会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明申请
    • LIQUID-GAS INTERFACE PLASMA DEVICE
    • 液体气界面等离子体装置
    • US20130062014A1
    • 2013-03-14
    • US13637331
    • 2010-03-31
    • Il-Gyo KooGeorge J. Collins
    • Il-Gyo KooGeorge J. Collins
    • B23K10/00
    • B23K10/00A61C19/00A61C19/066H05H1/2406H05H1/42H05H2001/2418H05H2001/2431H05H2001/2443
    • A plasma system for treating a workpiece is disclosed. The plasma system includes: a plasma device including an electrode formed from a metal alloy and a dielectric layer covering the electrode, the dielectric layer including a distal portion extending distally past a distal end of the electrode by a predetermined distance; a liquid source configured to supply a liquid to a workpiece; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.
    • 公开了一种用于处理工件的等离子体系统。 等离子体系统包括:等离子体装置,其包括由金属合金形成的电极和覆盖电极的电介质层,电介质层包括远离电极远端延伸超过预定距离的远端部分; 液体源,被配置为向工件供应液体; 耦合到所述等离子体装置并且被配置为向其提供可电离介质的可电离介质源; 以及电源,其耦合到所述电极并且被配置为在所述等离子体装置处点燃所述可离子化介质以在所述液体存在下形成等离子体流出物,由此所述等离子体流出物与所述液体反应以形成至少一种与所述液体相互作用的反应性物质 工件。
    • 7. 发明授权
    • Liquid-gas interface plasma device
    • 液 - 气界面等离子体装置
    • US09272359B2
    • 2016-03-01
    • US13637331
    • 2010-03-31
    • Il-Gyo KooGeorge J. Collins
    • Il-Gyo KooGeorge J. Collins
    • A61L2/00H01J7/24H05B31/26B23K10/00A61C19/00A61C19/06H05H1/42H05H1/24
    • B23K10/00A61C19/00A61C19/066H05H1/2406H05H1/42H05H2001/2418H05H2001/2431H05H2001/2443
    • A plasma system for treating a workpiece is disclosed. The plasma system includes: a plasma device including an electrode formed from a metal alloy and a dielectric layer covering the electrode, the dielectric layer including a distal portion extending distally past a distal end of the electrode by a predetermined distance; a liquid source configured to supply a liquid to a workpiece; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.
    • 公开了一种用于处理工件的等离子体系统。 等离子体系统包括:等离子体装置,其包括由金属合金形成的电极和覆盖电极的电介质层,电介质层包括远离电极远端延伸超过预定距离的远端部分; 液体源,被配置为向工件供应液体; 耦合到所述等离子体装置并且被配置为向其提供可电离介质的可电离介质源; 以及电源,其耦合到所述电极并且被配置为在所述等离子体装置处点燃所述可离子化介质以在所述液体存在下形成等离子体流出物,由此所述等离子体流出物与所述液体反应以形成至少一种与所述液体相互作用的反应性物质 工件。