反射之后将第二滤光器放置在光路中。 该第二滤光器透射不产生驻波的反射光的范围。